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Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications

a moment dilution and demagnetizing field technology, applied in the field of composite magnetic structure, can solve the problems of destroying a thin tunnel barrier made of alox, mgo, or the like, and using external magnetic fields generated by current carrying lines to switch the magnetic moment direction of the free layer becomes problematic, and achieves high mr ratio, high mr ratio, and high mr ratio

Active Publication Date: 2012-11-08
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0022]The objective of the present invention is to provide a magnetic element with a composite free layer having out-of-plane magnetization in which saturation magnetization is reduced to improve thermal stability independently of the moment, volume, or crystalline anisotropy while maintaining a high MR ratio.
[0023]According to one embodiment, these objectives are achieved by providing a magnetic tunnel junction (MTJ) comprised of a pinned layer, a tunnel barrier layer, and a magnetic element including a composite free layer having a Ms reducing (moment diluting) layer formed between two magnetic layers (FM1 and FM2). The FM1 layer has a surface that forms a first interface with the tunnel barrier while the FM2 layer has a surface facing away from the tunnel barrier that forms a second interface with a perpendicular Hk enhancing layer which is employed to increase the perpendicular anisotropy field within the FM2 layer. There is a capping layer as the uppermost layer in the MTJ stack. In an embodiment wherein the perpendicular Hk enhancing layer is an oxide such as MgO, the capping layer is preferably a metal with an energy of oxide formation considerably greater than that of the perpendicular Hk enhancing layer. Thus, the MTJ has a bottom spin valve configuration that may be represented by seed layer / AFM layer / pinned layer / tunnel barrier / composite free layer / perpendicular Hk enhancing layer / capping layer. Both of the first and second interfaces provide strong perpendicular surface anisotropy for FM1 and FM2 layers, respectively.

Problems solved by technology

As the size of MRAM cells decreases, the use of external magnetic fields generated by current carrying lines to switch the magnetic moment direction of the free layer becomes problematic.
This high current density, which is required to induce the spin-transfer effect, could destroy a thin tunnel barrier made of AlOx, MgO, or the like.

Method used

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  • Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications
  • Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications
  • Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications

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Embodiment Construction

[0038]The present invention is based on the discovery that the perpendicular demagnetizing field in a free layer may be reduced by inserting a moment diluting material thereby increasing the perpendicular anisotropy field to improve thermal stability and lower the RA value in an out-of-plane embodiment. Although the exemplary embodiments depict bottom spin valve and top spin valve configurations in a MTJ element, the present invention also encompasses a dual spin valve as appreciated by those skilled in the art. The magnetic element including the aforementioned composite free layer as a digital information storage layer may be employed in a MTJ as part of a STT-MRAM or other spintronic device, or as propagation medium for a domain wall in a domain wall motion device. The terms interfacial perpendicular anisotropy and surface perpendicular anisotropy may be used interchangeably. A Ms reducing layer is also referred to as a moment diluting layer.

[0039]In a related patent application S...

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Abstract

A magnetic element is disclosed that has a composite free layer with a FM1 / moment diluting / FM2 configuration wherein FM1 and FM2 are magnetic layers made of one or more of Co, Fe, Ni, and B and the moment diluting layer is used to reduce the perpendicular demagnetizing field. As a result, lower resistance x area product and higher thermal stability are realized when perpendicular surface anisotropy dominates shape anisotropy to give a magnetization perpendicular to the planes of the FM1, FM2 layers. The moment diluting layer may be a non-magnetic metal like Ta or a CoFe alloy with a doped non-magnetic metal. A perpendicular Hk enhancing layer interfaces with the FM2 layer and may be an oxide to increase the perpendicular anisotropy field in the FM2 layer. The magnetic element may be part of a spintronic device or serve as a propagation medium in a domain wall motion device.

Description

RELATED PATENT APPLICATIONS[0001]This application is related to the following: Docket #HMG10-023, Ser. No. 12 / 927,939, filing date Nov. 30, 2010; and Docket #HMG10-038, Ser. No. 12 / 931,866, filing date Feb. 11, 2011, assigned to a common assignee and herein incorporated by reference in their entirety.FIELD OF THE INVENTION[0002]The invention relates to a composite magnetic structure having a layer that reduces saturation magnetization Ms in order to lower the perpendicular demagnetizing field thereby enhancing the perpendicular anisotropy field to lower the resistance-area (RA) product, and increase thermal stability independently of the moment, volume, or crystalline anisotropy for a device with perpendicular to plane magnetization.BACKGROUND OF THE INVENTION[0003]Magnetoresistive Random Access Memory (MRAM), based on the integration of silicon CMOS with magnetic tunnel junction (MTJ) technology, is a major emerging technology that is highly competitive with existing semiconductor ...

Claims

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Application Information

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IPC IPC(8): H01L29/82H01L21/00
CPCH01L43/08H01L43/10G11C11/161H01L43/02H01L43/12H10N50/85H10N50/10H10N50/01H10N50/80
Inventor JAN, GUENOLETONG, RU YINGKULA, WITOLD
Owner TAIWAN SEMICON MFG CO LTD
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