Cold plasma gas phase preparation method of tin dioxide nanoparticles

Abstract

The invention discloses a cold plasma gas phase preparation method of tin dioxide nanoparticles, and relates to the field of new materials. The cold plasma gas phase preparation method of the tin dioxide nanoparticles is characterized by comprising the following specific steps: sequentially introducing inert gas, oxygen and a tin-containing compound into a plasma cavity to obtain the tin dioxide nanoparticles, wherein the tin-containing compound is introduced into the plasma reaction cavity through carrier gas; and the mixed gas is excited by using a radio frequency source. The crystallinity of the SnO2 nanoparticles prepared by the method is adjustable from an amorphous state to a crystalline state, the size is smaller and can reach 5 nm or below, the size distribution is more uniform, and the standard deviation of the size is smaller than 20% of the average size.

Description

technical field [0001] The invention relates to the field of new materials, in particular to a cold plasma gas phase preparation method of tin dioxide nanoparticles. Background technique [0002] Tin dioxide (SnO 2 ) is a wide bandgap (3.6eV), N-type direct bandgap semiconductor material, which has good electron transport ability and visible light transmission ability. –593) and other fields have a very wide range of uses. [0003] As we all know, the ultrafine particle technology of materials, especially the preparation of extremely small size (<5 nanometers) nanoparticles, and their unique surface effects and small size effects can endow materials with new properties and uses. Many techniques have been proposed and used for SnO 2 However, these methods have some inherent problems. Traditional solid-phase methods such as mechanical ball milling are difficult to obtain ultrafine nanoparticles of <100 nm and uniform size. Liquid-phase preparation methods such as hy...

AI Technical Summary

Problems solved by technology

Traditional solid-phase methods such as mechanical ball milling are difficult to obtain ultrafine nanoparticles with uniform size <100 nm

Liquid-phase preparation methods such as hydrothermal method (Cryst.GrowthDes.2013, 13, 4, 1685–1693), sol-gel method (Physica B 2021, 613, 412987) can obtain nanoparticles with smaller sizes, but nanoparticles It is difficult to effectively control the crystallinity and purity, and the yield is not high

Gas-phase preparation methods such as chemical vapor deposition (CVD) are suitable for the preparation of SnO 2 Thin-film materials, but self-supporting nanoparticle materials with extremely small grain sizes are not available

These technical shortcomings limit the SnO 2 Applications of Nanoparticles in Semiconductor Devices and Energy Fields

Images