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Method for preparing anhydrous hydrofluoric acid

A technology of anhydrous hydrofluoric acid and hydrogen, applied in the direction of fluorine/hydrogen fluoride, etc., to achieve the effects of no CO2 emissions, reduced energy consumption, and reduced reaction intensity

Active Publication Date: 2010-03-03
ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although this treatment method can achieve harmlessness and recover a certain concentration of hydrofluoric acid, because some organic fluorine wastes contain Cl atoms, and because the tail gas after aerobic incineration contains CO 2 , so the aqueous hydrofluoric acid produced after washing often contains HCl, H 2 CO 3 , HClO 3 mixed acid, and the current washing treatment process can only get a relatively low concentration of hydrofluoric acid in water, so it cannot be directly used as a raw material for the organic fluorine industry

Method used

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  • Method for preparing anhydrous hydrofluoric acid

Examples

Experimental program
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Effect test

Embodiment 1

[0032] Tetrafluoroethylene raffinate (the main components are perfluoropropylene, tetrafluoroethylene chloroethane, octafluorocyclobutane, fluorodichloromethane, difluorochloromethane, vinylidene fluoride, monofluoroethylene, perfluoroisobutylene , octafluoropropane, dipentene, tetrafluoroethylene, etc.) preheated to 60-200°C, sprayed into the plasma cracking furnace at a flow rate of 60-80kg / h, and the tetrafluoroethylene residue was cracked at a high temperature of 3000-5000°C And decompose into ions and atomic C, H, F, Cl, and then in the cooler area of ​​the reaction chamber at 650-780Nm 3 The flow rate of / h injects the H diluted by argon 2 (The volume ratio of argon to hydrogen is 25-30), H atoms combine with F and Cl atoms in the cooler region to form simple HF and HCl molecules, and C forms carbon black or CH 4 . Since the boiling point of HF is 19.5°C and the boiling point of HCl is -85.0°C, CH 4 The boiling point is -161°C, H 2 The boiling point of HF is -252.8°C...

Embodiment 2

[0034] Tetrafluoroethylene raffinate (the main components are perfluoropropylene, tetrafluoroethylene chloroethane, octafluorocyclobutane, fluorodichloromethane, difluorochloromethane, vinylidene fluoride, monofluoroethylene, perfluoroisobutylene , octafluoropropane, dipentene, tetrafluoroethylene, etc.) preheated to 120°C, sprayed into the plasma cracking furnace at a flow rate of 70kg / h, and the tetrafluoroethylene residue was cracked at a high temperature of 4000°C and decomposed into ions and atoms state C, H, F, Cl, and then in the cooler area of ​​the reaction chamber at 700Nm 3 The flow rate of / h injects the H diluted by argon 2 (The volume ratio of argon to hydrogen is 25-30), H atoms combine with F and Cl atoms in the cooler region to form simple HF and HCl molecules, and C forms carbon black or CH 4 . Since the boiling point of HF is 19.5°C and the boiling point of HCl is -85.0°C, CH 4 The boiling point is -161°C, H 2 The boiling point of HF is -252.8°C. Using t...

Embodiment 3

[0036] Tetrafluoroethylene raffinate (the main components are perfluoropropylene, tetrafluoroethylene chloroethane, octafluorocyclobutane, fluorodichloromethane, difluorochloromethane, vinylidene fluoride, monofluoroethylene, perfluoroisobutylene , octafluoropropane, dipentene, tetrafluoroethylene, etc.) preheated to 60°C, sprayed into the plasma cracking furnace at a flow rate of 80kg / h, and the tetrafluoroethylene residue was cracked at a high temperature of 3000°C and decomposed into ions and atoms state C, H, F, Cl, and then in the cooler area of ​​the reaction chamber at 780Nm 3 The flow rate of / h injects the H diluted by argon 2 (The volume ratio of argon to hydrogen is 30), H atoms combine with F and Cl atoms in the cooler region to form simple HF and HCl molecules, and C forms carbon black or CH 4 . Since the boiling point of HF is 19.5°C and the boiling point of HCl is -85.0°C, CH 4 The boiling point is -161°C, H 2 The boiling point of HF is -252.8°C. Using the b...

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Abstract

The invention relates to a method for preparing anhydrous hydrofluoric acid. The method comprises the following steps: organic fluorine waste is preheated and subjected to high temperature cracking byplasma in oxygen-free environment; cracked gas is quickly mixed and reacts with injected diluted hydrogen; and reaction gas is quenched, deeply refrigerated and accurately filtered to prepare the anhydrous hydrofluoric acid. The method for preparing the anhydrous hydrofluoric acid adopts an oxygen-free cracking technology, thus avoiding CO2 generation and discharge; and the method can effectivelylowers reaction intense degree, greatly reduce cracking energy-consumption of the plasma and convert the fluorine element into hydrogen fluoride fully; and the prepared anhydrous hydrofluoric acid can be used as fluoride chemical material directly.

Description

technical field [0001] The invention belongs to the technical field of organic fluorine chemical industry, in particular to a method for preparing anhydrous hydrofluoric acid. Background technique [0002] Fluorine is a non-renewable resource. The natural fluorine resources mainly exist in fluorite and apatite, which are the raw materials for the manufacture of various fluorides. The most important compound of fluorine is hydrogen fluoride. At present, most of them are made of fluorite, which is decomposed with sulfuric acid to obtain hydrofluoric acid or anhydrous hydrogen fluoride. [0003] In the industrial production of organic fluorine, a large amount of organic fluorine waste is inevitably produced. These organic fluorine wastes have the characteristics of high toxicity, refractory degradation, and high cracking temperature requirements. At present, the more advanced treatment method is plasma incineration. Plasma high-temperature incineration and melting treatment te...

Claims

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Application Information

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IPC IPC(8): C01B7/19
Inventor 曾本忠杨林茂张劲松张金刚谭建明
Owner ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD