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Gas phase deposition equipment

A vapor deposition and equipment technology, applied in the field of deposition systems, can solve the problems of reducing moisture and oxygen, failure to vacuumize, and difficulty in making robot transfer operations, etc., and achieves the effect of easy processing

Inactive Publication Date: 2004-01-21
SEMICON ENERGY LAB CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when gloves are provided in the pretreatment chamber, the chamber cannot be evacuated and the operation is carried out at atmospheric pressure, there is a high possibility of contamination of impurities
Even when the transfer operation is performed inside a pretreatment chamber under a nitrogen atmosphere, it is difficult to minimize moisture and oxygen
Also, although it is possible to use a robot, it is difficult to manufacture a robot for the transfer operation due to the powder form of the vapor deposition material
Thus, it is difficult to carry out the steps of forming the EL element, that is, from the step of forming the EL layer above the lower electrode to the step of forming the upper electrode, by an integrated closed system that prevents the mixing of impurities.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0058] Figures 1A, 1B and 1C illustrate evaporation systems according to the invention. Fig. 1A is a sectional view in the X direction (a section obtained along the dotted line A-A '), Fig. 1B is a sectional view in the Y direction (a section obtained along the dotted line B-B'), and Fig. 1C is a top view. In addition, Figures 1A, 1B, and 1C show evaporation systems in evaporation.

[0059] Among Fig. 1A, 1B and 1C, deposition chamber 11 comprises plate supporting device 12, the evaporation source supporter 17 that evaporation baffle plate 15 is installed, is used for moving the device (not illustrated) of evaporation source supporter and is used for generating low-pressure atmosphere. installation. In addition, the deposition chamber 11 is installed with a plate 13 and an evaporation mask 14 .

[0060] In addition, plate support means 12 are provided for holding the evaporation mask 14 made of metal by gravitational force and thus the plate 13 arranged above the evaporation...

Embodiment approach 2

[0078] Next, a detailed description will be given of the configuration of the panel supporting device according to the present invention with reference to FIGS.

[0079] FIG. 3A1 shows a perspective view of a board support device 301 with a board 303 and a mask 302 installed, and FIG. 3A2 shows only the board support device 301 .

[0080] In addition, FIG. 3A3 shows a cross-sectional view of a plate support device mounted with a plate 303 and a mask 302 composed of a metal sheet (typically, Ti) having a height h of 10 mm and a width w of 1 mm-5 mm.

[0081] With the board support device 301, warping of the board or warping of the mask can be suppressed.

[0082] In addition, the shape of the plate supporting device 301 is not limited to that shown in FIGS. 3A1-3A3 , but may also be constituted by, for example, the shape shown in 3B2.

[0083] FIG. 3B2 shows an example of providing a portion that supports the end portion of the plate, and by the plate supporting means 305, the...

Embodiment approach 3

[0095] A description will be given of a system of a manufacturing method of filling the above container with refined evaporation material, carrying the container, and then directly installing the container in an evaporation system as a deposition apparatus with reference to FIG. 6 .

[0096] 6 illustrates manufacturers, typically a material manufacturer 618 (typically, a material manufacturer) that produces and refines an organic compound material as an evaporation material, and a manufacturer ( Typically, the manufacturer) 619.

[0097]First, an order 610 is made from a light emitting device manufacturer 619 to a material manufacturer 618 . Based on the order 610, the material manufacturer 618 refines to sublimate the evaporation material and fills the evaporation material 612 into the first container 611 in the form of refined high-purity powder. Afterwards, the material manufacturer 618 isolates the first container from the atmosphere so that additional impurities do not a...

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Abstract

The present invention provides a vapor deposition device suitable for multiface cutting by using a large area board, having a high efficiency of utilizing an EL material and excellent in uniformity of a film, wherein a board 13 and a vapor deposition mask 14 are mounted above board holding means 12, an interval between a vapor deposition source holder 17 and an object to be deposited (board 13) is narrowed to be equal to or smaller than 30 cm, preferably, equal to or smaller than 20 cm, further preferably, 5 through 15 cm and in vapor deposition, the vapor deposition source holder 17 is moved in the X direction or Y direction in accordance with an insulating member (referred to also as bank, partition wall) 10 and a shutter 15 is opened and closed to thereby form a film.

Description

field of invention [0001] The present invention relates to a deposition system for depositing a deposition material capable of being deposited by evaporation (hereinafter referred to as evaporation material), and a method of manufacturing a light emitting device typified by an organic light emitting element formed using the deposition system. Specifically, the present invention relates to a vacuum evaporation method and an evaporation system for deposition by evaporating evaporation materials from a plurality of evaporation sources provided facing a substrate. Background of the invention [0002] In recent years, research related to a light-emitting device having an EL element as a self-luminous light-emitting element has been very active. The light emitting device refers to an organic EL display (OELD) or an organic light emitting diode (OLED). Since these light-emitting devices have features such as fast response speed suitable for movie display, low voltage, low power co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05B33/10C23C14/04C23C14/12C23C14/24C23C14/56H01L51/40H01L51/50H01L51/56H05B33/14
CPCH01L51/56C23C14/24H01L51/001C23C14/56C23C14/246C23C14/042H01L51/0013H10K71/18H10K71/164H10K71/441H10K71/166H05B33/10H10K71/00
Inventor 山崎舜平
Owner SEMICON ENERGY LAB CO LTD
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