Aluminum-containing diamond-like carbon film and method for preparing same
A technology of diamond and carbon film, applied in metal material coating process, ion implantation plating, coating, etc., can solve problems such as internal stress of friction coefficient, limit the thickness of deposited film, film peeling, etc., and achieve the surface quality of the coating Excellent, great application value, low cost effect
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Embodiment 1
[0020] a. Clean the stainless steel sheet ultrasonically, after drying, fix it on the workpiece frame in the vacuum chamber of the magnetron sputtering coating equipment, keep the target base distance at 150mm, and then vacuumize, pre-vacuumize to 4×10 -3 Pa;
[0021] b. Pass argon gas into the vacuum chamber, keep the air pressure at 1Pa, turn on the substrate bias power supply and apply a bias voltage of -1000V on the surface of the sample, and perform glow cleaning and activation on the surface of the sample for 20 minutes;
[0022] c. Pass the mixed gas of methane and argon into the vacuum chamber, the total pressure in the vacuum chamber is 1Pa, and the partial pressure of methane gas is 0.5Pa;
[0023] d. Adjust the substrate bias to -500V, and the pulse duty cycle to 50%; turn on the magnetron sputtering power supply to deposit an aluminum-containing diamond-like carbon film on the surface of the sample, and keep the current density of the sputtering target at 8mA / mm 2...
Embodiment 2
[0027] a. Clean the stainless steel sheet ultrasonically, after drying, fix it on the workpiece frame in the vacuum chamber of the magnetron sputtering coating equipment, keep the target base distance at 150mm, and then vacuumize, pre-vacuumize to 4×10 -3 Pa;
[0028] b. Pass argon gas into the vacuum chamber, keep the air pressure at 1Pa, turn on the substrate bias power supply and apply a bias voltage of -1000V on the surface of the sample, and perform glow cleaning and activation on the surface of the sample for 20 minutes;
[0029] c. Pass the mixed gas of methane and argon into the vacuum chamber, and the total pressure in the vacuum chamber is 1Pa;
[0030] d. Adjust the substrate bias to -500V, and the pulse duty cycle to 50%; then turn on the magnetron sputtering power supply to deposit an aluminum-containing diamond-like carbon film on the surface of the sample, and keep the current density of the sputtering target at 8mA / mm 2 ; Using gradient transition, the partial...
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