Gallium-nitride based multi-quantum well light-emitting diode n-type contact layer structure

Abstract

A structure for the n-type contact layer in the GaN-based MQW LEDs is provided. Instead of using Si-doped GaN as commonly found in conventional GaN-based MQW LEDs, the n-type contact layer provided by the present invention achieves high doping density (>1×1019 cm−3) and low resistivity through a superlattice structure combining two types of materials, AlmInnGa1-m-nN and AlpInqGa1-p-qN (0≦m, n<1, 0<p, q<1, p+q≦1, m<p), each having its specific composition and doping density. In addition, by controlling the composition of Al, In, and Ga in the two materials, the n-type contact layer would have a compatible lattice constant with the substrate and the epitaxial structure of the GaN-based MQW LEDs. This n-type contact layer, therefore, would not chap from the heavy Si doping, have a superior quality, and reduce the difficulties of forming n-type ohmic contact electrode. In turn, the GaN-based MQW LEDs would require a lower operation voltage.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention generally relates to the gallium-nitride based multi-quantum well light-emitting diodes and, more particularly, to the n-type contact layer structure of the gallium-nitride based multi-quantum well light-emitting diodes. [0003] 2. The Prior Arts [0004] Gallium-nitride (GaN) materials can achieve a wide range of band gaps by controlling the GaN-based materials' compositions. As such, various colored light-emitting diodes (LEDs), especially those blue or purple light LEDs that require wide band gaps, can be produced using GaN-based materials. These GaN-based LEDs therefore have been the research and development focus in recent years. [0005] Within conventional GaN-based LEDs, the active layers usually adopt a multi-quantum well (MQW) structure with GaN and indium-gallium-nitride (InxGa1-xN, 0≦x≦1) as potential wells. Photons are then generated through the recombination of the electrons and holes ...

AI Technical Summary

Benefits of technology

[0009] The present invention provides an epitaxial structure for the GaN-based MQW LEDs' n-type GaN contact layers, so that the limitations and disadvantages from the prior arts can be obviated practically.

[0010] The theory behind the present invention would be apparent from a study of the attached FIG. 1. FIG. 1 is a graph showing group III nitrides in a coordinate system of lattice constant and band gap. As shown in FIG. 1, GaN has a lattice constant a0 around 3.18 Å. Extended from GaN's position inFIG. 1 vertically along a lattice matching line, it can be seen that aluminum-indium-gallium-nitride (AlxInyGa1-x-yN, 0≦x, y<1, x+y≦1) has an identical lattice constant to but has a wider band gap than that of GaN. Then, instead of using Si-doped GaN, an n-type contact layer having high doping density (>1×1019 cm3) and low resistivity can be achieved through a superlattice structure combining two types of material, AlmInnGa1-m-nN and AlpInqGa1-p-qN (0≦m, n<1, 0<p, q<1, p+q≦1, m<p), each having its specific composition and doping density. In addition, by controlling the composition of Al, In, and Ga in the two materials, the n-type contact layer would have a compatible lattice constant with the substrate and the epitaxial structure of the GaN-based MQW LEDs. This n-type contact layer would not chap from the heavy Si doping, have a superior quality, and reduce the difficulties of forming n-type ohmic contact electrode. In turn, the GaN-based MQW LEDs would require a lower operation voltage.

Problems solved by technology

However, it is observed that, during practical fabricating processes, the n-type GaN contact layer would be easily chapped and snapped, as the heavy Si doping causes incompatible lattice constants among the epitaxial layers of the GaN-based MQW LEDs, that, in turn, causes excessive stress to develop and accumulate.

These undesirable results not only affect the epitaxial quality of the GaN-based MQW LEDs, but also add additional difficulties in the formation of the n-type ohmic contact electrode on top of the n-type GaN contact layer.

In summary, these shortcomings would result in an inferior electrical characteristics or conductivity in the GaN-based MQW LEDs.

In the worst case, the GaN-based MQW LEDs would be un-useable.

Therefore, the GaN-based MQW LEDs containing this type of conventional n-type GaN contact layers, on one hand, require a higher operation voltage and, thereby, consume more powers.

On the other hand, the GaN-based MQW LEDs would have a low yield rate, causing the production cost to rise.

Additionally, pin holes are easier to form in the heavily Si-doped n-type GaN contact layer, causing the semiconducting characteristics of the GaN-based MQW LEDs to deteriorate.

Current leakage is also possible during the operation of the GaN-based MQW LEDs.

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