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Method for treating organic silicon low-boiling-point substance by utilizing reactive distillation

A technology for reactive distillation and low boilers, applied in the field of organosilicon production technology, can solve the problems of leakage of toxic and harmful materials sealed by agitators, poor heat exchange effect of a disproportionation kettle jacket, and low extraction rate of raw material components, etc. Continuous production, easy to promote and use, the effect of reducing the number of times

Pending Publication Date: 2021-12-24
云南能投硅材科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned disproportionation reaction has the following deficiencies in the production process: the one is that the processing flow of the equipment is long, and the extraction rate of raw material components after the disproportionation tower is separated is low, wherein the yield of dimethyldichlorosilane is about 55%, monomethyldichlorosilane The yield of base trichlorosilane is about 35%, and the yield of high boilers is about 4%. There is a problem of increased cost for recycling and purification. The effect is not good, the seal failure of the agitator may cause the leakage of toxic and harmful materials, and the improper operation of the catalyst aluminum trichloride powder is easy to adhere to the inner surface of the packing, heat exchange tubes and pipes, causing blockage and parking, and difficult cleaning problems

Method used

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  • Method for treating organic silicon low-boiling-point substance by utilizing reactive distillation

Examples

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Effect test

Embodiment 1

[0013] The method for treating organic silicon low boilers by reactive distillation described in Example 1 comprises the following steps:

[0014] ①Reaction section packing layer treatment: The catalyst aluminum trichloride is supported on the surface of the reaction section packing layer to form a solid catalytic packing layer 3 in the reaction section. Aluminum trichloride is loaded on the surface of the reaction section packing layer by chemical vapor deposition. Vapor phase deposition is a process technology in which the reaction substance reacts chemically under gaseous conditions, and the solid substance is deposited on the surface of the heated solid substrate to obtain a solid material. In the furnace, the mixed gas of aluminum trichloride gas and nitrogen source gas is used as the reaction gas. When the temperature of the reaction chamber reaches an appropriate temperature, the reaction gas is introduced to control the deposition of the substance by adjusting the react...

Embodiment 2

[0019] The method for processing organosilicon low boilers by reactive distillation described in Example 2 comprises the following steps:

[0020] ①Reaction section packing layer treatment: The catalyst aluminum trichloride is supported on the surface of the reaction section packing layer to form a solid catalytic packing layer 3 in the reaction section. Aluminum trichloride is loaded on the surface of the reaction section packing layer by chemical vapor deposition. Vapor phase deposition is a process technology in which the reaction substance reacts chemically under gaseous conditions, and the solid substance is deposited on the surface of the heated solid substrate to obtain a solid material. In the furnace, the mixed gas of aluminum trichloride gas and nitrogen source gas is used as the reaction gas. When the temperature of the reaction chamber reaches an appropriate temperature, the reaction gas is introduced to control the deposition of the substance by adjusting the react...

Embodiment 3

[0025] The method for treating organic silicon low boilers by reactive distillation described in Example 3 comprises the following steps:

[0026] ①Reaction section packing layer treatment: The catalyst aluminum trichloride is supported on the surface of the reaction section packing layer to form a solid catalytic packing layer 3 in the reaction section. Aluminum trichloride is loaded on the surface of the reaction section packing layer by chemical vapor deposition. Vapor phase deposition is a process technology in which the reaction substance reacts chemically under gaseous conditions, and the solid substance is deposited on the surface of the heated solid substrate to obtain a solid material. In the furnace, the mixed gas of aluminum trichloride gas and nitrogen source gas is used as the reaction gas. When the temperature of the reaction chamber reaches an appropriate temperature, the reaction gas is introduced to control the deposition of the substance by adjusting the react...

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Abstract

The invention discloses a method for treating an organic silicon low-boiling-point substance by utilizing reactive distillation. The method comprises the following steps: (1) treating a filler layer of a reaction section; (2) mounting a filler layer; (3) rectification treatment: feeding the organic silicon low-boiling-point substance, methyl trichlorosilane, trimethylchlorosilane and a cocatalyst methyl hydrogen dichlorosilane into the surface of a solid catalytic filler layer in a reaction section in a rectification tower to perform disproportionation reaction, and enabling dimethyl dichlorosilane generated in the disproportionation reaction and mixed gas which is not completely reacted to flow downwards to form mixed liquid, wherein one part of the mixed liquid is extracted through a tower kettle discharge pipe and enters a rectification raw material unit for separation treatment, the other part of the mixed liquid is extracted through a tower kettle bypass pipe and is heated by a reboiler to form steam, the steam enters a rectification tower, and low-boiling-point gas which is not completely reacted in the disproportionation reaction and mainly comprises trimethylchlorosilane is extracted through a tower top discharge pipe and conveyed to a condenser. The method has the advantages of being short in process, high in product yield, low in operation cost and capable of achieving continuous and efficient operation.

Description

technical field [0001] The invention belongs to the technical field of organosilicon production technology, and in particular relates to a method for treating organosilicon low boilers by reactive distillation. Background technique [0002] Organosilicon materials are a kind of semi-organic and semi-inorganic polymer compounds with Si-O bonds as the main chain and organic groups as side chains on Si atoms. Therefore, they have both the advantages of organic and inorganic substances. It has been widely used in aerospace, military technology, electrical and electronic industry, textile and paper making, construction industry, chemical industry, metal and paint industry, medicine and medical treatment. Methylchlorosilane, methyltrichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, tetramethylsilane, etc.) are important monomers in organosilicon production, of which dimethyldichlorosilane has the mainstay status. In the method for producing dimethylchlorosilane synth...

Claims

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Application Information

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IPC IPC(8): C07F7/12C07F7/20
CPCC07F7/125C07F7/20Y02P20/10
Inventor 赵生艳吴杰李文静黄杰李兴贵余艳琼符李庚何宇王彬宇李加旺何娇
Owner 云南能投硅材科技发展有限公司
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