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21 results about "Partial field" patented technology

Diffraction optical waveguide and near-to-eye display device

ActiveCN223308416UCoupling light guidesGratingPartial field
The embodiment of the utility model discloses a diffraction optical waveguide and a near-to-eye display device. The diffractive optical waveguide comprises at least one waveguide substrate, and the refractive index of the waveguide substrate is 1.4-2.2; the at least one coupling-in grating area is located on the waveguide substrate, the coupling-in grating area comprises a coupling-in grating, and the period of the coupling-in grating ranges from 150 nm to 700 nm; image light enters the coupling-in grating area of the waveguide substrate, and part of image light corresponding to the field angle is diffracted into the waveguide substrate through the coupling-in grating and is coupled out to human eyes after being totally reflected and transmitted in the waveguide substrate. According to the diffraction optical waveguide provided by the embodiment of the utility model, through setting a proper coupling grating period, the diffraction optical waveguide realizes propagation of partial field angle light, and at least two partial field angles are superposed to form a complete field angle.
Owner:SEEV OPTOELECTRONICS TECHNOLOGY CO LTD

Field faceted mirror for an illumination optic for EUV projection lithography

PendingDE102024211125A1MirrorsPhotomechanical exposure apparatusPartial fieldOptic system
A field facet mirror for an illumination optic for EUV projection lithography is designed for arrangement in the area of ​​a field plane of the illumination optic. The field facet mirror has a plurality of field facets (25 T ) for the reflective transfer of illumination light (16) from a light source to an object field with a predetermined distribution of illumination light intensity over a field height of the object field. At least some of the field facets are designated as partial field illumination facets (25 T ) executed. These have a partial field illumination facet reflection section (31) for the reflective transfer of the illumination light (16) TF ) as useful illumination light from the light source towards a partial object field section of the object field that is smaller than the object field. Furthermore, the respective partial field illumination facet (25 T) an output-coupling facet reflection section (32) for the reflective transfer of the illumination light (16 AK ) as output illumination light from the light source to at least one output coupling component. The partial field illumination facet reflection section (31) on the one hand and the output coupling facet reflection section (32) on the other hand are fixed components of the respective partial field illumination facet (25). T ) represents. This results in a field facet mirror, which allows for a demanding specification of an illumination intensity distribution over at least one object field coordinate without undesirable side effects.
Owner:CARL ZEISS SMT GMBH

Dual-band confocal microobjective

A first lens group comprises at least two balsaming lenses, and a first lens is used for correcting partial spherical aberration and partial field curvature of the dual-waveband confocal microscope objective; the second lens group comprises at least one balsaming lens and is used for receiving the light beams from the first lens group and correcting partial spherical aberration and partial chromatic aberration of the dual-band confocal microscope objective; the third lens group comprises at least three independent lenses, and is used for converging the light beams from the first lens group and the second lens group and correcting the residual spherical aberration of the dual-band confocal microscope objective; and the lenses in the first lens group, the second lens group and the third lens group are coaxially arranged in sequence along an optical axis. Compared with an existing product, the dual-waveband confocal microscope objective has the advantages of being dual-waveband confocal, high in resolution, long in working distance, large in view field range and the like.
Owner:福建至期光子科技有限公司

An inner baffle of coaxial off-axis field optical system and its design method

PendingCN122652873APartial fieldOptical axis
The application discloses an inner baffle of a coaxial partial field optical system and a design method thereof, and solves the technical problems that the existing inner baffle cannot shield or absorb stray light generated by the reflection of light entering a primary mirror and the primary mirror, especially stray light generated near the edge of a secondary mirror or the edge of a secondary mirror support, and that the stray light directly enters a receiving reflection area of the primary mirror, thereby seriously affecting the detection result formed by receiving the light, and that a least square method is used for three-dimensional profile fitting, and the fitting process is complex. The inner baffle of the coaxial partial field optical system comprises an inner baffle body arranged between the primary mirror and the secondary mirror, wherein the inner baffle body comprises an inner baffle interface, a plurality of light blocking rings and a connecting piece, the plurality of light blocking rings are arranged in parallel and sequentially arranged along the optical axis direction, two adjacent light blocking rings are axially connected through the connecting piece, the connecting part of the two is located in the corresponding end face of the light blocking ring, one end of the inner baffle interface is connected with one of the plurality of light blocking rings close to the primary mirror, and the other end is connected with the primary mirror.
Owner:XIAN INST OF OPTICS & PRECISION MECHANICS CHINESE ACAD OF SCI

Lateral logging forward modeling method and system based on finite element and infinite element coupling

PendingCN122046759AImplement forward simulation quickly and accuratelyAvoid errorsDesign optimisation/simulationMetallic electrodeWell logging
The invention discloses a lateral logging forward modeling simulation method and system based on finite element and infinite element coupling, and relates to the technical field of geophysical logging, the method comprises the following steps: establishing a two-dimensional lateral logging forward modeling model corresponding to an axisymmetric anisotropic stratum, carrying out grid division, and carrying out finite element calculation outside a finite element calculation area of the two-dimensional lateral logging forward modeling model; arranging a mapping infinite element as a boundary unit; calculating a total stiffness matrix; according to the total stiffness matrix, applying an equipotential boundary condition to each metal electrode of the logging instrument on a node in the two-dimensional lateral logging forward modeling model; and solving the two-dimensional lateral logging forward model after the equipotential boundary condition is applied to obtain each sub-field which is sequentially and independently emitted by each emission electrode, and synthesizing and focusing all the sub-fields to obtain lateral logging response. According to the method, the mapping infinite element is adopted as the boundary unit, the boundary unit is coupled with the finite element calculation area, and forward modeling of lateral logging can be rapidly and accurately achieved.
Owner:CHINA NAT PETROLEUM CORP +1

Field facet mirror for an illumination optics unit for EUV projection lithography

PCT designated stageWO2026109310A1MirrorsPhotomechanical exposure apparatusPartial fieldMechanical engineering
A field facet mirror for an illumination optics unit for EUV projection lithography is embodied for arrangement in the region of a field plane of the illumination optics unit. The field facet mirror has a plurality of field facets (25T) for the reflective transfer of illumination light (16) from a light source towards an object field with a predetermined distribution of an illumination light intensity over a field height of the object field. At least some of the field facets are embodied as partial field illumination facets (25T). These have a partial field illumination facet reflection portion (31) for the reflective transfer of the illumination light (16TF) as used illumination light from the light source towards a partial object field portion of the object field that is smaller than the object field. Furthermore, the respective partial field illumination facet (25T) has an output-coupling facet reflection portion (32) for the reflective transfer of the illumination light (16AK) as output-coupled illumination light from the light source towards at least one output-coupling component. Firstly the partial field illumination facet reflection portion (31) and secondly the output-coupling facet reflection portion (32) represent component parts of the respective partial field illumination facet (25T) that are fixed with respect to each other. This yields a field facet mirror, by means of which a challenging specification of an illumination intensity distribution over at least one object field coordinate is achieved without unwanted consequential effects.
Owner:CARL ZEISS SMT GMBH

semiconductor structure

ActiveCN115347048BSemiconductor structurePartial field
The present invention provides a semiconductor structure, including a substrate, a first well, a second well, a first doped region, a second doped region, a first gate structure, a first insulating layer and a first field plate structure. The first well and the second well are arranged in the substrate. The first doped region is arranged in the first well. The second doped region is arranged in the second well. The first gate structure is arranged between the first doped region and the second doped region. The first insulating layer covers part of the first well and part of the first gate structure. The first field plate structure is arranged on the first insulating layer and partially overlaps with the first gate structure, wherein the first field plate structure is divided into a first partial field plate and a second partial field plate separated from each other along a first direction. The present application can flexibly configure the on-resistance and the total gate charge by dividing the field plate based on design requirements to obtain the required device performance. In addition, the on-resistance and the total gate charge can also be flexibly configured to obtain the best optimization indicators.
Owner:VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION

Method and System for Shaping Partial Fields

PendingUS20260147272A1Photomechanical apparatusPartial fieldEngineering
An imprinting method includes reducing a distance between a template and a substrate. While reducing the distance the method includes controlling a state of one or more of the template and substrate, and detecting intensity of light reflected from both the template and the substrate. The method includes determining whether a predetermined light condition has been satisfied based on the detected light intensity, in a case of determining that the predetermined light condition has been satisfied, determining an estimated initial contact point between the template and the substrate based on the detected light intensity, and in a case that a difference between the estimated initial contact point and a target initial contact point is greater than a predetermined threshold amount, changing the state based on the difference.
Owner:CANON KK

Holographic display system for motor vehicles

A holographic display system for a motor vehicle includes a light source for generating a coherent light beam and a spatial light modulator (SLM) having a two-dimensional array of pixels. The two-dimensional array of pixels modulates the coherent light beam to generate a plurality of sub-frames, each sub-frame being associated with one of a plurality of partial fields of view. The system further includes a scanner for directing the sub-frames onto an associated sub-patch of a display surface. The system further includes a computer having a memory including instructions such that a processor is programmed to control the two-dimensional array of pixels of the SLM to generate the sub-frames. The processor is further programmed to control the scanner to direct the sub-frames onto the associated sub-patch of the display surface and to display a reconstructed image within a full field of view, which includes each of the partial fields of view.
Owner:GM GLOBAL TECHNOLOGY OPERATIONS LLC

A backscattering light testing device and method based on partial field measurement

