Multi-component multi-layer hard thin film material for minitype drill bit surface modification and preparation method thereof
A thin-film material, micro-drill technology, applied in metal material coating process, coating, layered products, etc., can solve the problems of hole position accuracy, hole wall roughness exceeding standard, low microhardness friction coefficient, etc. Wide controllable range, improve micro-roughness, and improve the effect of interface bonding force
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Embodiment 1
[0029] Table 1 process flow table
[0030]
[0031] Three target materials of Cr, Ti and Al are used, and the gas is high-purity Ar and N 2 and C 2 h 2 , The substrate is a Φ0.4mm micro-drill. The thickness of multi-layer hard film Cr / CrN / CrTiAlCN / DLC deposited sequentially is 0.1, 0.25, 0.85, 0.6 μm; The coefficient of friction of the layer is 0.2. Use this coated micro-drill to drill a 6-layer PCB board with a thickness of 2.0mm, and the speed is 120,000 rpm. It reached 25500 (7000 / 6000 / 5000 / 4000 / 3500), while the average number of holes drilled by uncoated micro-drills was 10000 (3000 / 2000 / 2000 / 1500 / 1500).
Embodiment 2
[0033] Table 2 process flow table
[0034]
[0035]Three target materials of Cr, Ti and Al are used, and the gas is high-purity Ar and N 2 and C 2 h 2 , The substrate is a φ0.25mm micro-drill. The thickness of multi-layer hard film Cr / CrN / CrTiAlCN / DLC deposited sequentially is 0.1, 0.2, 0.6, 0.4 μm respectively; The coefficient of friction of the layer is 0.25. Use this coated micro-drill to drill an 8-layer PCB board with a thickness of 1.6mm, and the speed is 140,000 rpm. According to the use process of the micro-drill, and under the condition of meeting the processing quality standards of the PCB board, each coated micro-drill drills holes The average number reached 14500 (5000 / 4000 / 3000 / 2500 / 0), while the average number of holes drilled by the uncoated micro-drill was 6000 (2000 / 1500 / 1500 / 1000 / 0).
Embodiment 3
[0037] Table 3 process flow table
[0038]
steps
Background vacuum: 5.0×10 -3 Pa, temperature: 150°C, workpiece rack speed: 5rpm
Furnace
pressure
(Pa)
Airflow(sccm)
Magnetic control power (Kw)
source of ion
(Kw)
Bias
(V)
time
(min)
Ar
N 2
CH 4
Cr
Ti
Al
ion source bombardment
0.5
150
2.0
800
30
film
Floor
Shen
accumulate
the transition
Floor
Cr
0.4
150
6
0.5
100
5
CrN
0.5
130
50
6
0.5
100
15
Wear-resistant
Floor
CrTiAl
CN
0.6
120
120
80
4
5
4
1
85
70
...
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