Unlock instant, AI-driven research and patent intelligence for your innovation.

Light, heat, electronic beam acid generating source containing 2, 1, 4,- heavy nitrogen naphthaquinone sulfuryl and preparing process thereof

A technology of naphthoquinone sulfonyl chloride and electron beam, which is applied in the direction of photomechanical equipment, photoplate making process of pattern surface, and photosensitive material used in optomechanical equipment, etc.

Inactive Publication Date: 2005-03-09
BEIJING NORMAL UNIVERSITY
View PDF1 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, almost all of them are used as anti-solvents in positive resists and PS plate photosensitive compositions, and they are rarely used as sources of photoacid generation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light, heat, electronic beam acid generating source containing 2, 1, 4,- heavy nitrogen naphthaquinone sulfuryl and preparing process thereof
  • Light, heat, electronic beam acid generating source containing 2, 1, 4,- heavy nitrogen naphthaquinone sulfuryl and preparing process thereof
  • Light, heat, electronic beam acid generating source containing 2, 1, 4,- heavy nitrogen naphthaquinone sulfuryl and preparing process thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0021] In the preparation method of the acid-generating source of the present invention, when utilizing the first type of material to synthesize 2,1,4-diazonaphthoquinone sulfonate compounds, a composite solvent must be used, such as dimethylformamide (DMF) and Acetone or a mixed solvent with dioxane in a weight ratio of 1:1. The solvent consumption is 5-10 times of reactant weight. The N-hydroxyimide compound and 2,1,4-diazonaphthoquinonesulfonyl chloride can be dissolved in a mixed solvent at one time, and then a tertiary amine catalyst is added dropwise at a temperature of 30-40°C; also The N-hydroxyimide compound can be dissolved in DMF first, the sulfonyl chloride compound can be dissolved in acetone or dioxane, and after mixing and stirring evenly, a tertiary amine catalyst is added dropwise for reaction. The tertiary amine catalyst used is preferably triethylamine or triethylenediamine, and its amount is greater than or equal to the mole number of 2,1,4-diazonaphthoqui...

Embodiment 1

[0030] Example 1 Synthesis of N-Hydroxyphthalimide (M-1)

[0031] Take 20 g (0.29 mol) of hydroxylamine hydrochloride, stir and dissolve in 78 ml of distilled water. Then slowly add 15.25 g (0.144 mol) of anhydrous sodium carbonate powder into the system. After it is completely dissolved, add 36.2g (0.24mol) of finely ground phthalic anhydride to the system in batches at 30-40°C. After the addition, raise the temperature of the system to above 90°C and maintain it for 30 minutes. Then cooling rapidly, a large amount of light yellow solid can be precipitated, suction filtered, washed, and dried at 60°C to obtain a light yellow needle-like solid with the structure shown in M-1, with a yield of 94%.

Embodiment 2

[0032] Example 2 Synthesis of N-Hydroxysuccinimide (M-2)

[0033] Take 10 g (0.14 mol) of hydroxylamine hydrochloride, stir and dissolve in 35 ml of water. Then slowly add 7.6g (0.07mol) of anhydrous sodium carbonate powder into the system. After all the solution was dissolved, 12.25 g (0.12 mol) of succinic anhydride was added in batches to the system at room temperature. After the addition, the temperature of the system was raised to reflux temperature, maintained for 2 hours, and then distilled to dryness under reduced pressure. Add 200ml of acetone to the flask, maintain the system at 40°C for extraction, and filter. The filtrate was concentrated, filtered, and dried at 60°C to obtain a yellow flaky or flesh-colored powder solid with the structure shown in M-2, and the yield was 67.4%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to an optical, thermal and electronic beam acid-producing source containing 2,1,4-diazonaphthaquinone sulfonyls. Said invention provides its general formula. The described acid-producing source is prepared by utilizing 2,1,4-diazonaphthaquinone sulfonyl chloride and described esterification mother body of grafting mother body through reaction. Said invention acid-producing source can be used as acid-producing source of near ultraviolet, deep ultraviolet and electronic beam photoresist, also can be used as optical acid-producing source of ArF laser (193nm) photoresist, also can be used as thermal acid-producing source for thermosensitive CTP plate material which can be undergone the processes of scanning by near infrared laser, photothermal conversion to produce heat and thermodecomposition to produce acid.

Description

technical field [0001] The invention belongs to the technical field of light, heat and electron beam acid generation source for chemical amplification imaging composition and its synthesis and preparation. More specifically, the present invention relates to photoacid generation source, thermal acid generation source and electron beam acid generation source for chemically amplified resist and heat-sensitive CTP plate making and its preparation method. technical background [0002] At the end of the 20th century, with the continuous improvement of the fineness of VLSI chip images, photoresists based on the principle of chemical amplification were widely used, and a key component of chemically amplified resists was the source of acid generation. The source of acid generation decomposes under the action of light, heat and electron beams to produce acid, and the generated acid further catalyzes the cross-linking and curing of the resin in the resist under normal temperature and h...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/016G03F7/021
Inventor 余尚先杨凌露张改莲杨金瑞
Owner BEIJING NORMAL UNIVERSITY