Preparation method of electronic-level crystalline silicon powder
A silicon micropowder, crystalline technology, applied in the direction of silicon oxide, silicon dioxide, etc., to achieve the effect of reducing the process and reducing the cost
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Embodiment 1
[0017] 4), according to the ratio of step 2), add distilled water and sodium silicate to mix the slurry, and clean according to the method of step 2) and step 3);
[0018] 5), repeat step 4) three times;
[0019] 6) Ultrasonic cleaning: according to the weight ratio of silicon micropowder: deionized water = 35:65, add deionized water into the mixing tank to make slurry, and stir at the same time, stir for 15 minutes after adding the material and add ultrasonic vibration at the same time;
[0020] 7), stop stirring, after the slurry is clearly stratified, remove the cleaning water;
[0021] 8), repeat step 6), step 7) once;
[0022] 9) Dry the cleaned silicon micropowder in a drying oven until the water content is less than or equal to 0.05%, and obtain electronic grade crystalline silicon micropowder in a sub-circular shape.
[0023] Prepared silicon micropowder, SiO 2 99.89%, Al 2 o 3 0.089%, Fe 2 o 3 0.009%, loss on ignition 0.00%, density 2.67, conductivity of sil...
Embodiment 2
[0028] 4), according to the proportion of step 2), add distilled water and sodium silicate to stir and mix the slurry, and clean according to the method of step 2) and step 3).
[0029] 5), repeat step 4) three times.
[0030] 6) Ultrasonic cleaning: add deionized water into the mixing tank according to the weight ratio of silicon micropowder: deionized water = 30:70, and stir at the same time. After adding the materials, stir for 15 minutes and add ultrasonic vibration at the same time.
[0031] 7) Stop stirring, and drain the cleaning water after the slurry is clearly stratified.
[0032] 8), repeat step 6), step 7) once more.
[0033] 9) Dry the cleaned silicon micropowder in a drying oven until the water content is less than or equal to 0.05%, and obtain electronic grade crystalline silicon micropowder in a sub-circular shape.
[0034] Prepared silicon micropowder, SiO 2 99.89%, A1 2 o 3 0.074%, Fe 2 o 3 0.008%, loss on ignition 0.00%, density 2.65, conductivity ...
Embodiment 3
[0039] 4), according to the proportion of step 2), add distilled water and sodium silicate to stir and mix the slurry, and clean according to the method of step 2) and step 3).
[0040] 5), repeat step 4) three times.
[0041] 6) Ultrasonic cleaning: add deionized water into the mixing tank according to the weight ratio of silicon micropowder: deionized water = 25:75, and stir at the same time. After adding the materials, stir for 15 minutes and add ultrasonic vibration at the same time.
[0042] 7) Stop stirring, and drain the cleaning water after the slurry is clearly stratified.
[0043] 8), repeat step 6), step 7) once more.
[0044] 9) Dry the cleaned silicon micropowder in a drying oven until the water content is less than or equal to 0.05%, and obtain electronic grade crystalline silicon micropowder in a sub-circular shape.
[0045] Prepared silicon micropowder, SiO 2 99.89%, Al 2 o 3 0.066%, Fe 2 o 3 0.006%, loss on ignition 0.00%, density 2.68, conductivity ...
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