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Titanium silicide coated glass with compound functions prepared by nitrogen protection under normal pressure and preparation method thereof

A technology of coated glass and nitrogen protection, applied in the field of online formation of high-performance titanium silicide coated glass and its preparation, can solve the problems of not obtaining high-reflection film, low-radiation coated glass, increasing production cost, etc., to eliminate glare Interference, reduce production costs, increase the effect of service life

Inactive Publication Date: 2007-01-10
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The patent does not indicate that the resulting TiSi 2 The structure and resistivity of the film, which have a very important impact on the infrared reflectivity, especially the reflectivity of the mid-to-far infrared, that is, the patent does not obtain TiSi with high reflectivity to the mid-to-far infrared. 2 Thin films, that is, TiSi, which does not obtain low-emissivity characteristics 2 Coated Glass
In addition, Gordon uses helium as the inert protective gas for the reaction, but the inert protective gas in the tin tank on the actual float online coated glass production line is nitrogen, which is different from the actual situation in industrial production, and helium is used as the inert protective gas for the reaction. Shielding gas will greatly increase production costs

Method used

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  • Titanium silicide coated glass with compound functions prepared by nitrogen protection under normal pressure and preparation method thereof
  • Titanium silicide coated glass with compound functions prepared by nitrogen protection under normal pressure and preparation method thereof

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Experimental program
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Effect test

Embodiment 1

[0048] Deposition temperature 680°C, TiCl 4 Constant temperature at 60°C, TiCl 4 The passing pipeline is kept warm to 70°C, and the reaction gas SiH is adjusted 4 / TiCl 4 The molar ratio is 2, SiH 4 : 10%, TiCl 4 : 5%, N 2 : 85%, the pressure of each gas at the inlet of the mixing chamber is 121325Pa, the deposition system pressure is maintained at 105000Pa, and the deposition time is about 10 seconds. Formation of TiSi on a glass substrate 2 film. See the attached table for the results.

Embodiment 2

[0050] Deposition temperature 680°C, TiCl 4 Constant temperature at 40°C, TiCl 4 The passing pipeline is kept warm to 50°C, and the reaction gas SiH is adjusted 4 / TiCl 4 The molar ratio is 6, SiH 4 : 6%, TiCl 4 : 1%, N 2 : 93%, the pressure of each gas at the inlet of the mixing chamber is 121325Pa, the deposition system pressure is maintained at 105000Pa, and the deposition time is about 10 seconds. Formation of TiSi on a glass substrate 2 and Si composite films. See the attached table for the results.

Embodiment 3

[0052] Deposition temperature 680°C, TiCl 4 Constant temperature at 35°C, TiCl 4 The passing pipeline is kept warm to 45°C, and the reaction gas SiH is adjusted 4 / TiCl 4 The molar ratio is 10, SiH 4 : 20%, TiCl 4 : 2%, N 2 : 78%, the pressure of each gas at the inlet of the gas mixing chamber is 121325Pa, the deposition system pressure is maintained at 105000Pa, and the deposition time is about 10 seconds. Formation of TiSi on a glass substrate 2 and Si composite films. See the attached table for the results.

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Abstract

The invention discloses a titanium silicide coated glass with compound functions prepared by nitrogen protection under normal pressure and preparation method, wherein the process comprises depositing a thin film onto the substrate of the common float glass or depositing a silicon thin film between them, by obtained titanium silicides and composite silicon thin film, or doping small amount of active carbon or nitrogen into the thin film, thus obtaining the composite thin film of titanium silicides composite silicon carbide or titanium carbide or titanium suicide composite silicon nitride or titanium nitride, the mechanical strength and chemical-resisting capacity of the coated glass can be improved substantially.

Description

technical field [0001] The invention relates to a preparation technology of titanium silicide coated glass, in particular to a normal pressure pyrolysis chemical vapor deposition method, nitrogen protection, on-line formation of high-performance titanium silicide coated glass and a preparation method thereof. Background technique [0002] With the improvement of the quality of modern life, people have higher and higher requirements for maintaining a comfortable indoor environment and protecting privacy, so coated glass came into being. At present, there are two main types of coated glass used as architectural glass curtain walls: one is dimming and heat-insulating coated glass, and the other is low-emissivity coated glass. [0003] Dimming and heat-insulating coated glass is mainly used to control sunlight and heat from entering the room in summer. It is known that the wavelength of the solar radiation spectrum is between 300 and 3000nm, and the distribution of the total he...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/22
Inventor 杜丕一杜军翁文剑韩高荣汪建勋
Owner ZHEJIANG UNIV