15 results about "Partial field" patented technology

A field facet mirror for an illumination optic for EUV projection lithography is designed for arrangement in the area of ​​a field plane of the illumination optic. The field facet mirror has a plurality of field facets (25 T ) for the reflective transfer of illumination light (16) from a light source to an object field with a predetermined distribution of illumination light intensity over a field height of the object field. At least some of the field facets are designated as partial field illumination facets (25 T ) executed. These have a partial field illumination facet reflection section (31) for the reflective transfer of the illumination light (16) TF ) as useful illumination light from the light source towards a partial object field section of the object field that is smaller than the object field. Furthermore, the respective partial field illumination facet (25 T) an output-coupling facet reflection section (32) for the reflective transfer of the illumination light (16 AK ) as output illumination light from the light source to at least one output coupling component. The partial field illumination facet reflection section (31) on the one hand and the output coupling facet reflection section (32) on the other hand are fixed components of the respective partial field illumination facet (25). T ) represents. This results in a field facet mirror, which allows for a demanding specification of an illumination intensity distribution over at least one object field coordinate without undesirable side effects.

A first lens group comprises at least two balsaming lenses, and a first lens is used for correcting partial spherical aberration and partial field curvature of the dual-waveband confocal microscope objective; the second lens group comprises at least one balsaming lens and is used for receiving the light beams from the first lens group and correcting partial spherical aberration and partial chromatic aberration of the dual-band confocal microscope objective; the third lens group comprises at least three independent lenses, and is used for converging the light beams from the first lens group and the second lens group and correcting the residual spherical aberration of the dual-band confocal microscope objective; and the lenses in the first lens group, the second lens group and the third lens group are coaxially arranged in sequence along an optical axis. Compared with an existing product, the dual-waveband confocal microscope objective has the advantages of being dual-waveband confocal, high in resolution, long in working distance, large in view field range and the like.

The application discloses an inner baffle of a coaxial partial field optical system and a design method thereof, and solves the technical problems that the existing inner baffle cannot shield or absorb stray light generated by the reflection of light entering a primary mirror and the primary mirror, especially stray light generated near the edge of a secondary mirror or the edge of a secondary mirror support, and that the stray light directly enters a receiving reflection area of the primary mirror, thereby seriously affecting the detection result formed by receiving the light, and that a least square method is used for three-dimensional profile fitting, and the fitting process is complex. The inner baffle of the coaxial partial field optical system comprises an inner baffle body arranged between the primary mirror and the secondary mirror, wherein the inner baffle body comprises an inner baffle interface, a plurality of light blocking rings and a connecting piece, the plurality of light blocking rings are arranged in parallel and sequentially arranged along the optical axis direction, two adjacent light blocking rings are axially connected through the connecting piece, the connecting part of the two is located in the corresponding end face of the light blocking ring, one end of the inner baffle interface is connected with one of the plurality of light blocking rings close to the primary mirror, and the other end is connected with the primary mirror.

The invention discloses a lateral logging forward modeling simulation method and system based on finite element and infinite element coupling, and relates to the technical field of geophysical logging, the method comprises the following steps: establishing a two-dimensional lateral logging forward modeling model corresponding to an axisymmetric anisotropic stratum, carrying out grid division, and carrying out finite element calculation outside a finite element calculation area of the two-dimensional lateral logging forward modeling model; arranging a mapping infinite element as a boundary unit; calculating a total stiffness matrix; according to the total stiffness matrix, applying an equipotential boundary condition to each metal electrode of the logging instrument on a node in the two-dimensional lateral logging forward modeling model; and solving the two-dimensional lateral logging forward model after the equipotential boundary condition is applied to obtain each sub-field which is sequentially and independently emitted by each emission electrode, and synthesizing and focusing all the sub-fields to obtain lateral logging response. According to the method, the mapping infinite element is adopted as the boundary unit, the boundary unit is coupled with the finite element calculation area, and forward modeling of lateral logging can be rapidly and accurately achieved.

