1484results about "Polymeric surface-active compounds" patented technology

A stable foam composition includes greater than about 40 weight percent of an alcohol, based upon the total weight of the alcoholic composition, and a foaming surfactant selected from fluorosurfactants, siloxane polymer surfactants, and combinations thereof. When the foaming surfactant includes a fluorosurfactant, the alcoholic composition further includes a polymeric or oligomeric foam stabilizer.

Compositions comprising one or more polymeric suds volume and suds duration enhances which are mild on the user's skin. The polymeric suds enhances are suitable for use in methods which in use as compositions light duty liquid, LDL compositions, hand dishwashing compositions, laundry bars, personal cleansing compositions and the like.

The use of poly(oxyethylene)-poly(oxybutylene) block copolymers in pharmaceutical compositions useful for modifying the surfaces of contact lenses and other medical devices is disclosed. The present invention is based in-part on a discovery that this class of compounds is particularly efficient in wetting hydrophobic surfaces, such as the surfaces of silicone hydrogel contact lenses and other types of ophthalmic lenses. Such compounds are also useful for cleaning purposes. The use of the compounds as surfactants in various types of compositions for treating contact lenses therefore represents a preferred embodiment of the present invention.

The present invention is a solid rinse aid composition and methods of making and using the same. The solid rinse aid composition generally includes sodium sulfate and urea as solidification agents and an effective amount of an alcohol ethoxylate compound sheeting agent component and an effective amount of defoamer component. The solid rinse aid composition may also incorporate a preservative system including sodium bisulfate. The solid rinse aid composition may be phosphate-free, aminocarboxylate-free, and GRAS if desired.

Compositions useful in reworking microelectronic device wafers, i.e., removing photoresist from rejected wafers, without damaging underlying layers and structures such as cap layers, interlevel dielectric layers, etch stop layers and metal interconnect material. The semi-aqueous compositions include at least one alkali and / or alkaline earth metal basic salt, at least one organic solvent, water, optionally at least one quaternary ammonium basic salt, optionally at least one metal corrosion inhibitor and optionally at least one water-soluble polymer surfactant.

A fabric care composition and process for using the composition to treat fabrics are provided. The fabric care composition comprises a sucrose ester, a cationic polysaccharide and a dispersing medium, wherein the charge density of the cationic polysaccharide is from about 0.05 to about 5.5 meq / gram. Optionally, deposition agents and adjunct materials may also be included. The present compositions are used to treat fabrics to impart one or more of the following benefits tot eh treated fabrics: improved fabric softness, wrinkle reduction after drying, ease of ironing, in-wear shape retention, fabric elasticity, fabric tensile strength, fabric tear strength, and / or color protection.

We have found an alkaline warewashing detergent composition that can contain a critical amount of a nonionic rinse agent that when used in automatic warewashing machines permits the use of a potable water rinse without the addition of a separate rinse agent. Sufficient residual nonionic surfactant from the alkaline detergent remains on the surface ware and internal machine and rack surfaces after washing to promote adequate sheeting in the rinse cycle. The residual nonionic surfactant on internal surfaces dissolves in the rinse water to create an effective aqueous rinse agent. The nonionic rinse agents can be a single nonionic for both foam reduction cleaning and sheeting or can be a blend of nonionic materials providing these functions. The detergent can be in the form of a particulate, pelletized or block solid. The detergent can be used in a variety of high temperature and low temperature automatic warewashing machines including large multizone conveyor machines, or relatively small institutional machines that have a single washing chamber.

A substantially non-aqueous concentrated rinse-aid composition for the heat-free drying of plastic-ware and other dishwashing items, the composition comprising at least 20% by weight of one or more super-wetting surfactants. The composition provides excellent finishing and care of the dishwashing load.

An ordered liquid crystalline phase cleansing composition is disclosed that contains a solid particulate optical modifier that modifies the appearance of the skin after rinsing the skin. A method of depositing the solid particulate optical modifier to the skin or hair with the ordered liquid crystalline phase cleansing composition is also disclosed.

A detergent composition is provided according to the invention. The detergent composition includes a branched alcohol alkoxylate having the formula: wherein R1 is a C2-C20 alkyl, R2 is H or a C1-C4 alkyl, n is 2-20, and m is 1-40, and a compatibililizing surfactant. The compatibilizing surfactant can be selected so that an aqueous composition containing 5 wt. % of the branched alcohol alkoxylate and at least 2.5 wt. % of the compatibilizing surfactant provides a clear aqueous composition. A clear aqueous composition refers to an aqueous composition that is free of haze visible to the naked eye. In general, a clear aqueous composition resembles a composition containing only water. A method for using the detergent composition is provided.

