Flexible grating film and preparation method and application thereof
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A grating and thin film technology, applied in the field of grating production, can solve the problems of easy damage, thickness and precision can not be guaranteed, and achieve the effect of smooth surface, regular shape error, low cost production
Pending Publication Date: 2022-03-18
HUAZHONG UNIV OF SCI & TECH
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[0004] Flexible gratings are usually made by pouring polymers such as PDMS onto the template of the nano-grating structure, but the thickness and precision cannot be guaranteed to be uniform, and different polymers have different adhesion to the template. Very prone to breakage
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[0033] The present invention improves the preparation process of the existing flexible grating film, and prepares the flexible grating film by stripping the grid substrate layer, so as to achieve the invention goals of regulating the stripping effect of the flexible grating film, adapting to lenses of different sizes and curvatures, and simplifying the processing technology. The general implementation method is to make a photoresist grid on a glass substrate by photolithography, deposit silicon nitride in the photoresist grid to form a silicon nitride grid substrate, and coat the silicon nitride grid substrate The coated polymer is cured to form a film, and the flexible grating film is prepared after peeling off.
[0034] Factors affecting the preparation of PI grating films mainly involve several factors such as master material, master surface characterization, process method, and process parameters. In order to make the material of the grating master plate obtain satisfactor...
Embodiment 1
[0047] A preparation method for a flexible grating film, specifically comprising the steps of:
[0048] In the first step, the glass substrate is ultrasonically cleaned and dried with deionized water and isopropanol;
[0049] In the second step, the photoresist is evenly spin-coated on the glass substrate, and the rotation speed is 1000r-3s, 4000r-35s;
[0050] The third step is to use a photolithography machine to expose the grating pattern mask on the photoresist twice, and the time is 1.5s and 20s;
[0051] The fourth step is to soak the photoresist plate in the developer solution for 50s, and form a grid pattern structure after development;
[0052] In the fifth step, use PECVD at 100°C to deposit silicon nitride material on the substrate layer of the grid pattern structure for 10 minutes and 48 seconds;
[0053] The sixth step is to use acetone, DMAC, and DMF to remove the remaining photoresist to form a silicon nitride grid pattern substrate layer;
[0054] The sevent...
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Abstract
The invention belongs to the field of grating manufacturing, and particularly relates to a flexible grating film and a preparation method and application thereof, and the preparation method comprises the steps: preparing high-temperature-resistant silicon nitride or silicon dioxide grating grids on a glass substrate through photoetching; coating a transparent polymer on the grating grids, curing to form a film, and stripping a polymer film to obtain a flexible grating film; wherein the adhesive force between the transparent polymer film and the contact material thereof is regulated and controlled by selecting the material of the grating bar lattice and the deposition process thereof, so that the shape and the size of the polymer film are not changed before and after the polymer film is stripped. In order to enable a grating mother set material to tolerate PI curing high temperature, on the basis that a grating lattice pattern photoresist mother set is manufactured through a photoetching process, silicon nitride which can tolerate high temperature and is stable in character is deposited to serve as the grating mother set, flexible PI curing film forming is achieved, and an obtained grating film sample is smooth in surface, uniform in thickness and high in yield. The bottom hollow grating strip lattice structure is regular in pattern shape and small in error, and adapts to lenses of different sizes and curvatures.
Description
technical field [0001] The invention belongs to the field of grating production, and more specifically relates to a flexible grating film and its preparation method and application. Background technique [0002] With the development of nanotechnology, nanoscale flexible gratings are widely used in optical fiber communication, photonic crystal, wide viewing angle film, naked eye 3D, data storage, optical fiber sensor, etc. field. At present, a variety of nanoscale flexible gratings with different materials and different processes have been prepared, and related technical fields have become one of the important directions for the innovation and development of flexible electronics technology. [0003] At present, there are two main methods of making gratings: machine-engraved gratings and holographic gratings. Machine-engraved grating is to use a grating scribing tool to carve grating lines. This method is less costly, but the quality is slightly lower, ghost lines may be pr...
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