The invention discloses a wafer cutting device. The wafer cutting device comprises a laser, a beam expander, a reflector, a focus system, a water guide system and a worktable, wherein a wafer to be cut is arranged on the worktable, laser light generated by the laser sequentially passes through the beam expander and the reflector and enters the focus system, and focused laser emitted by the focus system is changed into a laser water pillar through the water guide system and emitted onto the worktable for wafer cutting. The focus system is a double-focus system, a front focus and a rear focus are generated on the surface and inside the wafer, the cutting speed is improved, the focused light beam is emitted from a spraying nozzle along with deionized water through the water guide system, the focused laser burns only within the diameter of the water pillar and cuts the wafer, the heat influence is small, the machining quality is improved, and the cutting speed is high.