A detergent composition is provided according to the invention. The detergent composition includes a branched alcohol alkoxylate having the formula:wherein R1 is a C2-C20 alkyl, R2 is H or a C1-C4 alkyl, n is 2-20, and m is 1-40, and a compatibililizing surfactant. The compatibilizing surfactant can be selected so that an aqueous composition containing 5 wt. % of the branched alcohol alkoxylate and at least 2.5 wt. % of the compatibilizing surfactant provides a clear aqueous composition. A clear aqueous composition refers to an aqueous composition that is free of haze visible to the naked eye. In general, a clear aqueous composition resembles a composition containing only water. A method for using the detergent composition is provided.

A cleaning composition for sanitizing and / or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

The present invention relates to cleaning compositions comprising variants of an alpha-amylase having improved stability to chelating agents relative to its parent enzyme and cleaning processes comprising such compositions.

New fabric care compositions including soil release polymers containing anionic substitution, nitrogen containing substitution, and alkoxy substitution are disclosed. In particular, fabric care compositions containing modified polysaccharides having anionic substitution, nitrogen containing substitution, and alkoxy substitution and methods of forming the same are disclosed.

The invention provides a cleaning liquid for semiconductor devices which is capable of removing deposits on a surface of an object to be cleaned including a photoresist, an antireflective film, an etching residue and an ashing residue at a low temperature in a short period of time with reduced environmental burdens and without causing corrosion of an interlayer dielectric film, a metal, a metal nitride, and an alloy in the object to be cleaned. The cleaning liquid for semiconductor devices according to the invention contains a reducing agent and a surfactant and has a pH of 10 to 14.

Compositions useful in reworking microelectronic device wafers, i.e., removing photoresist from rejected wafers, without damaging underlying layers and structures such as cap layers, interlevel dielectric layers, etch stop layers and metal interconnect material. The semi-aqueous compositions include at least one alkali and / or alkaline earth metal basic salt, at least one organic solvent, water, optionally at least one quaternary ammonium basic salt, optionally at least one metal corrosion inhibitor and optionally at least one water-soluble polymer surfactant.

A multi-functional hard surface treating composition is described which includes (1) a surfactant system including at least two surfactants and (2) at least one alkylene glycol alkyl ether. The at least two surfactants include an anionic surfactant and either a polymer surfactant or a nonionic surfactant. The surfactant system and alkylene glycol alkyl ether have a synergistic effect to provide anti-fogging, anti-streaking, and cleaning benefits to a hard surface treated with the composition.

Provided is a cleaning agent for electronic materials, which enables very efficient advanced cleaning such that yield in the production of the electronic materials is improved and cleaning in a short period of time becomes possible, the cleaning agent having excellent cleaning power for fine-grained particles and organic matter and being able to reduce metallic contamination on the substrate. The cleaning agent for electronic materials comprises sulfamic acid (A), an anionic surfactant having at least one sulfonic acid group or a salt thereof in the molecule (B), a chelating agent (C), and water, wherein the pH at 25 C is preferably not more than 3.0 and the (B) is preferably a polymeric anionic surfactant (B1) having a weight average molecular weight of 1,000 to 2,000,000.

A cleaning composition comprising a nuclease enzyme, preferably a deoxyribonuclease and / or ribonuclease enzyme and a surfactant system comprising an anionic surfactant and a nonionic surfactant wherein the weight ratio of anionic to non-ionic surfactant is from 1.5:1 to 1:10.

The invention belongs to the field of daily chemical products, and particularly relates to an efficient laundry detergent and a preparation method thereof. The efficient laundry detergent comprises, in weight percent, 5-20% of sodium ethoxylated alkyl sulfate with the mass concentration of 70%, 3-15% of linear alkyl benzene sulfonic acid, 3-6% of fatty alcohol-polyoxyethylene ether, 3-8% of cocamidopropyl betaine with the mass concentration of 35%, 3-10% of potassium laurate water solution with the mass concentration of 17%, 3-10% of potassium oleate water solution with the mass concentrationof 5%, 1-10% of sodium hydroxide, 0.1-2% of compound enzyme, 0.05-0.2% of preservative, 0.1-0.5% of ethylene diamine tetraacetic acid, 0.05-0.5% of citric acid, 0.5-3% of sodium chloride, 0.15-0.5% ofessence and the balance deionized water. The efficient laundry detergent is high in antibacterial and stain removal ability and environmentally friendly and has fewer bubbles, and energy, time and water are saved.

A rinse agent composition is provided. The rinse agent composition includes a sheeting agent for promoting draining of sheets of water from a surface, and a humectant. The humectant is a component which retains at least 5 wt.% water when the humectant has been contained at an equilibrium of 50% relative humidity and room temperature. The sheeting agent and humectant are preferably provided at a ratio of between about 5:1 and about 1:3. A method for rinsing a substrate surface in the presence of high solids containing water is provided. High solids containing water is generally considered to be water having a total dissolved solids content in excess of 200 ppm.

