Method for welding target material and back board
A welding method and backplane technology, which are applied in welding media, welding equipment, welding/welding/cutting items, etc., can solve the problems of affecting the welding effect of target components and easy oxidation of tantalum targets.
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Embodiment 1
[0037] The following are the process steps and welding results of brazing the 99.99% high-purity Ta target and the 6061Al alloy back plate:
[0038] (1) Surface processing of the target material and the back plate: Machining the surface of the Ta target and the surface of the 6061Al alloy back plate to make them bright, and the smoothness reaches 0.2-1.6um.
[0039] (2) Chemical cleaning of the target material and the back plate: the Ta target is first cleaned with an acid solution, and then cleaned with an organic solvent; and the 6061Al alloy back plate is directly cleaned with an organic solvent. The acid solution used for cleaning can be hydrofluoric acid (HF) and nitric acid (HNO 3 ), the mixed solvent of hydrofluoric acid (HF) and nitric acid (HNO 3 ) in the mixed solvent, the proportion of hydrofluoric acid is 3% to 15%, and the proportion of nitric acid can be 85% to 97%; preferably, HF:HNO 3 The matching ratio is 1:3. In addition, the acid solution can also be made...
Embodiment 2
[0048] The following are the process steps and welding results of brazing the 99.995% high-purity Ta target and the brass back plate:
[0049] (1) Surface processing of the target material and the back plate: Machining the surface of the Ta target and the surface of the brass back plate to make them bright, and the smoothness reaches 0.2-1.6um.
[0050] (2) Chemical cleaning of the target material and the back plate: the Ta target is first cleaned with an acid solution, and then cleaned with an organic solvent; and the brass back plate is directly cleaned with an organic solvent. The acid solution used for cleaning can be hydrofluoric acid (HF) and nitric acid (HNO 3 ), the mixed solvent of hydrofluoric acid (HF) and nitric acid (HNO 3 ) in the mixed solvent, the proportion of hydrofluoric acid is 3% to 15%, and the proportion of nitric acid can be 85% to 97%; preferably, HF:HNO 3 The matching ratio is 1:3. In addition, the acid solution can also be made of hydrofluoric aci...
Embodiment 3
[0059] The following are the process steps and results of brazing the 99.99% high-purity Ta target and the oxygen-free copper backplane:
[0060] (1) Surface processing of target material and back plate: machine the surface of Ta target and oxygen-free copper back plate to make them bright, and the smoothness reaches 0.2-3.2um.
[0061] (2) Chemical cleaning of the target material and the backplane: the Ta target is first cleaned with an acid solution, and then cleaned with an organic solvent; and the oxygen-free copper backplane is directly cleaned with an organic solvent. The acid solution used for cleaning can be hydrofluoric acid (HF) and nitric acid (HNO 3 ), the mixed solvent of hydrofluoric acid (HF) and nitric acid (HNO 3 ) in the mixed solvent, the proportion of hydrofluoric acid is 3% to 15%, and the proportion of nitric acid can be 85% to 97%; preferably, HF:HNO 3 The matching ratio is 1:3. In addition, the acid solution can also be made of hydrofluoric acid (HF)...
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