Light-emitting device and manufacturing method thereof
A technology of light-emitting devices and manufacturing methods, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., can solve problems such as large contact resistance, QLED device efficiency and life roll-off, and reduce contact resistance and improve stability sex, efficiency-enhancing effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0095] This embodiment provides a light emitting device and a manufacturing method thereof.
[0096] The structure of the light emitting device is:
[0097] ITO / Ag / ITO / PEDOT / TFB / carbon quantum dot interface layer / red quantum dot light-emitting layer / zinc oxide / silver / encapsulation layer.
[0098] A method for manufacturing a light emitting device includes the following steps:
[0099] (1) A substrate with an ITO (15nm) / Ag (140nm) / ITO (15nm) electrode is used, and the substrate is cleaned and dried according to a standard method.
[0100] (2) Deposit PEDOT on the substrate by inkjet printing method, and dry to obtain a hole injection layer with a thickness of 20nm;
[0101] (3) Deposit TFB on the hole injection layer obtained in step (2) by inkjet printing, and dry to obtain a hole transport layer with a thickness of 30 nm.
[0102] (4) Print a layer of KOH solution on the hole transport layer obtained in step (3) by using an inkjet printing method, and soak the hole transpo...
Embodiment 2
[0108] This embodiment provides a light emitting device and a manufacturing method thereof.
[0109] The structure of the light emitting device is:
[0110] ITO / PEDOT / TFB / carbon nanotube interface layer / blue quantum dot light-emitting layer / zinc oxide / silver / encapsulation layer.
[0111] A method for manufacturing a light emitting device includes the following steps:
[0112] (1) A substrate with an ITO (50nm) electrode is used, and the substrate is cleaned and dried according to a standard method.
[0113] (2) Deposit PEDOT on the substrate by inkjet printing method, and dry to obtain a hole injection layer with a thickness of 20nm;
[0114] (3) Deposit TFB on the hole injection layer obtained in step (2) by inkjet printing, and dry to obtain a hole transport layer with a thickness of 30 nm.
[0115] (4) Print a layer of KOH solution on the hole transport layer obtained in step (3) by using an inkjet printing method, and soak the hole transport layer in the KOH solution fo...
Embodiment 3
[0121] This embodiment provides a light emitting device and a manufacturing method thereof.
[0122] The structure of the light emitting device is:
[0123] ITO / Ag / ITO / PEDOT / TFB / carbon fiber interface layer / red quantum dot light-emitting layer / zinc oxide / silver / encapsulation layer.
[0124] A method for manufacturing a light emitting device includes the following steps:
[0125] (1) Using ITO(15nm) / Ag(140nm) / ITO(15nm) electrodes, clean the ITO / Ag / ITO substrate according to the standard method, and dry it.
[0126] (2) Deposit PEDOT on the substrate by inkjet printing method, and dry to obtain a hole injection layer with a thickness of 20nm;
[0127] (3) Deposit TFB on the hole injection layer obtained in step (2) by inkjet printing, and dry to obtain a hole transport layer with a thickness of 30 nm.
[0128] (4) Print a layer of KOH solution on the hole transport layer obtained in step (3) by using an inkjet printing method, and soak the hole transport layer in the KOH solu...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
| concentration | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


