Emitting laser for etching top end non-doping intrinsic layer asymmetric metal membrane vertical cavity surface
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- HEBEI UNIV OF TECH
- Publication Date
- 2009-06-17
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a semiconductor optoelectronic device, in particular to an asymmetric metal film vertical cavity surface-emitting laser for etching the top non-doped intrinsic layer. Background technique
[0002] Vertical-cavity surface-emitting lasers (VCSELs) have recently been used in many technologies because of their low threshold, fast response, circular symmetry of emitted light, and easy two-dimensional integration. In dense wavelength division multiplexing, optoelectronic integration, optical fiber High-efficiency light sources such as communications have proved that vertical cavity surface emitting lasers have application value.
[0003] The vertical cavity surface emission structure disclosed in Chinese patent CN99253156.X includes the following contents: upper metal electrode, lower metal electrode, quantum well active layer, p+ ohmic contact layer, p-type semiconductor distributed Bragg reflector, n-type semiconductor distributed ...