The present invention belongs to the technical field of detection equipment, and discloses a magnetron
sputtering film uniformity detection device and a detection method thereof, including a
chassis, the right end face of the
chassis is provided with an inlet, the inner surface of the inlet is fixedly connected with a
fixed frame, the top surface of the
fixed frame is fixedly connected with a cleaning
brush, and the top surface of the
fixed frame is provided with a suction hole. The present invention allows the fixed sleeve to suck air from two groups of fixed frames distributed upward and downward, and uses the cleaning brushes distributed on the upper and lower sides of the
film material to sweep away dust on the surface of the
film material by friction with the cleaning
brush during the
film material feeding process, and sucks the dust into the fixed frame with the suction effect, thereby ensuring that the surface of the film material entering the
chassis is clean, avoiding
dust particles attached to the surface from affecting the uniform detection of the film layer on the surface of the film material by the
detector in the detection mechanism, improving the actual detection effect, avoiding the obstruction of detection by attached
dust particles, and achieving the cleaning of the upper and lower parts of the film material at the same time, with good use effect.