Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications

a moment dilution and demagnetizing field technology, applied in the field of composite magnetic structure, can solve the problems of destroying a thin tunnel barrier made of alox, mgo, or the like, and using external magnetic fields generated by current carrying lines to switch the magnetic moment direction of the free layer becomes problematic, and achieves high mr ratio, high mr ratio, and high mr ratio

Active Publication Date: 2012-11-08
TAIWAN SEMICON MFG CO LTD
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Benefits of technology

[0022]The objective of the present invention is to provide a magnetic element with a composite free layer having out-of-plane magnetization in which satura

Problems solved by technology

As the size of MRAM cells decreases, the use of external magnetic fields generated by current carrying lines to switch the magnetic moment direction of the free layer

Method used

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  • Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications
  • Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications
  • Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications

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Embodiment Construction

[0038]The present invention is based on the discovery that the perpendicular demagnetizing field in a free layer may be reduced by inserting a moment diluting material thereby increasing the perpendicular anisotropy field to improve thermal stability and lower the RA value in an out-of-plane embodiment. Although the exemplary embodiments depict bottom spin valve and top spin valve configurations in a MTJ element, the present invention also encompasses a dual spin valve as appreciated by those skilled in the art. The magnetic element including the aforementioned composite free layer as a digital information storage layer may be employed in a MTJ as part of a STT-MRAM or other spintronic device, or as propagation medium for a domain wall in a domain wall motion device. The terms interfacial perpendicular anisotropy and surface perpendicular anisotropy may be used interchangeably. A Ms reducing layer is also referred to as a moment diluting layer.

[0039]In a related patent application S...

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Abstract

A magnetic element is disclosed that has a composite free layer with a FM1/moment diluting/FM2 configuration wherein FM1 and FM2 are magnetic layers made of one or more of Co, Fe, Ni, and B and the moment diluting layer is used to reduce the perpendicular demagnetizing field. As a result, lower resistance x area product and higher thermal stability are realized when perpendicular surface anisotropy dominates shape anisotropy to give a magnetization perpendicular to the planes of the FM1, FM2 layers. The moment diluting layer may be a non-magnetic metal like Ta or a CoFe alloy with a doped non-magnetic metal. A perpendicular Hk enhancing layer interfaces with the FM2 layer and may be an oxide to increase the perpendicular anisotropy field in the FM2 layer. The magnetic element may be part of a spintronic device or serve as a propagation medium in a domain wall motion device.

Description

RELATED PATENT APPLICATIONS[0001]This application is related to the following: Docket #HMG10-023, Ser. No. 12 / 927,939, filing date Nov. 30, 2010; and Docket #HMG10-038, Ser. No. 12 / 931,866, filing date Feb. 11, 2011, assigned to a common assignee and herein incorporated by reference in their entirety.FIELD OF THE INVENTION[0002]The invention relates to a composite magnetic structure having a layer that reduces saturation magnetization Ms in order to lower the perpendicular demagnetizing field thereby enhancing the perpendicular anisotropy field to lower the resistance-area (RA) product, and increase thermal stability independently of the moment, volume, or crystalline anisotropy for a device with perpendicular to plane magnetization.BACKGROUND OF THE INVENTION[0003]Magnetoresistive Random Access Memory (MRAM), based on the integration of silicon CMOS with magnetic tunnel junction (MTJ) technology, is a major emerging technology that is highly competitive with existing semiconductor ...

Claims

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Application Information

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IPC IPC(8): H01L29/82H01L21/00
CPCH01L43/08H01L43/10G11C11/161H01L43/02H01L43/12H10N50/85H10N50/10H10N50/01H10N50/80
Inventor JAN, GUENOLETONG, RU YINGKULA, WITOLD
Owner TAIWAN SEMICON MFG CO LTD
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