Method for preparing glass waveguide by ion mask

A technology of optical waveguide and mask, which is applied in the direction of optical waveguide and light guide, can solve the problems that cannot completely prevent high polarizability ions from entering the glass substrate and affect the performance of optical waveguide devices, and achieve the effect of easy implementation and improved performance

Inactive Publication Date: 2006-10-11
ZHEJIANG NANFANG COMM GROUP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] This method can effectively suppress the lateral diffusion of high polarizability ions, but the K + The ion diffusion region 6 cannot completely prevent high polarizability i

Method used

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  • Method for preparing glass waveguide by ion mask
  • Method for preparing glass waveguide by ion mask
  • Method for preparing glass waveguide by ion mask

Examples

Experimental program
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Effect test

Embodiment 1

[0030] Example 1: Fabrication of optical waveguides using low-temperature ion exchange technology

[0031] (1) Make an Al film with a thickness of 150-200nm on the front of the glass substrate by evaporation or sputtering, and then form an ion exchange window on the mask by photolithography and corrosion processes, and then place the glass substrate with the mask Piece into KNO 3 Ion exchange is carried out in the molten salt, the exchange temperature is 320 ° C, the exchange time is 10 hours, the K in the molten salt + K is formed in the glass substrate by thermal diffusion + ion diffusion area.

[0032] (2) After the glass substrate and the Al mask on the surface are cleaned, an Ag thin film with a thickness of 60-120 nm is fabricated on the glass substrate by evaporation or sputtering process.

[0033] (3) Put the glass substrate into dilute hydrochloric acid to etch the Al mask.

[0034] (4) Put the glass substrate with Ag thin film on the surface into AgNO 3 with NaN...

Embodiment 2

[0036] Example 2: Fabrication of an optical waveguide using a medium temperature ion exchange process

[0037] (1) Make an Al film with a thickness of 150-200nm on the front of the glass substrate by evaporation or sputtering, and then form an ion exchange window on the mask by photolithography and corrosion processes, and then place the glass substrate with the mask Piece into KNO 3 Ion exchange is carried out in the molten salt, the exchange temperature is 400 ° C, the exchange time is 5 hours, the K in the molten salt + K is formed in the glass substrate by thermal diffusion + ion diffusion area.

[0038] (2) After the glass substrate and the Al mask on the surface are cleaned, an Ag thin film with a thickness of 60-120 nm is fabricated on the glass substrate by evaporation or sputtering process.

[0039] (3) Put the glass substrate into dilute hydrochloric acid to etch the Al mask.

[0040] (4) Put the glass substrate with Ag thin film on the surface into AgNO 3 with ...

Embodiment 3

[0041] Example 3: Fabrication of an optical waveguide using a medium-temperature ion-exchange process

[0042] (1) Make an Al film with a thickness of 150-200nm on the front of the glass substrate by evaporation or sputtering, and then form an ion exchange window on the mask by photolithography and corrosion processes, and then place the glass substrate with the mask Piece into KNO 3 Ion exchange is carried out in the molten salt, the exchange temperature is 450 ° C, the exchange time is 1 hour, the K in the molten salt + K is formed in the glass substrate by thermal diffusion + ion diffusion area.

[0043] (2) After the glass substrate and the Al mask on the surface are cleaned, an Ag thin film with a thickness of 60-120 nm is fabricated on the glass substrate by evaporation or sputtering process.

[0044] (3) Put the glass substrate into dilute hydrochloric acid to etch the Al mask.

[0045] (4) Put the glass substrate with Ag thin film on the surface into AgNO 3 with N...

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Abstract

The invention discloses a method for producing glass optical waveguide with ion mask. Wherein, first using K+ ion exchange technique to form a K+ disperse area on the glass basic plate, as the mask of following ion exchange; then using mask inversion technique to form a film on the K+ ion disperse area, to baffle the dispersion of high-refractive ion that though the K+ disperse area in the following ion exchange process; at least, using fused salt with high-polarized ion to exchange ion, and attain high-refractive ion disperse area with improved shape on the glass basic plate. The invention can avoid film preparation and selective erosion technique; and since the film can completely stop the dispersion of high-polarized ion through the ion mask, the invention can attain better bar optical waveguide.

Description

technical field [0001] The invention relates to the fields of optical devices and integrated optics, in particular to a method for manufacturing a glass optical waveguide with an ion mask. Background technique [0002] Integrated optical circuit means that on the surface of the same substrate, optical waveguides are made of materials with a slightly higher refractive index, and various devices such as light sources and gratings are made on this basis. Through this integration, the miniaturization, weight reduction, stabilization and high performance of the optical system can be achieved. [0003] The commonly used integrated optical device preparation processes can be divided into two categories: one is the deposition method, including plasma enhanced chemical vapor deposition (PECVD), flame hydrolysis (FHD), sol-gel method (sol-gel), etc. Among them, the PECVD method is the most commonly used; the other is the diffusion method, including metal diffusion on the lithium niob...

Claims

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Application Information

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IPC IPC(8): G02B6/13
Inventor 郝寅雷王明华李锡华吕金良许坤良周海权
Owner ZHEJIANG NANFANG COMM GROUP
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