Complementary forming solution and its application
One solution and another technology, applied in the direction of surface reaction electrolytic coating, anodizing, electrolytic coating, etc., can solve the problems of low polymer product yield, unsatisfactory filling effect, unstable product properties, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0018] The specific volume is 30000μF / g, and the 4.2×3.0×2.0 type tantalum powder sintered block is anodized in 0.1wt.% (weight percent) phosphoric acid solution, wherein the working voltage of anodization is 48v. After anodizing, the agglomerate is rinsed and dried.
[0019] Deposit and coat the polymer layer on the surface of the dielectric oxide layer by means of chemical polymerization; after the deposition of the polymer layer, use methanol or ethanol to clean the reaction by-products, and then in a mixed solution of 0.1% phosphoric acid and 0.1% sulfuric acid Complementary formation is carried out in the middle, and the applied supplementary forming voltage is 24v.
[0020] Then, the polymer coating, by-product rinsing and supplementary formation in the above steps were repeated six times. Next, "Electrodug 112" brand colloidal graphite produced by Acheson Industries was coated on the conductive polymer layer of the obtained semi-finished product, and next, "Dotite D-55...
Embodiment 2
[0022] In the above-mentioned embodiment 1, the forming process is carried out in a mixed solution of 5% phosphoric acid solution and 5% sulfuric acid solution, and other steps are the same as in embodiment 1.
Embodiment 3
[0024] In the above-mentioned embodiment 1, the forming process is carried out in a mixed solution of 0.1% phosphoric acid solution and 0.1% p-toluenesulfonic acid solution, and other steps are the same as in embodiment 1.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap