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Method for making high precision nanometer holes and nanometer hole arrays by utilizing focusing electronic beams

A technology of focusing electron beams and nanohole arrays, applied in nanotechnology, nanotechnology, nanostructure manufacturing, etc., can solve the problems of uncontrollable size and position of nanoholes, and achieve the effect of large application value and high efficiency

Inactive Publication Date: 2009-12-23
LANZHOU UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these methods cannot achieve both efficiency and precision. The size and position of nanopores cannot be controlled. High-precision nanopore sensors require high-precision nanopores, and fiber photonic crystal devices need to introduce single nanohole defects or periodic nanopores. hole array

Method used

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  • Method for making high precision nanometer holes and nanometer hole arrays by utilizing focusing electronic beams
  • Method for making high precision nanometer holes and nanometer hole arrays by utilizing focusing electronic beams

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 1

[0025] Embodiment 1, the preparation of 1nm diameter nanopore

[0026] (1) Preparation of polymethyl methacrylate fiber

[0027] Prepare the nanofiber of PMMA with electrospinning method: PMMA is dissolved in the mixed solution of chlorobenzene and DMF (chlorobenzene and DMF mix with the volume ratio of 1: 1), the operating voltage of electrospinning is 25kV, working distance ( Under the condition that the distance between the substrate and the needle head) is 12 cm, the fiber is deposited on the micro-grid, and the diameter of the obtained nanofiber is between 2 and 50 nanometers. To remove the solvent, the prepared PMMA nanofibers were heated at 50 °C for 30 min.

[0028] (2) Preparation of 1nm diameter nanopores

[0029] The PMMA nanofibers were placed in the sample stage of the high-resolution transmission electron microscope, and the vacuum degree was 10 -8 Torr, at room temperature, under the condition of working voltage of 200kV, adjust the diameter of the focused el...

Embodiment 2

[0031] Example 2. Preparation of nanopores with a diameter of 2nm

[0032] (1) Preparation of polymethyl methacrylate fiber

[0033] Same as embodiment one.

[0034] (2) Preparation of nanopores with a diameter of 2nm

[0035] The PMMA nanofibers were placed in the sample stage of the high-resolution transmission electron microscope, and the vacuum degree was 10 -8 Torr, at room temperature, under the condition of working voltage of 200kV, adjust the diameter of the focused electron beam to 0.5nm, and the intensity of the focused electron beam is 5×10 7 e / nm 2 s, the irradiation time is 20s.

[0036] The size of the nanopore is detected by high-resolution transmission electron microscopy: the diameter of the nanopore is 2nm.

Embodiment 3

[0037] Example 3, Preparation of Nanopores with a Diameter of 5nm

[0038] (1) Preparation of polymethyl methacrylate fiber

[0039] Same as embodiment one.

[0040] (2) Preparation of nanopores with a diameter of 5nm

[0041] The PMMA nanofibers were placed in the sample stage of the high-resolution transmission electron microscope, and the vacuum degree was 10 -8 Torr, at room temperature, under the condition of working voltage of 200kV, adjust the diameter of the focused electron beam to 0.5nm, and the intensity of the focused electron beam is 5×10 7 e / nm 2 s, the irradiation time is 60s.

[0042] The size of the nanopore is detected by high-resolution transmission electron microscopy: the diameter of the nanopore is 5 nm.

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Abstract

The invention provides a method for efficiently making high precision nanometer holes and nanometer hole arrays by utilizing focusing electronic beams, comprising the following steps of: irradiating polymethyl methacrylate nanometer fibers for 1-60s by using focusing electronic beams with the strength of 1*10-1*10e / nms to obtain the nanometer holes with the aperture of 0.5nm-10nm under the conditions of the vacuum of 1*10-1*10Torr and the working voltage of 100kV-200kV; and deflecting electronic beams for continuing to irradiate the polymethyl methacrylate nanometer fibers to obtain the nanometer hole arrays. The invention can precisely control the size of the nanometer holes through the strength and the irradiation time of the electronic beams (the precision can reach up to 0.1 nanometer), and control the deflection of the electronic beams through static electricity so as to control the period of the nanometer holes; and the period of the nanometer hole arrays can be controlled between 1nm and 20nm. The method is mainly applied to the fields such as DNA sequence detection, biosensors, nanometer bioelectronics, photonic crystal and the like.

Description

technical field [0001] The invention belongs to the technical field of nanometer materials, and relates to a method for manufacturing nanoholes and nanohole arrays, in particular to a method for making nanoholes and nanohole arrays by irradiating polymethyl methacrylate nanofibers with focused electron beams. Background of the invention [0002] Nanopores have attracted extensive attention in recent years due to their applications in DNA sequence detection, biosensors, nanobioelectronics, and photonic crystals. At present, the main methods of making nanopores are: using focused ion beam to bombard suspended Si 3 N 4 Thin films; ion tracking bombardment of polycarbonate (PC), polyethylene terephthalate (PET) and polyimide (PI) and other high polymers; focused electron beam direct irradiation of suspended Si 3 N 4 or SiO 2 Thin films; standard semiconductor processing; embedding inorganic nanotubes in polymers; PDMS molding, and more. However, these methods cannot achieve...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B3/00
Inventor 段辉高谢二庆赵建果刘利新陈长城刘延霞
Owner LANZHOU UNIVERSITY
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