A field facet mirror for an illumination optics unit for EUV projection lithography is embodied for arrangement in the region of a field plane of the illumination optics unit. The field facet mirror has a plurality of field facets (25T) for the reflective transfer of illumination light (16) from a light source towards an object field with a predetermined distribution of an illumination light intensity over a field height of the object field. At least some of the field facets are embodied as partial field illumination facets (25T). These have a partial field illumination facet reflection portion (31) for the reflective transfer of the illumination light (16TF) as used illumination light from the light source towards a partial object field portion of the object field that is smaller than the object field. Furthermore, the respective partial field illumination facet (25T) has an output-coupling facet reflection portion (32) for the reflective transfer of the illumination light (16AK) as output-coupled illumination light from the light source towards at least one output-coupling component. Firstly the partial field illumination facet reflection portion (31) and secondly the output-coupling facet reflection portion (32) represent component parts of the respective partial field illumination facet (25T) that are fixed with respect to each other. This yields a field facet mirror, by means of which a challenging specification of an illumination intensity distribution over at least one object field coordinate is achieved without unwanted consequential effects.

An imprinting method includes reducing a distance between a template and a substrate. While reducing the distance the method includes controlling a state of one or more of the template and substrate, and detecting intensity of light reflected from both the template and the substrate. The method includes determining whether a predetermined light condition has been satisfied based on the detected light intensity, in a case of determining that the predetermined light condition has been satisfied, determining an estimated initial contact point between the template and the substrate based on the detected light intensity, and in a case that a difference between the estimated initial contact point and a target initial contact point is greater than a predetermined threshold amount, changing the state based on the difference.

A holographic display system for a motor vehicle includes a light source for generating a coherent light beam and a spatial light modulator (SLM) having a two-dimensional array of pixels. The two-dimensional array of pixels modulates the coherent light beam to generate a plurality of sub-frames, each sub-frame being associated with one of a plurality of partial fields of view. The system further includes a scanner for directing the sub-frames onto an associated sub-patch of a display surface. The system further includes a computer having a memory including instructions such that a processor is programmed to control the two-dimensional array of pixels of the SLM to generate the sub-frames. The processor is further programmed to control the scanner to direct the sub-frames onto the associated sub-patch of the display surface and to display a reconstructed image within a full field of view, which includes each of the partial fields of view.

This invention discloses a backscattering light testing device and method based on biased field of view measurement. The device includes a light source module, an optical path control and scattering measurement module, and a signal modulation and detection module. The light source module includes a high-power laser, a collimating mirror, an aperture, and a chopper. The laser, collimating mirror, aperture, and chopper are coaxially arranged on the incident light path. The optical path control and scattering measurement module includes a centrally apertured reflector, a sample under test, and an extinction cavity. The centrally apertured reflector includes a central transparent area and a ring-shaped reflective surface. The signal modulation and detection module includes a photodetector and a lock-in amplifier. The lock-in amplifier is connected to the photodetector and the chopper, respectively, and is used to extract the off-axis scattered light signal. The off-axis scattered light signal is used to infer the backscattered light. This device completely avoids beam splitter scattering at the physical level, has strong noise suppression capability, and features superior measurement principle, simple system structure, large dynamic range, and wide applicability.

An imprinting method includes moving a template having a shaping surface towards a substrate based on position information, upon reaching a first distance from the substrate, switching from moving the template based on position information to moving based on force information, contacting the shaping surface with formable material such that the total surface area of the shaping surface overlaps the substrate, moving the template towards the substrate based on position information, upon reaching a second distance from the substrate, switching from moving the template based on position information to moving based on force information, contacting, with the shaping surface, the formable material, wherein the shaping surface overlaps an edge of the substrate. The second distance is equal to the first distance adjusted based on at least one control parameter associated with contacting the formable material with the shaping surface when the shaping surface overlaps the edge of the substrate.

