Titanium silicide coated glass with compound functions prepared by nitrogen protection under normal pressure and preparation method thereof
A technology of coated glass and nitrogen protection, applied in the field of online formation of high-performance titanium silicide coated glass and its preparation, can solve the problems of not obtaining high-reflection film, low-radiation coated glass, increasing production cost, etc., to eliminate glare Interference, reduce production costs, increase the effect of service life
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0048] Deposition temperature 680°C, TiCl 4 Constant temperature at 60°C, TiCl 4 The passing pipeline is kept warm to 70°C, and the reaction gas SiH is adjusted 4 / TiCl 4 The molar ratio is 2, SiH 4 : 10%, TiCl 4 : 5%, N 2 : 85%, the pressure of each gas at the inlet of the mixing chamber is 121325Pa, the deposition system pressure is maintained at 105000Pa, and the deposition time is about 10 seconds. Formation of TiSi on a glass substrate 2 film. See the attached table for the results.
Embodiment 2
[0050] Deposition temperature 680°C, TiCl 4 Constant temperature at 40°C, TiCl 4 The passing pipeline is kept warm to 50°C, and the reaction gas SiH is adjusted 4 / TiCl 4 The molar ratio is 6, SiH 4 : 6%, TiCl 4 : 1%, N 2 : 93%, the pressure of each gas at the inlet of the mixing chamber is 121325Pa, the deposition system pressure is maintained at 105000Pa, and the deposition time is about 10 seconds. Formation of TiSi on a glass substrate 2 and Si composite films. See the attached table for the results.
Embodiment 3
[0052] Deposition temperature 680°C, TiCl 4 Constant temperature at 35°C, TiCl 4 The passing pipeline is kept warm to 45°C, and the reaction gas SiH is adjusted 4 / TiCl 4 The molar ratio is 10, SiH 4 : 20%, TiCl 4 : 2%, N 2 : 78%, the pressure of each gas at the inlet of the gas mixing chamber is 121325Pa, the deposition system pressure is maintained at 105000Pa, and the deposition time is about 10 seconds. Formation of TiSi on a glass substrate 2 and Si composite films. See the attached table for the results.
PUM
| Property | Measurement | Unit |
|---|---|---|
| melting point | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 