Double-layer chiral micro-nano structure and preparation method thereof

A micro-nano structure and chirality technology, applied in optics, instruments, optical components, etc., can solve the problem that the molecular self-assembly laser direct writing method cannot prepare nano-scale structural features, and it is difficult to prepare artificial chiral surface plasmon structures. It is difficult to solve the problem of high difficulty, and achieves the effect of good application prospect, flexible and convenient application, and simplified preparation process steps.

Pending Publication Date: 2022-03-29
XIAN UNIV OF POSTS & TELECOMM
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Problems solved by technology

[0005] In the preparation of double-layer chiral micro-nano structures, the molecular self-assembly method cannot be completed, and the laser direct writing method cannot prepare nano-sized structural features. This is because the laser wavelength of the laser direct writing method determines the The aggregate size of nanostructures, but th

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  • Double-layer chiral micro-nano structure and preparation method thereof
  • Double-layer chiral micro-nano structure and preparation method thereof
  • Double-layer chiral micro-nano structure and preparation method thereof

Examples

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[0031] Example 1

[0032] The present invention provides a double-layer chiral micro-structure structure, such as figure 1 As shown, including a substrate, a second noble metal layer, a transparent dielectric layer, and a first noble metal layer. The transparent medium layer is placed on the substrate, and the material of the substrate is a conductive glass, which is convenient for electron beam etching, so that the charge can be turned on unregistered in the etching sample due to charge aggregation. The material of the transparent medium layer is PMMA. The first precious metal layer is placed on the transparent dielectric layer, and the material of the first precious metal layer is silver or gold. Such as figure 2 As shown, the first noble metal layer and the transparent dielectric layer are provided with a penetrated L-shaped hole, that is, the L-shaped holes penetrate the first noble metal layer and the transparent dielectric layer to reach the surface of the substrate. The L-s...

Example Embodiment

[0034] Example 2

[0035] On the basis of Example 1, the thickness of the nano rod is smaller than the thickness of the transparent dielectric layer, so that there is a certain distance between the lower surface of the first noble metal layer and the upper surface of the nano rod, and the first noble metal layer is applied to the nanorod. Coupling is a circular seithlier of transmitted light. Preferably, the distance between the lower surface of the first noble metal layer and the upper surface of the nano rod is greater than 10 nanometers, less than 240 nm, to facilitate coupling between the film and the nanorod.

Example Embodiment

[0036] Example 3

[0037] Based on Example 2, a double chiral micro-structure having a specific morphological parameter was designed, and the transmissive spectrum, circular chromogenic spectrum of the double chiral microena structure was calculated using the COMSOL finite element software. The charge distribution at resonance mode is used to illustrate and explain the core principle of the present invention.

[0038]The material of the first precious metal layer and the second precious metal layer is silver. The transparent medium layer is PMMA. The material of the substrate is a conductive glass and a refractive index is 1.45. The thickness of the first precious metal layer is 60 nm. The length of the first arm of the hole is 260 nm and the width is 80 nm. The second arm of the hole is 320 nm and the width is 80 nm. The L-shaped hole has a period of 600 nm and 600 nm. The transparent medium layer has a thickness of 60 nm. The thickness of the nano rod is the same as the thicknes...

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Abstract

The invention relates to the field of preparation of chiral micro-nano structures, in particular to a double-layer chiral micro-nano structure and a preparation method thereof.The upper layer is a first precious metal layer provided with L-shaped holes, the lower layer is a second precious metal layer provided with nanorods, different couplings are generated between the L-shaped holes and the nanorods under irradiation of different circular polarized light, and therefore the double-layer chiral micro-nano structure is obtained. Therefore, the resonance intensity is different, and the transmissivity is different, so that the strong circular dichroism is generated. According to the preparation method, the double-layer chiral micro-nano structure can be prepared only through one-time electron beam etching and one-time evaporation of the precious metal material, materials and time are saved, and the preparation process steps are simplified. Besides, dynamic regulation and control of circular dichroism can be realized, secondary evaporation can be carried out on the basis of the structure, regulation and control of the thickness of a structural film and the thickness of the nanorod are realized, application is flexible and convenient, and the method has a good application prospect in the field of preparation of chiral micro-nano structures.

Description

technical field [0001] The invention relates to the field of preparation of chiral micro-nano structures, in particular to a double-layer chiral micro-nano structure and a preparation method thereof. Background technique [0002] The artificial chiral surface plasmon micro-nanostructure has a stronger interaction with light, and has important applications in many fields such as analytical chemistry, biosensing, and circular polarization devices. [0003] At present, the technologies for preparing artificial chiral surface plasmon micro-nano structures mainly include electron beam etching, laser direct writing, and molecular self-assembly. Electron beam etching can be used to prepare planar artificial chiral surface plasmon micro-nanostructures with high precision. Laser direct writing can be used to prepare micron-scale three-dimensional artificial chiral surface plasmonic micro-nanostructures, such as helical or tapered metal helices. The molecular self-assembly method li...

Claims

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Application Information

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IPC IPC(8): G02B5/30G02B1/08
CPCG02B5/3041G02B5/3058G02B1/08
Inventor 王勇凯白瑜张霄桐董军郑益朋
Owner XIAN UNIV OF POSTS & TELECOMM
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