The invention relates to a system (44) for identifying a semiconductor assembly (2) comprising a substrate (4), wherein the substrate (4) has a first substrate metallization (8). In order to simplify the system (44) and to achieve an improved cost position, it is proposed that at least one first partial code (28) is applied to the first substrate metallization (8) in a first partial field of view (30) and a second partial code (32) is applied to a second partial field of view (34), wherein an optical sensor (46) is configured to detect a surface (54) of the semiconductor assembly (2) having the first substrate metallization (8) of the substrate (4), and at least one processor (50) is configured to extract the partial codes (28, 32) from the surface (54) of the semiconductor assembly (2), to combine said partial codes to form a code word, to decode to form a data word, and to identify the semiconductor assembly (2) on the basis of the decoded data word.

The invention relates to an illumination optical unit (11) having two facet mirrors (6, 7) for reflecting illumination light (2) from an EUV light source (2). The second facet mirror (7) has a second individual mirror (34) forming a second facet (25), which images a set of individual mirrors (26) of the first facet mirror (6) forming the first facet at least into a partial field of the object field (8) via a partial beam (30) of the illumination light (3). The intensity sensor device (31) is used to measure a dependency of an intensity of the illumination light (3) incident on the object field (8) on at least one detection object field coordinate (x). The intensity sensor arrangement has individual sensor mirrors (21S) of the first facet mirror (6), which are assigned to a plurality of different object field positions (xi) along the detection object field coordinates (x). The individual sensor mirror (21S) is designed to reflect the illumination light (3) to an intensity sensor (32i) of the intensity sensor device (31). The result is an illumination optical unit in which the respective intensity coordinate dependent measurements can be performed accurately and in parallel with the operation of use of the illumination optical unit.

The application discloses a chemical shift encoding imaging method based on a conversion region and local field map iteration, and the method comprises the following steps: acquiring an initial image, determining an initial field map solution of a conversion region based on the initial image, taking the initial field map solution as initial information, performing local field map iteration along at least two set directions, obtaining a target field map solution based on the local field map iteration results corresponding to each set direction, determining a first chemical component signal and a second chemical component signal based on the target field map solution, and performing chemical shift encoding imaging based on the first chemical component signal and / or the second chemical component signal. Through multi-dimensional local field map iteration, the incorrect field map information is independently transmitted along different dimensions, the incorrect information transmitted along different directions is excluded, the correct information consistent in each dimension is reserved, the separated chemical component signal is more accurate in the case that the initial information is inaccurate, and the chemical shift encoding imaging effect is improved.

The imprint method includes reducing the distance between the template and the substrate. [Solution] The method includes the steps of controlling the state of one or more of the template and the substrate while reducing the distance, and detecting the light intensity of the light reflected from both the template and the substrate. The method further includes the steps of determining whether predetermined light conditions are met based on the detected light intensity, determining an estimated initial contact point between the template and the substrate based on the detected light intensity if it is determined that the predetermined light conditions are met, and changing the state based on the difference if the difference between the estimated initial contact point and the target initial contact point is greater than a predetermined threshold.

A method and apparatus for acquiring image data, wherein in the apparatus a transmitting unit comprising a plurality of transmitting elements and a receiving unit comprising more than one receiving pixel are provided, wherein between the transmitting unit and the receiving unit a receiving optics is arranged for superimposing an image of the whole partial scene of the field of view onto an imaging area.

An optoelectronic sensor includes a plurality of light sources for generating transmission light, including at least a first and a second light source. The optoelectronic sensor includes transmission optics for projecting transmission light into the field of view and at least one detector for detecting transmission light reflected by the object. A photonic network has a plurality of irradiation points to each of which transmission light, in particular in each case of exactly one light source, can be supplied. The transmission light exits into the transmission optics and ultimately exits into the field of view. A plurality of irradiation points that are arranged directly next to one another or that are directly adjacent are in this respect configured to irradiate transmission light into partial fields of view, in particular different partial fields of view and / or a plurality of partial fields of view arranged next to one another or are adjacent.