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Device and process for preparing micro-nano powder

A nano-powder and process technology, applied in the preparation of nano-powders and micro-fields, can solve the problems of inability to adjust the relative position, large metal powder particles, and insignificant effects, and achieve easy cooling, small particle size, and uniform particles. Effect

Pending Publication Date: 2022-06-24
山东铝谷产业技术研究院有限公司
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] Chinese patent (publication number CN2488622Y, device for producing nano-metal powder) provides a device for producing nano-materials with plasma. The device mainly uses high-frequency power supply discharge to generate plasma arc as a heat source to vaporize metal or alloy materials. Then it is cooled and condensed by the collector to generate nano-powder, but the relative position between the plasma gun and the crucible of this device cannot be adjusted and the particles of the prepared metal powder are relatively large (~100 microns), requiring additional feeders and intermediate frequency Induction coil, and the above-mentioned device can only be used to prepare metal micron-scale powder
Since the movement of the arc spot has a lot to do with the distribution of the magnetic field, an axial magnetic field composed of a permanent magnet is usually applied to the back of the cathode target to constrain the movement of the arc spot and improve the stability of the arc discharge, but the effect is not obvious

Method used

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  • Device and process for preparing micro-nano powder
  • Device and process for preparing micro-nano powder
  • Device and process for preparing micro-nano powder

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Experimental program
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Effect test

Embodiment 1

[0064] In this embodiment, the preparation process of nano powder is as follows:

[0065] First evacuate until the vacuum degree in the vacuum chamber reaches 6×10 -3 When Pa, pass argon gas and maintain the gas pressure in the vacuum chamber at 1.0Pa; adjust the current of the confining magnetic field coil to 2.0A, corresponding to the magnetic induction intensity of 200 Gauss; turn on the switch of the forbidden beam magnetic field rotating device, and adjust the current of the focusing magnetic field electromagnetic coil I to 4.0A, corresponding to the magnetic induction intensity of 400 Gauss; adjust the current of the focusing magnetic field electromagnetic coil II to 6.0A, corresponding to the magnetic induction intensity of 600 Gauss; then adjust the flow of argon to keep the vacuum chamber pressure at 0.5Pa. Turn on the cooling water of the vacuum wall, and pass gas into the high-speed uniform air field. The flow rates of the high-speed uniform air field I8 and the hig...

Embodiment 2

[0068] In the present embodiment, the preparation process of the micron powder is as follows:

[0069] First evacuate until the vacuum degree in the vacuum chamber reaches 1×10 -2 When Pa, pass argon gas and maintain the gas pressure in the vacuum chamber at 2.0Pa; adjust the current of the confinement magnetic field coil to 1.0A, corresponding to the magnetic induction intensity of 100 Gauss; turn on the switch of the rotating device of the forbidden beam magnetic field; adjust the current of the electromagnetic coil I of the focusing magnetic field to 2.0A, corresponding to the magnetic induction intensity of 200 Gauss; adjust the current of the focusing magnetic field electromagnetic coil II to 3.0A, corresponding to the magnetic induction intensity of 300 Gauss; then adjust the flow of argon to keep the vacuum chamber pressure at 1.0Pa. The vacuum wall cooling water is turned on, and gas is introduced into the high-speed uniform air field. The flow rates of the high-speed ...

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Abstract

The invention belongs to the field of preparation of micro and nano powder, and particularly relates to a device and a process for preparing micro and nano powder based on a vacuum cold cathode arc target technology (metal target vapor arc in a vacuum environment), an electromagnetic field constraint plasma beam forming technology and a high-speed uniform flow gas field technology. The device is a water-cooled vacuum device and consists of a magnetic field arranged outside a vacuum chamber, an electric arc source cathode target material corresponding to the vacuum chamber, and a high-speed uniform flow gas field, an annular porous cooler and a powder collector which are arranged in the vacuum chamber, and a focused plasma beam moves to the opposite annular porous cooler; and meanwhile, the ion beam current in the annular porous cooler is further cooled by the high-speed uniform-flow gas field and is blown to the collector. According to the invention, rapid preparation of uniform micro / nano powder can be realized, and the method is a new application of arc ion plating in preparation of micro / nano powder.

Description

technical field [0001] The invention belongs to the field of micro- and nano-powder preparation, in particular to a technology for preparing a micro-powder based on a vacuum cold cathode arc target technology (metal target vapor arc in a vacuum environment), a plasma beam current technology constrained by an electromagnetic field and a high-speed uniform gas field technology , Nano-powder device and process. Background technique [0002] Nanomaterials refer to materials whose microstructures such as grains and grain boundaries can reach the nanoscale level. As the material is nanosized, the electronic structure and crystal structure of the material change, resulting in surface effects and exotic properties that macroscopic objects do not have, thus having a series of excellent electrical, magnetic, optical, mechanical and chemical properties. So it gets people's attention. Nano-powder materials are one of the new types of materials with broad application prospects. Because...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J19/08B22F9/14
CPCB01J19/087B01J19/088B22F9/14
Inventor 雷浩钱余海
Owner 山东铝谷产业技术研究院有限公司