Photosensitive composition, method for forming pattern, and permanent pattern
A technology of photosensitive composition and polymerizable compound, which is applied in the field of photosensitive composition, pattern forming method and permanent pattern, and can solve the problem of insufficient solder heat resistance and retort resistance, deterioration of coating film and substrate adhesion, etc. problem, to achieve the effect of excellent pressure cooking resistance and improved flexibility
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Synthetic example 1
[0459] -Synthesis of polyurethane resin having carboxyl group-
[0460] Dissolve 125 g of 4,4'-diphenylmethane diisocyanate represented by the following structural formula (1) and 67 g of 2,2-di(hydroxymethyl)propionic acid represented by the following structural formula (2) in a 500 ml three-necked flask In 290ml of dioxane. Then, 1 g of N,N-diethylaniline was put into this solution, and after stirring for 6 hours under reflux of dioxane to react it, 4 L of water and 40 mL of acetic acid were gradually added to the obtained solution. solution to precipitate the polymer. 185 g of polyurethane resin (A) was synthesized by subjecting the obtained solid to vacuum drying. The acid value of this polyurethane resin (A) was 138 mgKOH / g. The weight average molecular weight (polystyrene conversion) measured by GPC was 28,000.
[0461] [chemical 4]
[0462] Structural formula (1)
[0463] Structural formula (2)
Synthetic example 2
[0465] -Synthesis of polyurethane resin having carboxyl group-
[0466] In Synthesis Example 1, a polyurethane resin (B) was synthesized in the same manner as in Synthesis Example 1 except that a diisocyanate compound represented by the following structural formula (3) was used instead of 4,4'-diphenylmethane diisocyanate. The acid value of this polyurethane resin (B) was 137 mgKOH / g.
[0467] [chemical 5]
[0468] Structural formula (3)
Synthetic example 3
[0470] -Synthesis of polyurethane resin having carboxyl group-
[0471] In Synthesis Example 1, a polyurethane resin (C) was synthesized in the same manner as in Synthesis Example 1 except that a diisocyanate compound represented by the following structural formula (4) was used instead of 4,4'-diphenylmethane diisocyanate. The acid value of this polyurethane resin (C) was 126 mgKOH / g.
[0472] [chemical 6]
[0473] Structural formula (4)
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