PendingCN122331001ABeam splitterPhotodetector
This invention discloses a backscattering light testing device and method based on biased field of view measurement. The device includes a light source module, an optical path control and scattering measurement module, and a signal modulation and detection module. The light source module includes a high-power laser, a collimating mirror, an aperture, and a chopper. The laser, collimating mirror, aperture, and chopper are coaxially arranged on the incident light path. The optical path control and scattering measurement module includes a centrally apertured reflector, a sample under test, and an extinction cavity. The centrally apertured reflector includes a central transparent area and a ring-shaped reflective surface. The signal modulation and detection module includes a photodetector and a lock-in amplifier. The lock-in amplifier is connected to the photodetector and the chopper, respectively, and is used to extract the off-axis scattered light signal. The off-axis scattered light signal is used to infer the backscattered light. This device completely avoids beam splitter scattering at the physical level, has strong noise suppression capability, and features superior measurement principle, simple system structure, large dynamic range, and wide applicability.
Owner:XIAN INST OF OPTICS & PRECISION MECHANICS CHINESE ACAD OF SCI

Method and System for Shaping Partial Fields

PendingUS20260027756A1Photomechanical apparatusPartial fieldMechanical engineering
An imprinting method includes moving a template having a shaping surface towards a substrate based on position information, upon reaching a first distance from the substrate, switching from moving the template based on position information to moving based on force information, contacting the shaping surface with formable material such that the total surface area of the shaping surface overlaps the substrate, moving the template towards the substrate based on position information, upon reaching a second distance from the substrate, switching from moving the template based on position information to moving based on force information, contacting, with the shaping surface, the formable material, wherein the shaping surface overlaps an edge of the substrate. The second distance is equal to the first distance adjusted based on at least one control parameter associated with contacting the formable material with the shaping surface when the shaping surface overlaps the edge of the substrate.
Owner:CANON KK

System for identifying a semiconductor assembly comprising a substrate

The invention relates to a system (44) for identifying a semiconductor assembly (2) comprising a substrate (4), wherein the substrate (4) has a first substrate metallization (8). In order to simplify the system (44) and to achieve an improved cost position, it is proposed that at least one first partial code (28) is applied to the first substrate metallization (8) in a first partial field of view (30) and a second partial code (32) is applied to a second partial field of view (34), wherein an optical sensor (46) is configured to detect a surface (54) of the semiconductor assembly (2) having the first substrate metallization (8) of the substrate (4), and at least one processor (50) is configured to extract the partial codes (28, 32) from the surface (54) of the semiconductor assembly (2), to combine said partial codes to form a code word, to decode to form a data word, and to identify the semiconductor assembly (2) on the basis of the decoded data word.
Owner:SIEMENS AG

Illumination optical unit and method for measuring dependency of intensity of illumination light incident on object field on at least one coordinate of detection object field using such illumination optical unit

The invention relates to an illumination optical unit (11) having two facet mirrors (6, 7) for reflecting illumination light (2) from an EUV light source (2). The second facet mirror (7) has a second individual mirror (34) forming a second facet (25), which images a set of individual mirrors (26) of the first facet mirror (6) forming the first facet at least into a partial field of the object field (8) via a partial beam (30) of the illumination light (3). The intensity sensor device (31) is used to measure a dependency of an intensity of the illumination light (3) incident on the object field (8) on at least one detection object field coordinate (x). The intensity sensor arrangement has individual sensor mirrors (21S) of the first facet mirror (6), which are assigned to a plurality of different object field positions (xi) along the detection object field coordinates (x). The individual sensor mirror (21S) is designed to reflect the illumination light (3) to an intensity sensor (32i) of the intensity sensor device (31). The result is an illumination optical unit in which the respective intensity coordinate dependent measurements can be performed accurately and in parallel with the operation of use of the illumination optical unit.
Owner:CARL ZEISS SMT GMBH

Chemical shift encoding imaging method based on conversion region and local field map iteration

The application discloses a chemical shift encoding imaging method based on a conversion region and local field map iteration, and the method comprises the following steps: acquiring an initial image, determining an initial field map solution of a conversion region based on the initial image, taking the initial field map solution as initial information, performing local field map iteration along at least two set directions, obtaining a target field map solution based on the local field map iteration results corresponding to each set direction, determining a first chemical component signal and a second chemical component signal based on the target field map solution, and performing chemical shift encoding imaging based on the first chemical component signal and / or the second chemical component signal. Through multi-dimensional local field map iteration, the incorrect field map information is independently transmitted along different dimensions, the incorrect information transmitted along different directions is excluded, the correct information consistent in each dimension is reserved, the separated chemical component signal is more accurate in the case that the initial information is inaccurate, and the chemical shift encoding imaging effect is improved.
Owner:SHENZHEN INST OF ADVANCED TECH CHINESE ACAD OF SCI

