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Micro fluid control detection device based on surface-enhanced Raman scattering active substrate

A technology of surface-enhanced Raman and active substrates, which is applied in Raman scattering, technology for producing decorative surface effects, and electric solid-state devices. Layer layout and other issues, to achieve the effect of reducing industrial production costs, promoting research and production development, and improving production efficiency and integration

Active Publication Date: 2012-05-30
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the monolayer arrangement process of nanospheres is cumbersome, and it is difficult to achieve monolayer arrangement on a large area, which limits the further application of this method.

Method used

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  • Micro fluid control detection device based on surface-enhanced Raman scattering active substrate
  • Micro fluid control detection device based on surface-enhanced Raman scattering active substrate
  • Micro fluid control detection device based on surface-enhanced Raman scattering active substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] Example 1. Preparation of microfluidic detection device based on SERS substrate

[0047] 1) Preparation of SERS active substrate

[0048] Spin-coated RZJ-304 positive photoresist with a thickness of 1μm on the surface of silicon substrate 1 (substrate a), and pre-baked it in an oven at 98°C for 15 minutes, with a wavelength of 365nm and an intensity of 5.4mW / cm 2 The ultraviolet light is irradiated through the mask for 5s and developed in the developer of RZJ-304 positive photoresist for 30s to form a photoresist pattern in the shape of a micro-channel; put the silicon substrate 1 with the photoresist pattern in The oxygen plasma bombarded the cavity with a power of 250W and an oxygen flow rate of 30sccm / min. The photoresist was bombarded for 5 minutes to prepare a nanoparticle structure on the silicon substrate 1. The silicon substrate with a nanoparticle structure 1 Put the power into 400W, SF 6 And C 4 F 8 In the cavity of a reactive ion etching machine with flow rates of...

Embodiment 2

[0051] Example 2. Preparation of microfluidic detection device based on SERS substrate

[0052] 1) Preparation of SERS active substrate

[0053] Spin-coated Shipley SPR positive photoresist with a thickness of 5μm on the surface of silicon substrate 1 (substrate a), and pre-baked in an oven at 98°C for 15 minutes, with a wavelength of 365nm and an intensity of 5.4mW / cm 2 The ultraviolet light is irradiated through the mask for 60s, and developed in the developer of Shipley SPR positive photoresist for 90s to form a photoresist pattern in the shape of a micro-channel; put the silicon substrate 1 with the photoresist pattern into the power Oxygen plasma bombards the cavity with an oxygen flow rate of 250W and an oxygen flow rate of 30sccm / min. The photoresist is bombarded for 25 minutes to prepare a nanoparticle structure on the substrate; the silicon substrate 1 with a nanoparticle structure is placed The power is 400W, SF 6 And C 4 F 8 In the cavity of the reactive ion etching mach...

Embodiment 3

[0055] Example 3. Preparation of a microfluidic detection device based on a SERS substrate

[0056] 1) Preparation of SERS active substrate

[0057] On the surface of the silicon substrate 1 (substrate a), a 20μm-thick Shipley AZ series positive photoresist was spin-coated, and after pre-baking on a hot plate at 110℃ for 100s, the wavelength was 365nm and the intensity was 4.5mW / cm 2 The UV light is irradiated through the mask for 400s, and developed in the developer of Shipley AZ series positive photoresist for 600s to form a photoresist pattern in the shape of a micro-channel; put the silicon substrate 1 with the photoresist pattern in The oxygen plasma bombarded the cavity with a power of 250W and an oxygen flow rate of 30 sccm / min, and bombarded the photoresist for 100 minutes to prepare a nanoparticle structure on the substrate; the silicon substrate 1 with a nanoparticle structure was placed Input power is 400W, SF 6 And C 4 F 8 In the cavity of a reactive ion etching machine...

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Abstract

The invention discloses a micro fluid control detection device based on surface-enhanced Raman scattering active substrate. The micro fluid control detection device is obtained by the method including the following steps: photoresist is coated on substrate in spinning way, prebaking, exposure, developing and fixing are sequentially carried out on the photoresist, so as to form photoresist graph in micro fluid shape; plasma dry etching is carried out on the photoresist, thus forming nano granular structure or nano fiber upright structure in vertical distribution on the substrate; the nano granular structure is a mask, anisotropic etching is carried out on the substrate, thus forming nano column on the substrate; metal nano granular layer is sputtered on the silicon nano column or nano fiber upright structure, so as to obtain surface-enhanced Raman scattering active substrate; and a silicon-PDMS double-layer structure SERS micro fluid control detection device which has no impurity interference and can be monitored in real time is formed by combining micro fluid device and processing technology thereof. The micro fluid control device not only can be used for detection of liquid analyte to be analyzed but also can be used for detection of colloid and gas analyte to be analyzed.

Description

Technical field [0001] The invention relates to a microfluidic detection device based on a surface enhanced Raman scattering (SERS) active substrate. Background technique [0002] Raman scattering spectroscopy detection is a material structure analysis method that does not require labeling of the sample to be tested. It is non-destructive and does not require contact. With the development of laser technology and weak signal detection and reception technology, Raman scattering spectroscopy detection, which can realize the molecular level detection of material structure, is expected to be more widely used in the fields of biological detection, disease diagnosis, environmental monitoring, and chemical analysis. Practical application. However, due to the small Raman scattering cross section, the analytical sensitivity of Raman scattering spectroscopy detection is low, and the Raman spectra of many molecules or groups are difficult to obtain. Although the intensity of the Raman scat...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/65B81C1/00B82B3/00B81B7/00
Inventor 毛海央吴文刚张煜龙黄如郝一龙王阳元
Owner PEKING UNIV
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