Condensed aromatic organic semiconductor single-crystal micro/nano materials and their preparation method and application
A technology of organic semiconductors and nanomaterials, which is applied in the growth of polycrystalline materials, single crystal growth, single crystal growth, etc., can solve the problems that the one-dimensional nanostructure cannot determine the single crystal, affects the performance of one-dimensional structure, and has high requirements for material molecules. , to achieve good mechanical properties, good single crystal, high carrier mobility
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Embodiment 1
[0029] Embodiment 1, preparation of clustered copper phthalocyanine micro / nanowires
[0030] Copper phthalocyanine, the source material used in the deposition, was purchased from Alfa, and was used to prepare nanowires after three times of sublimation purification.
[0031] The resistance furnace used in the experiment is the SK4-10 type produced by Beijing Electric Furnace Factory. It is equipped with a quartz tube that can be vacuumed and filled with gas. Its structural diagram is shown in Figure 1: the quartz tube 12 is located inside the resistance furnace 11 and is divided into two parts. Section, evaporation section 121 and deposition section 122, the temperature of two sections is controlled its temperature by temperature controller 171, temperature controller 172 (SKY-4 type thyristor temperature controller produced by Beijing Electric Furnace Factory) respectively, and evaporation source 13 places In the center of the evaporation section 121, the deposition substrate ...
Embodiment 2
[0034] Embodiment 2, preparation of dispersed copper phthalocyanine nanowires
[0035] The materials used are the same as in Example 1 with the tube furnace.
[0036]Copper phthalocyanine powder is placed in a quartz crucible as an evaporation source 13, and a porous aluminum oxide sheet is used as a deposition substrate 14. After being placed in a tube furnace, the quartz tube 12 is closed, and the mechanical pump 16 is used to evacuate to below 10Pa, and then the The front end of the evaporation section 121 is fed with high-purity argon gas 15, and the flow rate of the argon gas is 300 sccm. In the experiment, two temperature controllers 171 and 172 are used to control the temperature: the temperature controller 171 controls the temperature of the evaporation section 121, the temperature controller 172 controls the temperature of the deposition section 122, and the temperature of the deposition section 122 is set to 200°C , remains unchanged, before the evaporation section ...
Embodiment 3
[0038] Embodiment 3, preparation of dispersed perylene micro / nanostructures
[0039] The source material perylene used in the deposition was purchased from Alfa Company for the preparation of micro / nano structures; the tube furnace used was the same as in Example 1.
[0040] The perylene powder is placed in a quartz crucible as an evaporation source 13, and the silicon wafer is used as a deposition substrate 14. After being placed in a tube furnace, the quartz tube 12 is closed, and the mechanical pump 16 is used to evacuate the vacuum to below 10Pa, and then the front end of the evaporation section 121 is passed into High-purity argon 15, the flow rate of argon gas is 300 sccm. In the experiment, two temperature controllers 171 and 172 are used to control the temperature: the temperature controller 171 controls the temperature of the evaporation section 121, the temperature controller 172 controls the temperature of the deposition section 122, and the temperature of the depos...
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