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Ce-doped Eu-doped lutetium yttrium aluminium acid submicron image screen and its preparation method

A fluorescent screen, sub-micron technology, applied in the field of imaging fluorescent screens, can solve the problems of long light decay time, low coupling efficiency, reduced screen resolution, etc., and achieve the effect of high resolution and high X-ray absorption coefficient

Inactive Publication Date: 2008-05-14
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to improve its resolution, the thickness of the film must be increased. According to the imaging line spread function (LSF), the increase of the thickness will reduce the resolution of the fluorescent screen (the resolution is approximately equal to their thickness);
[0005] (2) Although Ce:LuAG has a large effective atomic number and high density (Z eff =58.9, density=6.67g / cm 3 ), but its light output is small (3000Ph / Mev);
[0006] (3) The luminescent wavelength of the scintillation single crystal thin film in the prior art is in the range of 480-560nm, and the coupling efficiency with the current CCD detector sensitive to the human eye is low (the peak value of the CCD corresponds to 600-700nm);
[0007] (4) In addition, CsI(T1) film is easy to deliquescence, and its light decay time is long (900ns), which is not suitable for fast real-time microscopic X-ray imaging

Method used

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  • Ce-doped Eu-doped lutetium yttrium aluminium acid submicron image screen and its preparation method
  • Ce-doped Eu-doped lutetium yttrium aluminium acid submicron image screen and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Example 1: Lu 0.9998 Ce 0.0001 Eu 0.0001 AlO 3 / YAlO 3 Fluorescent screen

[0040] The selected resistance heating liquid phase epitaxy furnace is as figure 1 In the shown device, the crucible 9 in the main body furnace 101 is a platinum crucible. According to the above-mentioned preparation process step , the polycrystalline raw material Lu 0.9998 Ce 0.0001 Eu 0.0001 AlO 3 With cosolvent (PbO: B2O3=10mol: 1mol) by weight percentage is Lu 0.9998 Ce 0.0001 Eu 0.0001 AlO 3 / (PbO+B2O3)=0.20 ratio to weigh a total of 1000g, mix well and put 80×80mm platinum crucible 9;

[0041] According to the process step , the size is 30×0.03mm, YAlO with crystal plane direction of (100) 3 The substrate 8 is placed in the fixture 7, and the fixture 7 is loaded into the bottom end of the rotating lifting rod 6, and the positions of the crucible 9 and the substrate wafer 8 are adjusted to be coaxial, and they are all located in the center of the main furnace body 101;

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Embodiment 2

[0046] Example 2: Lu 0.998 Ce 0.01 Eu 0.01 AlO 3 / LuAlO 3 flicker screen

[0047] Lu 0.998 Ce 0.01 Eu 0.01 AlO 3 Polycrystalline material and auxiliary solvent (Bi203: B203=8mol: 2mol) are Lu by weight percentage 0.998 Ce 0.01 Eu 0.01 AlO 3 / (Bi203+B203)=0.40 proportioning weighs a total of 1000g, according to the step in the above-mentioned embodiment 1, the size is φ20×0.03mm, the crystal plane direction is (001) LuAlO 3 The substrate 8 is placed in the fixture 7, and the fixture 7 is loaded into the bottom end of the rotating pull rod 6, and the positions of the crucible 9 and the substrate wafer 8 are adjusted to be coaxial, and they are all located in the center of the main furnace body 101; In Example 1, raise the temperature of the furnace body 101 to 1100°C, melt the raw materials and flux to form a saturated solution 10, and after keeping the temperature at 1100°C for 5 hours, gradually lower and rotate the lifting rod 6 according to in the above-mentio...

Embodiment 3

[0048] Example 3: Lu 0.99 Eu 0.05 Ce 0.05 AlO 3 / Lu 0.8 Y 0.2 AlO 3 flicker screen

[0049] Lu 0.99 Eu 0.05 Ce 0.05 AlO 3 Polycrystalline material and auxiliary solvent (Bi203: B203=8mol: 2mol) are Lu by weight percentage 0.99 Eu 0.05 Ce 0.05 AlO 3 The ratio of / (Bi203+B203)=0.50 weighs a total of 1000g, according to the step in the above-mentioned embodiment 2, the size is φ20×0.03mm, and the crystal plane direction is (100) Lu 0.8 Y 0.2 AlO 3 The substrate 8 is placed in the fixture 7, and the fixture 7 is loaded into the bottom end of the rotating pull rod 6, and the positions of the crucible 9 and the substrate wafer 8 are adjusted to be coaxial, and they are all located in the center of the main furnace body 101; In Example 2, raise the temperature of the furnace body 101 to 1150°C, melt the raw materials and flux to form a saturated solution 10, and after keeping the temperature at 1150°C for 5 hours, gradually lower and rotate the lifting rod 6 accordi...

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Abstract

The invention cerium doped lutetirum illinium aluminate submicro imaging fluorescence screen and the manufacturing method, the character lies in: the formula of the fluorescence screen is: Lu1-x-yCeyEuxAlO3 / LuzY1-zAlO3, the x is not less than 0.0001 and not more than 0.05, the y is not less than 0.0001 and not more than 0.05, the z is not less than zero and not more than 1. The producing method of the fluorescence screen is: the LuzY1-zAlO3 with crystal direction of (100), or (001) carries on large area seed crystal on the single crystal substrate, in the resistance heating liquid phase extended furnace, under the crystallization temperature of Lu1-x-yCeyEuxAlO3, grows a Lu1-x-yCeyEuxAlO3 single crystal film with micrometer or submicro magnitude on the interface of the flux saturate liquid containing Lu1-x-yCeyEuxAlO3 polycrystal material. The fluorescence screen has high quality, excellent optic property, the absorbing coefficient to X ray is high and the resolution is high.

Description

technical field [0001] The invention relates to an imaging fluorescent screen, in particular to a cerium-doped europium-doped lutetium-yttrium aluminate submicron imaging fluorescent screen and a preparation method thereof. The fluorescent screen can be widely used in radiation detection fields such as medicine, scientific research, industrial online detection, and safety inspection. Background technique [0002] X-ray radiography is a method of X-ray detection using scintillating fluorescent intensifying screens (scintillation crystals or phosphors) and photosensitive film. It is a traditional X-ray imaging technology. Wide range of applications. However, this traditional X-ray radiography has disadvantages such as low efficiency, time-consuming and labor-intensive, and incapable of real-time observation, etc., and has been gradually eliminated now. Using charge-coupled device (CCD) or amorphous silicon array (a-Si:H) detectors to replace photosensitive film in X-ray radio...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J1/63C09K11/77H01J9/20
Inventor 赵广军庞辉勇徐军夏长泰何晓明介明印周圣明
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI