Preparation method of ultrathin, large-size, high-silicon silicon steel sheet by electron beam physical vapor deposition
A technology of physical vapor deposition and silicon steel sheets, applied in heat treatment equipment, heat treatment process control, manufacturing tools, etc., can solve problems such as incapable of industrial production, and achieve high work efficiency, easy quality, and easy control of process parameters.
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specific Embodiment approach 1
[0009] Embodiment 1: The method of this embodiment is as follows: In a vacuum environment, use electron beams as a heat source to bombard the raw material of high-silicon silicon steel sheet, so that the raw material of high-silicon silicon steel sheet is melted into a steam state, and then the high-silicon silicon steel sheet in the steam state is The silicon steel sheet raw material is deposited on the substrate to obtain a high-silicon silicon steel sheet, and the high-silicon silicon steel sheet is peeled off from the substrate. The raw material of the high-silicon silicon steel sheet is the high-silicon ferroalloy raw material, which can be obtained by vacuum smelting with silicon steel sheet scrap (or pure iron) and pure silicon.
[0010] The specific steps of this embodiment are as follows: 1. Prepare high-silicon ferroalloy ingots as raw materials for high-silicon silicon steel sheets: pure iron and pure silicon (pure silicon and silicon steel sheet scraps can also be u...
specific Embodiment approach 2
[0011] Specific implementation mode two: the following combination figure 1 This embodiment will be specifically described. The steps of this embodiment are as follows: 1. Put the pure iron ingot 1 and the pure silicon material 2 into No. 1 crucible 3 and No. 2 crucible 4 respectively, and put a layer of CaF on the surface of the pure iron ingot 1. 2 2. Install the base plate 5, adjust the distance between the base plate 5 and the upper surface of the pure iron ingot 1 between 300-500 mm, scrub the lower surface of the base plate 5 with acetone, seal the vacuum chamber 6, and vacuum the vacuum chamber 6 Vacuum, generally pumped to a vacuum of about 10 -4 Pa; Three, make the substrate 5 rotate around its own center line in its own plane, set the rotating speed to 5-30rpm, and heat the substrate 5 to 500-800°C at the same time; Four, use the electron beam generated by the electron gun 7 to evaporate first CaF 2 powder, thereby forming a layer of 5-10 μm CaF on the lower surfa...
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