Preparation of Yb-Gd-Ga doped garnet planar optical waveguide
A planar optical waveguide and garnet technology, applied in the direction of optical waveguide and light guide, can solve the problem that GGG crystals are difficult to process micron-scale wafers, and achieve good economic benefits and material saving effects
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Embodiment 1
[0019] Yb was prepared by pulsed laser deposition (PLD) as described above 3+ :GGG single crystal thin film device and specific process flow:
[0020] The size to be cleaned is 10×10mm 2 , double-sided polished pure YAG substrate 2 and Yb 3+ : GGG polycrystalline target 3 is sent into the pulsed laser deposition system;
[0021] Evacuate the cavity into an ultra-high vacuum, and then fill it with an oxygen atmosphere;
[0022] Heating the substrate to 600°C, passing the ArF excimer laser 1 with a pulse width of 25ns through the lens at 10J / cm 2 The energy density of the concentrated light is irradiated to the Yb in the device through the optical window 3+ : GGG polycrystalline target 3, the surface molecules of the target 3 are melted and evaporated to form a film on the pure YAG substrate 2, and high-quality Yb can be obtained after slow cooling 3+ : GGG film.
Embodiment 2
[0024] Yb was prepared by pulsed laser deposition (PLD) as described above 3+ :GGG single crystal thin film device and specific process flow:
[0025] The size to be cleaned is 10×10mm 2 , double-sided polished pure YAG substrate and Yb 3+ : The GGG polycrystalline target is sent into the pulsed laser deposition system;
[0026] Evacuate the cavity into an ultra-high vacuum, and then fill it with an oxygen atmosphere;
[0027] Heating the substrate to 900°C, passing the ArF excimer laser with a pulse width of 25ns through the lens at 10J / cm 2 The energy density of the concentrated light is irradiated to the Yb in the device through the optical window 3+ : GGG polycrystalline target, the target surface molecules are melted and evaporated to form a film on a pure YAG substrate, and high-quality Yb can be obtained after slow cooling 3+ : GGG planar optical waveguide.
Embodiment 3
[0029] Yb was prepared by pulsed laser deposition (PLD) as described above 3+ :GGG single crystal thin film device and specific process flow:
[0030] The size to be cleaned is 10×10mm 2 , double-sided polished pure YAG substrate and Yb 3+ : The GGG polycrystalline target is sent into the pulsed laser deposition system;
[0031] Evacuate the cavity into an ultra-high vacuum, and then fill it with an oxygen atmosphere;
[0032] Heating the substrate to 800°C, passing the ArF excimer laser with a pulse width of 25ns through the lens at 10J / cm 2 The energy density of the concentrated light is irradiated to the Yb in the device through the optical window 3+ : GGG polycrystalline target, the target surface molecules are melted and evaporated to form a film on a pure YAG substrate, and high-quality Yb can be obtained after slow cooling 3+ : GGG planar optical waveguide.
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