Method for preparing Er2O3 coating

A technology of coating and sputtering method, which is applied in the field of reactive sputtering, can solve the problems of low sputtering efficiency of ceramic targets, difficult control of coating deposition rate, unfavorable scale application, etc., to achieve improved sputtering efficiency and stable deposition rate Control and improve the effect of controllability

Active Publication Date: 2010-06-09
GRIMAT ENG INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

but 2 o 3 The sputtering efficiency of the ceramic target is too low, which is not conducive to large-scale application; the reactive magnetron sputtering of the metal target is easy to generate oxides on the surface of the target, making the coating deposition rate difficult to control

Method used

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  • Method for preparing Er2O3 coating
  • Method for preparing Er2O3 coating
  • Method for preparing Er2O3 coating

Examples

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Effect test

Embodiment 1

[0026] Preparation of Er by reactive sputtering 2 o 3 Coating, with the pure metal Er target (purity is 99.9%) of Φ75 * 5mm as target material, comprises the following steps:

[0027] (1) Put the quartz substrate in alcohol for 2 minutes for ultrasonic cleaning to remove the moisture on the surface; then put it in acetone for 3 minutes for ultrasonic cleaning to remove the oil on the surface; finally dry it with a hair dryer; place the quartz substrate on Install the target on the heater, and adjust the base distance of the target to 40mm;

[0028] (2) Vacuum until the degree of vacuum is not greater than 3.0×10 -3 Pa, turn on the power of the heater, and heat the substrate to 750°C;

[0029] (3) Introduce argon gas and adjust the water vapor control valve. The water vapor is provided by the water storage tank. The temperature of the water storage tank is kept at 25°C to keep the evaporation of water vapor constant. The vacuum gauge shows that the water vapor is 4.0×10 -2 ...

Embodiment 2

[0033] Preparation of Er by reactive sputtering 2 o 3 Coating, with the pure metal Er target (purity is 99.9%) of Φ75 * 5mm as target material, comprises the following steps:

[0034] (1) Put the quartz substrate in alcohol for 2 minutes for ultrasonic cleaning to remove the moisture on the surface; then put it in acetone for 3 minutes for ultrasonic cleaning to remove the oil on the surface; finally dry it with a hair dryer; place the quartz substrate on Install the target on the heater, and adjust the base distance of the target to 40mm;

[0035] (2) Vacuum until the degree of vacuum is not greater than 3.0×10 -3 Pa, turn on the power of the heater, and heat the substrate to 750°C;

[0036] (3) Introduce argon gas and adjust the water vapor control valve. The water vapor is provided by the water storage tank. The temperature of the water storage tank is kept at 25°C to keep the evaporation of water vapor constant. The vacuum gauge shows that the water vapor is 8.0×10 -2 ...

Embodiment 3

[0040] Preparation of Er by reactive sputtering 2 o 3 Coating, with the pure metal Er target (purity is 99.9%) of Φ75 * 5mm as target material, comprises the following steps:

[0041](1) Put the quartz substrate in alcohol for 2 minutes for ultrasonic cleaning to remove the moisture on the surface; then put it in acetone for 3 minutes for ultrasonic cleaning to remove the oil on the surface; finally dry it with a hair dryer; place the quartz substrate on Install the target on the heater, and adjust the base distance of the target to 40mm;

[0042] (2) Vacuum until the degree of vacuum is not greater than 3.0×10 -3 Pa, turn on the power of the heater, and heat the substrate to 800°C;

[0043] (3) Introduce argon gas and adjust the water vapor control valve. The water vapor is provided by the water storage tank. The temperature of the water storage tank is kept at 25°C to keep the evaporation of water vapor constant. The vacuum gauge shows that the water vapor is 4.0×10 -2 P...

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Abstract

The invention belongs to the technical field of reactive sputtering, and more particularly relates to a method for preparing Er2O3 coating, comprising: putting a quartz substrate on a heater, installing target material, and adjusting the target substrate distance; vacuumizing until the vacuum degree is not more than 3.0*10-3Pa, and heating the substrate to be 700-800 DEG C; filling argon and steam, and adjusting the atmospheric pressure to be 0.1-0.8Pa, wherein the water pressure is 0.04-0.08Pa; sputtering, and increasing the sputtering power to be 80-100W; after stabilizing glow, moving a baffle away, and starting deposition; and after depositing for 20-40min, closing the baffle, stopping sputtering, disconnecting the argon and the steam, cutting off a heating power supply, turning off a vacuum system, and obtaining the Er2O3 coating. The reactive sputtering of the method improves the sputtering efficiency, taking the steam as reactant gas, prevents the surface of the target material from being oxidized, and improves the controllability of the rate of deposition. The method preparing the Er2O3 coating is rapid and controllable in the rate of deposition.

Description

technical field [0001] The invention belongs to the technical field of reactive sputtering, in particular to a method for preparing Er 2 o 3 Coating method. Background technique [0002] Er 2 o 3 With high dielectric properties, good photoelectric properties and excellent corrosion resistance, it has broad application prospects in the fields of microelectronics, optoelectronics, corrosion and protection, and nuclear applications. Preparation of high-quality Er with good crystallization, compactness and strong binding force 2 o 3 Coating is of great significance. [0003] At present, various film-making methods can be used to prepare Er 2 o 3 Coating, such as PLD, sputtering, electron beam evaporation, sol-gel, chemical vapor deposition, in-situ liquid immersion growth, etc. Magnetron sputtering is widely used as a conventional thin film preparation method, and Er 2 o 3 The ceramic target is prepared by radio frequency magnetron sputtering, and the Er metal target ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/08
Inventor 屈飞李弢王磊蒋文文
Owner GRIMAT ENG INST CO LTD
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