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Manufacture system of anti-reflection structure on surface of solar cell and manufacture method thereof

A solar cell and anti-reflection technology, which is applied in the manufacture of circuits, electrical components, and final products, can solve the problem of fixed template pattern shapes, etc., and achieve the effects of reducing reflectivity, increasing light absorption, and improving photoelectric conversion efficiency

Inactive Publication Date: 2013-03-06
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this technique is that it can only be used on a clean plane, and its stencil pattern shape is fixed

Method used

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  • Manufacture system of anti-reflection structure on surface of solar cell and manufacture method thereof
  • Manufacture system of anti-reflection structure on surface of solar cell and manufacture method thereof
  • Manufacture system of anti-reflection structure on surface of solar cell and manufacture method thereof

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Experimental program
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Embodiment Construction

[0035] Such as figure 1 As shown, the present invention includes: a laser 1, a beam expander 2, a collimating system 3, a beam splitting and refractive system 4, and a solar cell substrate or a solar cell substrate cover material surface 5. After the laser beam emitted by the laser 1 is expanded 2 and collimated 3, the beam splitting and refraction system 4 first divides the laser beam into multiple coherent beams, and then controls the respective optical paths of the multiple beams to make them at the incident angle It is irradiated on the surface 5 of the solar cell substrate or the solar cell substrate cover material at the same time in the range of 0° to 90°, and ablated or exposed it by using the multi-beam interference pattern to form such as Picture 10 The surface anti-reflection structure 6 shown.

[0036] Such as figure 2 Shown is a schematic diagram of the manufacturing system of the solar cell surface anti-reflection structure using the resist-assisted exposure metho...

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Abstract

The invention relates to a manufacture system of an anti-reflection structure on the surface of a solar cell and a manufacture method thereof, which is characterized in that a plurality of coherent laser beams are combined by a laser interference lithography system to modulate the light intensity distribution in an interference field; the material surface of a photovoltaic cell device is ablated with redistributed laser energy after modulation; and micro or nano-stage dense hole and column relief structures are generated in a large-area range so as to reduce the reflectivity, enhance the light absorption and improve the photovoltaic conversion efficiency. Lacking of external materials, the anti-reflection fine structure generated on the substrate surface by using the method is more stable and durable, and the cycle and the size of the structure can be adjusted by adjusting the incidence angle of the interference lithography system so that the received wavelength has better pertinence and has the advantage of good working band controllability.

Description

Technical field [0001] The invention relates to a manufacturing system and a manufacturing method of an anti-reflection structure on the surface of a solar cell, and belongs to the improvement of the preparation technology of the surface anti-reflection structure for improving the photoelectric conversion efficiency of the solar cell. technical background [0002] An important way to improve the photoelectric conversion efficiency is to reduce the reflection on the surface of the solar cell, so as to increase the light absorption on the surface and improve the conversion efficiency. In the existing solar cell production process, the suede technology is generally used to texture the surface and increase the number of reflections of incident light on the surface of the silicon wafer, thereby increasing the absorption of the incident light by the silicon wafer. For single crystal silicon and polycrystalline silicon battery materials, the more mature preparation methods for suede are...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 张锦王作斌刘水庆宋正勋翁占坤刘国强
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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