Se-Cr2S3 two-dimensional material, preparation method and application
A technology of se-cr2s3 and two-dimensional materials, applied in the field of Se-Cr2S3 two-dimensional materials and preparation, can solve the problems of limitations, low hole mobility of nanosheets, long photoresponse time, etc., and achieve improved mobility and preparation methods Simple and feasible, the effect of controllable doping concentration
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[0057] Among them, Se-Cr 2 S 3 The preparation method of the field effect transistor comprises the following steps:
[0058] Se-Cr prepared by vapor deposition method 2 S 3 A Cr / Au electrode was vapor-deposited on the two-dimensional material, and the thickness of the Cr / Au electrode was 10 nm / 50 nm.
[0059] A kind of Se-Cr proposed by the present invention 2 S 3 The preparation method of two-dimensional materials, single-crystal Se-Cr with thickness up to a single layer was obtained by a simple atmospheric pressure chemical vapor deposition method 2 S 3 The two-dimensional material has a thickness as thin as 1.8 nm and a size of 4-30 μm. It is a single crystal, with high quality, controllable doping concentration and good reproducibility. The preparation method is simple and feasible, and is suitable for the preparation of other two-dimensional metallic materials. Reference is provided. The present invention successfully enhances Cr through Se doping 2 S 3 Mobility...
Embodiment 1
[0062] Se-Cr 2 S 3 Preparation of nanosheets:
[0063] The first porcelain boat 4 loaded with S powder and Se powder on both sides is placed in the upstream high temperature constant temperature zone 2 of the quartz tube 1 (the volatilization temperature of the S powder is preferably 200 ° C, and the volatilization temperature of the Se powder is preferably 300 ° C), Contains CrCl 3 The second porcelain boat 5 of the powder is placed in the center of the downstream high temperature constant temperature zone 3 (CrCl 3 The volatilization temperature of the powder is preferably 750 ° C), and a piece of fluorphlogopite is used as Se-Cr 2 S 3 growth substrates, in which S powder, Se powder and CrCl 3The mass ratio of the powder is 15:1:5 (0.015g / 0.001g / 0.005g);
[0064] Before heating, the air in the quartz tube 1 is exhausted by argon gas, and then the upstream high temperature constant temperature zone 2 and the downstream high temperature constant temperature zone 3 are he...
Embodiment 2
[0069] Compared with Example 1, the difference is: the substrate temperature (CrCl 3 The volatilization temperature of the powder) is 800 °C (that is, the deposition temperature is 800 °C), Se powder, S powder and CrCl 3 The mass ratio of the powder is 1:15:5 (0.001g / 0.015g / 0.005g), the corresponding flow rate is 120 / 15sccm, the deposition time is 15min, and the H 2 Access only during the isothermal phase. Image 6 for the prepared Se-Cr 2 S 3 Optical schematic diagram of nanosheet, Se-Cr 2 S 3 The thickness distribution of the nanosheets is uniform, the corresponding thickness is 10-30 nm, and the size is 10-20 μm. in, Image 6 The scale bar in is 20 μm.
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