Atmospheric gravity wave interference imaging observation instrument based on birefringent crystal and imaging method

ActiveCN116736395BGravitational wave measurementICT adaptationGrismWollaston prism
The application relates to an atmospheric gravity wave interference imaging observation instrument based on a birefringent crystal, wherein a main optical axis direction of an incident light line is a z-axis direction, a direction perpendicular to the main optical axis into a room is an x-axis direction, and an xyz coordinate system satisfying a right-hand rule is constructed; the instrument comprises, in sequence along the incident light line, a front telescope, a first collimating mirror, an aperture segmentation and polarization combination structure, a wide-field delay module, a second telescope, a second collimating mirror, a roof prism, a Wollaston prism, an imaging mirror and a detector; the roof prism is arranged at a conjugate image position of an aperture diaphragm behind the second collimating mirror. The application adopts a polarization combination aperture segmentation mode, avoids splitting of an incident wide-field delay module light beam, makes the light beams of upper and lower parts be incident at the same angle, and solves the problems of limited detection field of view and undersampling of interference fringes in a partial field of view region in the prior art. The application greatly improves a usable field of view range of the system and reduces a wind speed inversion error.
Owner:CHENGDU UNIV OF INFORMATION TECH

Holographic display system for a motor vehicle and motor vehicle

Holographic display system (100) for a motor vehicle (106), wherein the holographic display system (100) comprises the following: a light source (126) for generating a coherent beam of light; a spatial light modulator (102), SLM (102) comprising a two-dimensional pixel array (104) with SLM resolution, wherein the two-dimensional pixel array (104) is encoded with holograms to diffract the coherent light and modulate the beam of coherent light to generate a plurality of subframes (130), each of the subframes (130) being associated with one of a plurality of partial viewfields (132); a display area (122) with a multitude of sections (124) and a computer (144) with: a processor (146) connected to the light source (126) and the SLM (102); and a memory (148) containing instructions such that the processor (146) is programmed to control at least the two-dimensional pixel array (104) of the SLM (102) to generate the subframes (130) for displaying a reconstructed image (160) within a full field of view, the full field of view comprising each of the partial fields of view (132); wherein the reconstructed image (160) on the display area (122) has a total image resolution and the total image resolution is higher than the SLM resolution; wherein the processor (146) is further programmed to control the SLM (102) in such a way as to cause the subframes (130) on the sections (124) to oscillate angularly, so that each of the subframes (130) has an enlarged section (158) and the enlarged sections (158) of the subframes (130) overlap each other on the display surface (122), wherein the enlarged sections (158) of the associated subframes (130) have a perceived resolution which is higher than the SLM resolution.
Owner:GM GLOBAL TECHNOLOGY OPERATIONS LLC

Frequency-domain interferometric based imaging systems and methods

Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.
Owner:CARL ZEISS MEDITEC INC

Device for imaging a local field of view, multi-aperture imaging device, and method for providing the same

The present invention relates to a device comprising an image sensor and an array of optical channels, wherein each optical channel comprises an optical device for projecting a partial field of view of a total field of view onto an image sensor area of ​​the image sensor. A first optical channel of the array is configured to image a first partial field of view of the total field of view. A second optical channel of the array is configured to image a second partial field of view of the total field of view. The device comprises a computing unit configured to obtain image information of the first partial field of view and the second partial field of view based on the imaged partial fields of view, obtain image information of the total field of view, and combine the image information of the partial fields of view with the image information of the total field of view to generate combined image information of the total field of view.
Owner:FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG EV

Method and system for forming a partial field

PendingJP2026091239APhotomechanical apparatusPartial fieldEngineering
The imprint method includes reducing the distance between the template and the substrate. [Solution] The method includes the steps of controlling the state of one or more of the template and the substrate while reducing the distance, and detecting the light intensity of the light reflected from both the template and the substrate. The method further includes the steps of determining whether predetermined light conditions are met based on the detected light intensity, determining an estimated initial contact point between the template and the substrate based on the detected light intensity if it is determined that the predetermined light conditions are met, and changing the state based on the difference if the difference between the estimated initial contact point and the target initial contact point is greater than a predetermined threshold.
Owner:CANON KK

Optoelectronic sensor

An optoelectronic sensor includes a plurality of light sources for generating transmission light, including at least a first and a second light source. The optoelectronic sensor includes transmission optics for projecting transmission light into the field of view and at least one detector for detecting transmission light reflected by the object. A photonic network has a plurality of irradiation points to each of which transmission light, in particular in each case of exactly one light source, can be supplied. The transmission light exits into the transmission optics and ultimately exits into the field of view. A plurality of irradiation points that are arranged directly next to one another or that are directly adjacent are in this respect configured to irradiate transmission light into partial fields of view, in particular different partial fields of view and / or a plurality of partial fields of view arranged next to one another or are adjacent.
Owner:SICK AG