Compositions for inhibiting attachment of microorganisms to the surface of biomaterials include a polyether, such as a poloxamer. The compositions are especially useful for treating contact lenses to prevent bacterial attachment to the lens.

The invention provides artificial tear compositions, artificial tear-gel compositions, contact lens storage compositions, contact lens treatment compositions, ophthalmological drug vehicle compositions and topical drug vehicle compositions comprising one or more nonionic surfactants with one or more non-Newtonian viscosity enhancing excipients and one or more of a polyol and or an electrolyte and methods of their use.

A composition for disinfecting a contact lens comprising an effective disinfecting amount of hydrogen peroxide and a surfactant comprising a copolymer of hydrophobe and hydrophile blocks the structure:<paragraph lvl="0"><in-line-formula>HO-(hydrophobe)x-(hydrophile)y-(hydrophobe)x-H< / in-line-formula><paragraph lvl="0"><in-line-formula>or< / in-line-formula><paragraph lvl="0"><in-line-formula>HO-(hydrophile)y-(hydrophobe)x-(hydrophile)y-H< / in-line-formula>where x and y are integers reflecting the respective hydrophile and hydrophobe blocks of said copolymer; and the hydrophile component of the block copolymer constitutes less than 50 weight percent of the block copolymer. The block copolymer has a Ross-Miles foam height (ASTM designation D-1173-53; 0.1%, at 50° C.) of less than 1 mm.

The instant disclosure relates to rinse-added fabric care compositions comprising an aminosilicone and methods of making and using same. Such rinse-added fabric care compositions provide an improved fabric feel and / or softening. Methods of using such compositions, including contacting a fabric with the fabric care composition, are also disclosed. Articles comprising such compositions are also described.

Removal compositions and processes for removing at least one material layer from a rejected microelectronic device structure having same thereon. The removal composition includes hydrofluoric acid. The composition achieves substantial removal of the material(s) to be removed while not damaging the layers to be retained, for reclaiming, reworking, recycling and / or reuse of said structure.

Cleaning compositions and processes for cleaning post-plasma etch residue from a microelectronic device having said residue thereon. The composition achieves highly efficacious cleaning of the residue material, including titanium-containing, copper-containing, tungsten-containing, and / or cobalt-containing post-etch residue from the microelectronic device while simultaneously not damaging the interlevel dielectric, metal interconnect material, and / or capping layers also present thereon.

The invention relates to the technical field of daily chemical products and in particular to a clean effervescent tablet with pesticide residue and bacteria removing effects and a preparation method of the clean effervescent tablet. According to the preparation method disclosed by the invention, a specific surfactant is combined with a special wet granulation process, so that the feasibility of the production process is ensured. The clean effervescent tablet has the advantages that no dryness or stickness is caused; the adhesion of foam to the surface of a disintegrating agent can be inhibited, the disintegration speed is increased and an effervescent effect is quickly exerted; in the disintegration and dispersion process, the efficient alkaline supplementing effect on a solution system is realized by synergizing a bacteria remover with an alkali-source supplement, fruit wax and pesticide left on vegetables and fruits can be effectively removed, and the aims of effectively removing escherichia coli and staphylococcus aureus are achieved. By using the alkali-source supplement with a special structural form, metal ions in the water body and on the surface of the vegetables and the fruits can be effectively chelated, the effects of softening the water body and chelating the metal ions are realized, and the deposition of calcium scales on the surfaces of cleaned materials is prevented; in addition, a variety of calcium scales or stains are dispersed, so that secondary pollution to tableware, the fruits and the vegetables caused by deposition is prevented.

Rinse aid compositions and methods for using and methods for making the compositions for warewashing processes. In one aspect, the rinse aid composition includes ingredients listed on the FDA GRAS (“generally recognized as safe”) list, including 21 C.F.R. 172 and / or 21 C.F.R. 178; preferably, all the ingredients are listed on the GRAS list. The rinse aid composition includes at least two ethylene oxide-propylene oxide (EO / PO) copolymers, with at least one of those EO / PO copolymers being PO-terminated. The rinse aid composition can include two PO-terminated EO / PO copolymers.

A composition for disinfecting a contact lens comprising an effective disinfecting amount of hydrogen peroxide and a surfactant comprising a copolymer of hydrophobe and hydrophile blocks the structure:HO-(hydrophobe)x-(hydrophile)y-(hydrophobe)x-HorHO-(hydrophile)y-(hydrophobe)x-(hydrophile)y-Hwhere x and y are integers reflecting the respective hydrophile and hydrophobe blocks of said copolymer; and the hydrophile component of the block copolymer constitutes less than 50 weight percent of the block copolymer. The block copolymer has a Ross-Miles foam height (ASTM designation D-1173-53; 0.1%, at 50° C.) of less than 1 mm.