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Method for preparing compound metal sulfide diamond composite membrane

A technology of composite metal and composite film, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of insufficient film bearing capacity and wear resistance, poor bonding force of metal matrix, large internal stress, etc. , to achieve the effects of easy control of the deposition process, enhanced bonding strength, wear resistance and hardness

Inactive Publication Date: 2009-10-07
SHANGHAI JIAO TONG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the simple molybdenum dioxide / DLC or tungsten dioxide / DLC composite film will fail prematurely due to its large internal stress and poor bonding force with the metal substrate. abrasion, shedding) phenomenon

Method used

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  • Method for preparing compound metal sulfide diamond composite membrane
  • Method for preparing compound metal sulfide diamond composite membrane
  • Method for preparing compound metal sulfide diamond composite membrane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -4 Pa, enter argon gas, adjust the air pressure in the vacuum chamber to 0.3Pa, turn on the power, radio frequency sputtering nickel target, the thickness is about 100nm, the sputtering power is 80W, the working pressure is 0.3Pa, the sputtering time is about 40min, turn off the power, keep The indoor pressure is 0.3Pa, and acetylene gas is introduced. By adjusting the flow rate, the indoor acetylene gas content is 2.66%, and the rest is argon. Turn on the power, and use radio frequency sputtering of tungsten dioxide / molybdenum dioxide (mass ratio 2:3) composite The target power is 100W, the working pressure is 0.3Pa, the sputtering time is 20 minutes, the power is turned off, and after the temperature of the vacuum chamber drops to room temperature, the vacuum chamber is opened ...

Embodiment 2

[0032] Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -4 Pa, enter argon gas, adjust the air pressure in the vacuum chamber to 0.3Pa, turn on the power, radio frequency sputtering titanium target, the thickness is about 100nm, the sputtering power is 80W, the working pressure is 0.3Pa, the sputtering time is about 40min, turn off the power, adjust Keep the indoor air pressure at 0.2Pa, feed acetylene gas, and adjust the flow rate so that the indoor acetylene gas content is 3.99%, and the rest is argon, turn on the power, and use radio frequency sputtering of tungsten dioxide / molybdenum dioxide (mass ratio 2:3) Composite target, power 150W, working pressure 0.2Pa, sputtering time 33 minutes, turn off the power, after the temperature of the vacuum chamber drops to room temperature, open the vacuum chamber to make a film with a film th...

Embodiment 3

[0034] Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -4 Pa, enter argon gas, adjust the air pressure in the vacuum chamber to 0.3Pa, turn on the power, radio frequency sputtering chromium target, the thickness is about 100nm, the sputtering power is 80W, the working pressure is 0.3Pa, the sputtering time is about 40min, turn off the power, adjust Keep the indoor air pressure at 1Pa, feed acetylene gas, and adjust the flow rate so that the indoor acetylene gas content is 5.32%, and the rest is argon gas. Turn on the power, and use radio frequency sputtering to combine tungsten dioxide / molybdenum dioxide (mass ratio 2:3) Target, power 200W, working pressure 1Pa, sputtering time 50 minutes, turn off the power, after the temperature of the vacuum chamber drops to room temperature, open the vacuum chamber to form a film with a film thic...

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Abstract

A method for preparing compound metal sulfide diamond composite membrane belongs to the nanometer composite membrane technology field, comprises: polishing, washing and drying the substrate; sputtering the intermediate layer; letting in acetylene gas; and performing composite target sputtering process to metal sulfide. The method of the invention can obtain composite membrane with excellent wear-resisting performance and good wear resistance; and has the advantages of simple preparation technology and easily controlled deposition process. The membrane need no heat treatment after deposited, and can be directly used as wear-resisting protection film on mechanical component surface.

Description

technical field [0001] The invention relates to a preparation method in the technical field of nanocomposite thin films, in particular to a preparation method for a composite metal sulfide diamond-like composite thin film. Background technique [0002] The transition group metal sulfide tungsten dioxide and molybdenum dioxide crystals with ordinary layered structure (2H) are hexagonal structures formed by S-M-S (M=W, Mo) atoms. In each layer, S-M atoms form a strong co- Valence bonding, the layers are bonded by weak van der Waals bonds, and the layers are easy to slide. As solid lubricants, tungsten dioxide and molybdenum dioxide have the characteristics of small friction coefficient, large bearing capacity, good wear resistance, strong bonding force with the base material, low evaporation rate, and radiation resistance. However, due to the chemical activity of the unsaturated dangling bonds at the edge of the layered structure of tungsten dioxide and molybdenum dioxide cry...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/06
Inventor 周磊王玉东尹桂林余震何丹农
Owner SHANGHAI JIAO TONG UNIV
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