Photosensitive resin, application thereof and preparation method of tooth retainer
A photosensitive resin, selected technology, applied in dentistry, orthodontics, orthodontics, etc., can solve problems such as nausea, vomiting, poor sensory impression of patients, loss of retainer, etc., to shorten the time of chairside operation, Avoid discomfort, high precision effect
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2022-03-15
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Abstract
Description
technical field
[0001] The invention relates to the field of materials, in particular to a photosensitive resin, its application and a preparation method of a tooth retainer. Background technique
[0002] In orthodontic clinical work, patients who have finished treatment need to make a retainer, the purpose is to maintain the effect of correction and prevent the tendency of teeth to return to their original deformity. Therefore, it is recommended that patients wear it for life after treatment to ensure the stability of the treatment effect. The types of retainers include Harley retainers and transparent thermocompression retainers, and transparent thermocompression retainers are the main ones. At present, the transparent hot-pressed retainer is mainly obtained by making an impression, pouring a plaster model, and hot-pressing after trimming the model. The retention effect of the transparent thermocompression retainer is better, but in the clinical investigation, it was fou...
Examples
Embodiment 1
[0031] The raw material components of photosensitive resin in the present embodiment include:
[0032]
[0033] The esters are a mixture of lauryl acrylate and polyethylene glycol acrylate in a mass ratio of 1:1.
[0034] The photoinitiator is benzyl dimethyl ketal.
[0035] The isocyanate is toluene diisocyanate.
[0036] The polyol is a polyester polyol with a number average molecular weight of 50,000.
[0037] The chain extender is ethylenediamine.
[0038] The chitosan oligomer is O-carboxymethyl deacetylated polysaccharide, the number average molecular weight is 10000, and the degree of deacetylation is greater than 0.5.
[0039] The amine catalyst is bis(2-dimethylaminoethyl)ether and N,N-dimethylethanolamine.
Embodiment 2
[0041] The raw material components of photosensitive resin in the present embodiment include:
[0042]
[0043] The esters are a mixture of lauryl acrylate and polyethylene glycol acrylate in a mass ratio of 1:2.
[0044] The photoinitiator is diphenyl (2,4,6-trimethylbenzoyl)-phosphine oxide.
[0045] The isocyanate is toluene diisocyanate.
[0046] The polyol is a polyester polyol with a number average molecular weight of 50,000.
[0047] The chain extender is ethylenediamine.
[0048] The chitosan oligomer is O-carboxymethyl deacetylated polysaccharide, the number average molecular weight is 10000, and the degree of deacetylation is greater than 0.5.
[0049] The amine catalyst is bis(2-dimethylaminoethyl)ether and N,N-dimethylethanolamine.
Embodiment 3
[0051] The raw material components of photosensitive resin in the present embodiment include:
[0052]
[0053]
[0054] The esters are a mixture of lauryl acrylate and polyethylene glycol acrylate in a mass ratio of 1:2.
[0055] The photoinitiator is diphenyl (2,4,6-trimethylbenzoyl)-phosphine oxide.
[0056] The isocyanate is 1,6-hexamethylene diisocyanate.
[0057] The polyol is a polyester polyol with a number average molecular weight of 50,000.
[0058] The chain extender is ethylenediamine.
[0059] The chitosan oligomer is O-carboxymethyl deacetylated polysaccharide, the number average molecular weight is 10000, and the degree of deacetylation is greater than 0.5.
[0060] The amine catalyst is bis(2-dimethylaminoethyl)ether and N,N-dimethylethanolamine.