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High-entropy alloy film on surface of bore of barrel and preparation method of high-entropy alloy film

A high-entropy alloy, barrel technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the problems of low thermal conductivity, ablation resistance and wear resistance need to be improved, etc. The effect of low thermal conductivity, avoiding thermal stress cracks and improving service life

Pending Publication Date: 2022-06-24
XIAN TECHNOLOGICAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, although the WMoTaNb refractory high-entropy alloy film has the advantages of high melting point, low thermal conductivity, and good thermal stability, its ablation resistance and wear resistance still need to be improved.

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  • High-entropy alloy film on surface of bore of barrel and preparation method of high-entropy alloy film
  • High-entropy alloy film on surface of bore of barrel and preparation method of high-entropy alloy film
  • High-entropy alloy film on surface of bore of barrel and preparation method of high-entropy alloy film

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preparation example Construction

[0028] The invention discloses a method for preparing a high-entropy alloy thin film on the surface of the inner bore of a barrel, comprising the following steps: ultrasonic cleaning and plasma cleaning are performed on a substrate in the inner bore of a barrel in sequence; a plasma sputtering method is adopted, and a WMoTaNb target is used for plasma cleaning. The WMoTaNb layer was deposited on the surface of the substrate in the inner bore of the barrel; the WMoTaNbSi gradient transition layer was deposited on the WMoTaNb layer based on the WMoTaNb target and the Si target by the plasma sputtering method; the power of the Si target during the deposition process was increased from 0W to the power threshold within the time threshold ; Using the plasma sputtering method, the WMoTaNbSi layer was deposited on the WMoTaNbSi gradient transition layer based on the WMoTaNb target and the Si target to obtain a high-entropy alloy thin film; the power of the Si target during the depositio...

Embodiment 1

[0038] This embodiment provides a method for preparing a refractory high-entropy alloy thin film that is resistant to ablation and wear. The thin film is composed of a WMoTaNb layer, a gradient transition layer and a WMoTaNbSi layer, and the film thickness is 5 μm. The specific preparation method is as follows:

[0039] (1) Sample pretreatment: Put the high-speed steel substrate into acetone for ultrasonic cleaning for 5 minutes, and then ultrasonically clean it with deionized water twice for 3 minutes each time. Finally, put the silicon wafer and the high-speed steel substrate into anhydrous ethanol for ultrasonic cleaning. Wash 2 times, 3min each time, dry for use.

[0040] (2) Preparation of thin film deposition: The cleaned silicon wafer and high-speed steel substrate are sent into a vacuum chamber equipped with WMoTaNb target and Si target. The WMoTaNb target is connected to the RF power supply, the Si target is connected to the DC power supply, and the target base distan...

Embodiment 2

[0047] This embodiment provides a method for preparing a refractory high-entropy alloy thin film that is resistant to ablation and wear. The thin film is composed of a WMoTaNb layer, a gradient transition layer and a WMoTaNbSi layer, and the film thickness is 3.5 μm. The specific preparation method is as follows:

[0048] (1) Sample pretreatment: put the high-speed steel substrate into acetone for ultrasonic cleaning for 5 minutes, then ultrasonically clean it with deionized water for 2 times, each cleaning for 3 minutes, and finally put the silicon wafer and the high-speed steel substrate into anhydrous ethanol for ultrasonic cleaning. Wash 2 times, 3min each time, dry for use.

[0049] (2) Preparation of thin film deposition: The cleaned silicon wafer and high-speed steel substrate are sent into a vacuum chamber equipped with WMoTaNb target and Si target. The WMoTaNb target is connected to the RF power supply, the Si target is connected to the DC power supply, and the target...

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Abstract

The invention discloses a high-entropy alloy film on the surface of a barrel inner bore and a preparation method of the high-entropy alloy film. A barrel inner bore base body is sequentially subjected to ultrasonic cleaning and plasma cleaning; a plasma sputtering method is adopted, and a WMoTaNb layer is deposited on the surface of the body tube inner bore base body subjected to plasma cleaning based on a WMoTaNb target; a plasma sputtering method is adopted, and a WMoTaNbSi gradient transition layer is deposited on the WMoTaNb layer on the basis of the WMoTaNb target and the Si target; a plasma sputtering method is adopted, a WMoTaNbSi layer is deposited on the WMoTaNbSi gradient transition layer on the basis of a WMoTaNb target and a Si target, and a high-entropy alloy film is obtained; the high-entropy alloy film is prepared on the surface of the inner bore to replace an original Cr coating, the high-entropy alloy film has the advantages of being high in melting point, low in heat conductivity, high in hardness, resistant to abrasion, good in high-temperature stability and the like, the problems that a traditional electroplating Cr coating is prone to generating thermal stress cracks and the like can be solved, and then the service life of the barrel is prolonged.

Description

technical field [0001] The invention belongs to the technical field of metal surface treatment, in particular to a high-entropy alloy film on the inner bore surface of a barrel and a preparation method thereof. Background technique [0002] As a suppression weapon in conventional warfare, artillery has an irreplaceable role. The barrel is the core component of the artillery system and determines the combat effectiveness of the artillery. While achieving long firing range, high initial velocity, and high firing rate, the high temperature, high pressure, and high-charge internal bore environment makes the barrel life problem increasingly prominent. In the case of ablation and wear of the barrel, the internal bore structure will change, so that the internal ballistic performance of the artillery will change (for example, the decrease in the muzzle velocity forces the range to decrease, or even the first close-in projectile occurs, etc.). At present, the ablation wear life of ...

Claims

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Application Information

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IPC IPC(8): C23C14/16C23C14/34C23C14/54
CPCC23C14/165C23C14/3492C23C14/3464C23C14/548
Inventor 邵文婷曹丽娜陈建杨巍卢帅丹何佳华
Owner XIAN TECHNOLOGICAL UNIV