Method for preparing ceramic-based three-dimensional photonic crystals with photo-curing direct molding
A technology of light-curing molding and photonic crystals, applied in chemical instruments and methods, crystal growth, single crystal growth, etc., can solve problems such as the relationship between microstructure and macroscopic device structure, etc.
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Embodiment 1
[0021] Preparation of Al by Photocuring Direct Structuring 2 o 3 Process steps:
[0022] 1. Preparation of ceramic slurry. First prepare the master mix. Weigh 450 grams of deionized water, 750 grams of silica sol and 750 grams of glycerin and stir evenly, add 997.5 grams of acrylamide and 52.5 grams of N-N' dimethylbispropylamide, stir to completely dissolve to obtain a premix;
[0023] Secondly, take 1.5L of the premix solution, and add Al 2 o 3 A total of 3900 grams of ceramic powder, and add dispersant 65ml (0.3% of the mass fraction of ceramics), ball milling for 3 hours, make each component mix uniformly; then add 12ml of photoinitiator (0.8% of the premixed liquid fraction ), ball milled for 1 hour to obtain a uniformly dispersed ceramic slurry;
[0024] 2. Import the three-dimensional photonic crystal model into the molding machine for support and layering processing, and import the data into the manufacturing program, and the Al 2 o 3 The ceramic slurry is plac...
Embodiment 2
[0028] Preparation of SiO by Photocuring Direct Structuring 2 Process steps:
[0029] The difference between this embodiment and embodiment one is that the ceramic powder in step 1 is SiO 2 Powder, the particle size is 8μ and 1.8μ; the structural parameters of the three-dimensional photonic crystal model in step 2 are different; the roasting process in step 4 is to enter the furnace at room temperature, raise the temperature to 250°C at a heating rate of 150°C / h, and keep it for 1 hour; Raise the temperature to 600°C at a rate of 60°C / h and keep it for 2 hours; then raise it to 1200°C at a rate of 300°C / h and keep it for 1 hour; finally cool to room temperature and take it out. All the other are the same as embodiment one.
Embodiment 3
[0031] Preparation of stable ZrO by photocuring direct molding 2 Process steps:
[0032] The difference between this embodiment and embodiment one is: the ceramic powder in step 1 is stable ZrO 2 Powder with a particle size of 1 μ; the structural parameters of the three-dimensional photonic crystal model in step 2 are different; the roasting process in step 4 is to enter the furnace at room temperature, raise the temperature to 250 ° C at a heating rate of 120 ° C / h, and keep it for 1 hour; at 80 ° C Raise the temperature to 600°C at a rate of 300°C / h and keep it warm for 1 hour; then raise it to 1200°C at a rate of 300°C / h and keep it warm for 2 hours; finally cool to room temperature and take it out. All the other are the same as embodiment one.
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