Method for forming protective film
A manufacturing method and technology of a protective film, applied to the field of forming a dense layer on an anodic oxide film of aluminum, which can solve problems such as insufficient corrosion resistance, and achieve the effects of improved corrosion resistance and uniform film thickness
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[0052]Use an aluminum alloy plate (A5052P, refer to JISH4000) with a width of 30 mm, a length of 45 mm, and a thickness of 2 mm as a substrate. As a pretreatment for forming an anodic oxide film, the substrate is immersed in 10% sodium hydroxide aqueous solution at 40°C for 1 minute, and then degreased. Thereafter, it was washed with water and immersed in a 35% sulfuric acid aqueous solution at room temperature to remove smut (black deposits).
[0053] The substrate after the previous treatment is used as the object of treatment, using an electrolyte solution obtained by dissolving 30g of oxalic acid in 1 liter of pure water, the oxidation temperature is 15°C to 25°C, and the oxidation voltage is 60V to 100V. and the film thickness of the anodized film 12 are formed under the conditions shown in Table 1 below,
[0054] [Table 1]
[0055] Table 1: First heat treatment conditions
[0056]
[0057] Using the object 11 on which the anodized film 12 was formed, the first heat ...
Embodiment 5
[0097] Example 5 and Comparative Example 3 are as described in the above-mentioned Table 2. When forming the anodic oxide film 12, the first half is made at a low current density and the second half is at a high current density. , the pore (pore) size of the anodized film is increased, and the film thickness of the non-pore wall part is also thickened, so that the structure of the anodized film is changed in the film thickness direction.
[0098] However, comparing Tables 6 and 7 with the above-mentioned Table 2, it is found that even if the structure of the anodized film is changed, there is no great difference in the film thickness of the dense layer after the first and second heat treatments. Therefore, it can be seen that the present invention can form a dense layer regardless of the conditions at the time of forming the anodic oxide film or the structure of the anodic oxide film.
[0099] When the electrolytic solution is changed from an oxalic acid aqueous solution to a ...
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