Method for preparing antapex contact crystalline silicon solar cell by utilizing passivation on double surfaces and laser dotting
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 上海晶澳太阳能光伏科技有限公司
- Publication Date
- 2009-06-03
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the field of solar cell manufacturing, and in particular relates to a preparation method of a crystalline silicon solar cell. Background technique
[0002] Energy shortage and environmental degradation force countries around the world to actively seek green and renewable energy that can replace conventional energy. As an important part of renewable energy, photovoltaic power generation has achieved great development in recent years. In 2007, the global solar cell production reached 4.28GW, an increase of 69% over 2006, and the growth rate in 2008 was even greater. The development of China's photovoltaic industry was particularly strong. Notably, since 2007, the total output has ranked first in the world. However, compared with foreign advanced preparation technologies, my country's crystalline silicon solar cell preparation technology is still relatively backward. The basic process is as follows: figure 1 As shown, it is comp...