Method for preparing nano-structured nitrogen silicon zirconium coating on surface of hard alloy substrate

A cemented carbide substrate and nanostructure technology, which is applied in metal material coating process, coating, ion implantation plating and other directions, can solve the problems of high cost of alloy target and difficult to accurately control the content of Si element in coating.

Inactive Publication Date: 2010-12-22
XIAMEN UNIV
View PDF3 Cites 32 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cost of the alloy target is high, and it is difficult to accurately control the content of Si element in the coating, so it is necessary to develop a more reasonable method to prepare high-performance ZrSiN coating

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing nano-structured nitrogen silicon zirconium coating on surface of hard alloy substrate
  • Method for preparing nano-structured nitrogen silicon zirconium coating on surface of hard alloy substrate
  • Method for preparing nano-structured nitrogen silicon zirconium coating on surface of hard alloy substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] 1. Substrate pretreatment: (1) Grinding and polishing: Carry out sufficient rough grinding and fine grinding on the cemented carbide substrate on 600-mesh and 1200-mesh diamond grinding wheel discs respectively. Min, between coarse and fine grinding, the sample should be fully ultrasonically cleaned (ultrasonic cleaning time is 2min) and dried in an oven to remove wear debris and oil; after the sample is ground, use a W2.5 Diamond polishing powder is used for polishing, and the polishing time is 10 minutes. (2) Ultrasonic cleaning: Clean the polished substrate in the following order, ultrasonic cleaning with acetone for 5 minutes → ultrasonic cleaning with absolute ethanol for 5 minutes → drying for later use. (3) Ion source cleaning: Before sputtering deposition, the Hall ion source is used to clean the substrate, and the pressure of ion cleaning is 2×10 -2 Pa, substrate temperature 300°C, argon flux 10sccm, bias voltage negative 100V, cathode current voltage 29.5A, 1...

Embodiment 2

[0031] 1. Substrate pretreatment: (1) Grinding and polishing: Same as Example 1. (2) ultrasonic cleaning: with embodiment 1. (3) Ion source cleaning: Same as in Example 1.

[0032] 2. Pre-sputtering: same as embodiment 1.

[0033] 3. Sputtering deposition: After the pre-sputtering, argon and nitrogen are introduced, the total flux is 60sccm, of which the nitrogen flow rate is 20%, the working pressure of the deposition is 0.3Pa, the DC power supply of the Zr target is 250W, Si The RF power of the target is 60W, the sputtering time is 90min, and the substrate temperature is 300°C. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis.

[0034] image 3 It is the XRD spectrum of the coating, which shows that the prepared coating has a face-centered cubic structure. The method for m...

Embodiment 3

[0038] 1. Substrate pretreatment: (1) Grinding and polishing: Same as Example 1. (2) ultrasonic cleaning: with embodiment 1. (3) Ion source cleaning: Same as in Example 1.

[0039] 2. Pre-sputtering: same as embodiment 1.

[0040] 3. Sputtering deposition: After the pre-sputtering, argon and nitrogen are introduced, the total flux is 60sccm, of which the nitrogen flow rate is 15%, the working pressure of the deposition is 0.5Pa, the DC power supply of the Zr target is 250W, Si The RF power of the target is 70W, the sputtering time is 90min, and the substrate temperature is 300°C. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis.

[0041] Figure 4 It is the XRD spectrum of the coating, indicating that the prepared coating is a coating with a face-centered cubic structure. Th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
hardnessaaaaaaaaaa
particle sizeaaaaaaaaaa
hardnessaaaaaaaaaa
Login to view more

Abstract

The invention provides a method for preparing a nano-structured nitrogen silicon zirconium coating on the surface of a hard alloy substrate, relating to a hard alloy. A direct-current and radio frequency reaction co-sputtering method is used to prepare the nano-structured nitrogen silicon zirconium coating through controlling the power of a Si target. When the content of Si in a ZrSiN coating is reduced, the Si atoms in the coating exist in the mode of replacing Zr atoms, the ZrSiN coating with low content of Si is solid solution, and the cross section of the ZrSiN coating is in a column structure. The solid solubility and the hardness of the ZrSiN coating are increased with the increment of the content of Si. When the content of Si in the coating reaches a definite amount, excessive element of Si can form amorphous Si3N4 at crystal boundary with element of N. When the content of Si in the coating is further increased, a great amount of amorphous Si3N4 is generated, thus seriously inhabiting the growth of ZrN crystal particles and influencing the degree of crystallization of the coating, in addition, the coating is changed to be in an amorphous state and is in a non-column equiaxial structure.

Description

technical field [0001] The invention relates to a cemented carbide, in particular to a method for preparing a nanostructure nitrogen-silicon-zirconium coating on the surface of a cemented carbide substrate. Background technique [0002] The study of hard materials is one of the important fields of material science research at present. With the rapid development of modern manufacturing and national defense industries, hard coating materials have been widely used in machinery manufacturing, automobile industry, textile industry, mold industry, aerospace and other fields. As a preparation method of material surface technology, coating technology can prepare various functional coatings. Combining the excellent properties of coatings and substrate materials, the performance of coating materials and substrate materials has been greatly improved, and the scope of application has been broadened. In this way, a very small amount of material can play the role of a large number of exp...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34
Inventor 王周成黄若轩祁正兵孙鹏朱芳萍
Owner XIAMEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap