Solar selectivity absorption coating and manufacture method thereof
An absorbing coating, selective technology, applied in the field of solar collectors, to achieve the effect of strong water resistance, high temperature resistance and humidity resistance
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Embodiment 1
[0016] see figure 1 , The solar selective absorbing coating in this embodiment includes an absorbing layer 2 deposited on the substrate 1 by sputtering and an anti-reflection layer 3 deposited on the absorbing layer 2 by sputtering. The substrate 1 in this embodiment is an oxygen-free copper tube.
[0017] Absorber layer 2 is made of TiN layer 21, TiO layer 22 and TiO 2 layer 23, the absorber layer 2 has a thickness of 100 nm. The TiN layer 21 is deposited on the oxygen-free copper tube 1 by sputtering, and the thickness of the TiN layer 21 is 40 nm. TiO layer 22 is sputter deposited on TiN layer 21, TiO 2 Layer 23 is sputter deposited on TiO layer 22, TiO layer 22 and TiO 2 The sum of the thicknesses of layers 23 is 60 nm.
[0018] The anti-reflection layer 3 is sputter deposited on TiO 2 SiO on layer 23 2 layer, the thickness of the anti-reflection layer 3 is 100nm.
[0019] The solar selective absorbing coating of this embodiment can be used on the heat collecting t...
Embodiment 2
[0028] see figure 2 , The solar selective absorbing coating in this embodiment includes an absorbing layer 2 deposited on the substrate 1 by sputtering and an anti-reflection layer 3 deposited on the absorbing layer 2 by sputtering. The substrate 1 in this embodiment is a phosphorus deoxidized copper plate.
[0029] Absorber layer 2 is made of TiN layer 21, TiO layer 22 and TiO 2 layer 23, the absorber layer 2 has a thickness of 120 nm. The TiN layer 21 is deposited on the phosphorus deoxidized copper plate 1 by sputtering, and the thickness of the TiN layer 21 is 50 nm. TiO layer 22 is sputter deposited on TiN layer 21, TiO 2 Layer 23 is sputter deposited on TiO layer 22, TiO layer 22 and TiO 2 The sum of the thicknesses of layers 23 is 70 nm.
[0030] The anti-reflection layer 3 is sputter deposited on TiO 2 SiO on layer 23 2 layer, the thickness of the antireflection layer 3 is 120nm.
[0031] The solar selective absorbing coating of this embodiment can be used on ...
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