Laminated organic light emitting diode and preparation method thereof
A light-emitting diode and organic technology, applied in organic chemistry, semiconductor/solid-state device manufacturing, electrical components, etc., can solve problems such as increased brightness and current efficiency, increased voltage, and no improvement in the power efficiency of stacked organic light-emitting diodes. Increased brightness and current efficiency, reduced operating voltage, and improved power efficiency
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[0042] The invention also discloses a method for preparing the laminated organic light emitting diode, which includes:
[0043] At least two light-emitting layers are evaporated between the anode and the cathode;
[0044] A charge generating layer is vapor-deposited between adjacent light-emitting layers, the charge generating layer is a heterojunction formed by an n-type organic semiconductor and a p-type organic semiconductor, the p-type organic semiconductor is a thiophene compound, and the p-type organic semiconductor The highest occupied molecular orbital energy level of the semiconductor is less than 6 eV, and the difference between the highest occupied molecular orbital energy level of the p-type organic semiconductor and the lowest unoccupied molecular orbital energy level of the n-type organic semiconductor is less than 1 eV.
[0045] The substrate is preferably a glass substrate or a flexible substrate, and the flexible substrate is preferably a polycarbonate flexible subst...
Example Embodiment
[0052] Example 1
[0053] Photoetch the anode layer ITO on the ITO glass into a thin strip of electrode, then clean it, dry it with nitrogen, treat it with oxygen plasma for 2 minutes and transfer it to the vacuum coating system;
[0054] The vacuum degree in the vacuum coating system reaches 5×10 -4 When Pa, 4.5nm MoO was deposited on the ITO electrode in turn 3 Hole injection layer, 90nm NPB hole transport layer, 30nm C545T doped in Alq 3 Light-emitting layer composed of medium, 30nm Alq 3 Electron transport layer, 1nm LiF electron injection layer, 20nm C 60 n-type organic semiconductor, 10 nanometer NaT3p-type organic semiconductor, 3 nanometer MoO 3 Hole injection layer, 50 nm NPB hole transport layer, 30 nm C545T doped in Alq 3 Light-emitting layer composed of medium, 30nm Alq 3 Electron transport layer, 1 nanometer electron injection layer LiF, 120 nanometer metal cathode Al, where the positive and negative electrodes intersect each other to form the light-emitting area of th...
Example Embodiment
[0056] Example 2
[0057] Photoetch the anode layer ITO on the ITO glass into a thin strip of electrode, then clean it, dry it with nitrogen, treat it with oxygen plasma for 2 minutes and transfer it to the vacuum coating system;
[0058] The vacuum degree in the vacuum coating system reaches 5×10 -4 When Pa, 4.5nm MoO was deposited on the ITO electrode in turn 3 Hole injection layer, 120nm NPB hole transport layer, 30nm C545T doped in Alq 3 Light-emitting layer composed of medium, 30nm Alq 3 Electron transport layer, 1nm LiF electron injection layer, 20nm C 60 n-type organic semiconductor, 10 nanometer TNT2p-type organic semiconductor, 3 nanometer MoO 3 Hole injection layer, 50 nm NPB hole transport layer, 30 nm C545T doped in Alq 3 Light-emitting layer composed of medium, 30nm Alq 3 Electron transport layer, 1 nanometer electron injection layer LiF, 120 nanometer metal cathode Al, where the positive and negative electrodes intersect each other to form the light-emitting area of t...
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