Corrosive liquid used for monocrystal line silicon matte preparation and monocrystal line silicon matte preparation method

A technique for etching liquid and monocrystalline silicon wafers, which is applied in the field of etching liquid, and can solve the problems of high cost, complicated preparation method, and unresolved instability of etching liquid.

Inactive Publication Date: 2009-11-04
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For example, Chinese patents 200810122243.7, 200510111453.2 and 200810163097.2 respectively proposed the method of adding active agent on the basis of the currently used corrosion solution (NaOH or KOH solution mixed with ethanol or isopropanol and sodium silicate), and they respectively proposed adding 0.02‰~0.1‰ of Pb(NO 3 ) 2 Or Pb, glucose and metaaluminate, although the addition of active agents can improve the suede quality, but because it also depends on alcohol-based additives (ethanol or isopropanol) to reduce surface tension and defoaming, it does not solve the problem of corrosion solution instability
And China's patent application 200810163098.7 proposes to add ultrasound on the basis of NaOH aqueous solution, and achieve the effect of eliminating air bubbles through ultrasonic vibration. This method has a si

Method used

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  • Corrosive liquid used for monocrystal line silicon matte preparation and monocrystal line silicon matte preparation method
  • Corrosive liquid used for monocrystal line silicon matte preparation and monocrystal line silicon matte preparation method

Examples

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Embodiment 1

[0018] Example 1: Prepare a 1% NaOH aqueous solution, add 1 mg / L sodium lauryl sulfate and 6% sodium silicate, and the corrosion solution is prepared. After the etching solution was mixed uniformly by bubbling at a constant temperature of 95° C., the monocrystalline silicon wafer was etched in the etching solution for 30 minutes to obtain pyramids with an average size of about 5 μm.

Embodiment 2

[0019] Example 2: Prepare 5% KOH aqueous solution, add 100 mg / L sodium lauryl sulfate and 0% sodium silicate, and the corrosion solution is prepared. The etching solution was kept at a constant temperature of 90° C., and mixed evenly by bubbling, and the monocrystalline silicon wafer was etched in the etching solution for 25 minutes to obtain pyramids with an average size of about 6 μm.

Embodiment 3

[0020] Example 3: Prepare 2% NaOH aqueous solution, add 10 mg / L sodium lauryl sulfate and 0.5% sodium silicate, and the corrosion solution is prepared. The etching solution was kept at a constant temperature of 85°C, and after bubbling and mixing evenly, the monocrystalline silicon wafer was etched in the etching solution for 15 minutes to obtain pyramids with an average size of about 5 μm, as shown in figure 2 As shown, the pyramids are all over the surface of the silicon wafer and are uniform in size.

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Abstract

The invention relates to a corrosive liquid used for monocrystal line silicon matte preparation and a use method thereof. The components of the corrosive liquid are 1-5% (mass ratio) of NaOH or KOH aqueous solution, 1-50mg/L sodium dodecyl sulfate and 0-6% (mass ratio) of sodium silicate. Monocrystal line silicon slice is immerged in the corrosive liquid when preparing the matte and corroded for 10-60 minutes at the temperature of 70-95 DEG C, and the matte is obtained. The method of the invention is simple, inexpensive and stable and is applicable to mass industrialization.

Description

technical field [0001] The invention relates to an etching solution for preparing monocrystalline silicon textured surfaces and a preparation method for monocrystalline silicon textured surfaces. Background technique [0002] Under the background of the energy crisis, renewable energy such as solar cells has been paid more and more attention by people. Solar energy is inexhaustible, and it is a clean energy with great development potential. From the appearance of solar cells in laboratories in the 1970s to the widespread use of solar cells in space and on the ground, solar cells have made great progress. Especially the monocrystalline silicon cell, because of its relatively low price, high efficiency, and its relatively simple and reliable process, has been widely valued by people in recent years. [0003] In the preparation process of monocrystalline silicon cells, the first step is surface texturing. Texturing the surface can effectively reduce the reflectivity of the b...

Claims

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Application Information

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IPC IPC(8): C30B33/10C30B29/06C23F1/40
Inventor 李海玲王文静赵雷周春兰刁宏伟
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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