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Method for synthesizing silicon-containing polymerizing monomer terminated by vinyl ether and allyl ether

The technology of hydroxyalkyl vinyl ether and vinyl ether alkoxy is applied in the field of synthesis of silicon-containing polymerized monomers, and can solve the problems of serious oxygen inhibition of radical photopolymerization, poor surface curing, and difficult performance adjustment, etc. Achieve the effect of improving dry etching resistance, good curing rate, convenient storage and transportation

Active Publication Date: 2011-08-03
HUBEI GURUN TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Free radical photopolymerization has some serious disadvantages: firstly, free radical photopolymerization is severely inhibited by oxygen, and it is easy to cause poor surface curing, and it is often cured under an inert atmosphere, which is inconvenient to operate; large volume shrinkage
However, the cationic polymerization system also has its own shortcomings, such as being greatly affected by moisture, slow polymerization speed, and difficult to adjust performance, etc.

Method used

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  • Method for synthesizing silicon-containing polymerizing monomer terminated by vinyl ether and allyl ether
  • Method for synthesizing silicon-containing polymerizing monomer terminated by vinyl ether and allyl ether
  • Method for synthesizing silicon-containing polymerizing monomer terminated by vinyl ether and allyl ether

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] monomer That is, the synthesis of 1-allyloxy-1-vinyloxybutoxydimethylsilane:

[0050] Add 17.8202g (0.176mol) of triethylamine and 120mL of tetrahydrofuran into a 500mL four-necked flask, pass N 2 Stir in an ice-water bath to cool it down; dissolve 9.2935g (0.08mol) of 4-hydroxybutyl vinyl ether and 3.6645g (0.132mol) of allyl alcohol in 100mL of tetrahydrofuran; dissolve 10.3222g (0.08mol) of dimethyl di Chlorosilane was quickly added to the four-necked bottle, and the two alcohols were added dropwise at a rate of about 4 drops / s, and the drop was completed in about 20 minutes; after the drop, it became white and turbid, removed the ice-water bath, and stirred at room temperature for 1.5 hours; the reaction was completed After suction filtration, the white solid was filtered off, the filtrate was a colorless transparent liquid, and THF was removed by rotary evaporation; extracted with 80mL of n-hexane, filtered by suction, the filtrate was a colorless transparent liq...

Embodiment 2

[0052] monomer That is, the synthesis of 1-allyl-1-[2-(2-vinyloxy)ethoxyethoxy]dimethylsilane:

[0053] Diethylene glycol monovinyl ether was used to replace 4-hydroxybutyl vinyl ether in Example 1, and the remaining reagents and amounts were the same as in Example 1.

Embodiment 3

[0055] monomer That is, the synthesis of 1-(2-allyl)ethoxy-1-vinyloxybutoxydimethylsilane:

[0056]Allyl hydroxy vinyl ether is used to replace the allyl alcohol in Example 1, and the remaining reagents and consumption are the same as in Example 1.

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Abstract

The invention relates to the design and synthesis of a silicon-containing polymerizing monomer terminated by vinyl ether and allyl ether, which is prepared by using chlorosilane or chloro siloxane, hydroxyalkyl ethenyl ether and hydroxyalkyl allyl ether as raw materials. The reaction synthesis method is simple, the reaction conditions are mild, the purification is easy, and the yield is as high as over 80 percent. The synthesized monomer is a mixed polymerizing photocurable monomer and a novel photopolymerizing material which can be used for making an imaging information recording material. In the invention, the problems of complex preparation process, low yield, high cost, environment pollution and the like of the conventional silicon-containing photopolymerizing monomer are solved effectively, and a novel monomer is developed for making photocurable materials and photoimaging information recording materials.

Description

technical field [0001] The invention belongs to the technical field of preparation of optical functional materials for imaging information recording, in particular to a method for synthesizing silicon-containing polymerizable monomers whose end groups are vinyl ether and allyl ether. Background technique [0002] The so-called photoradical-cation hybrid curing system refers to a system in which two active species of free radicals and cationics occur simultaneously in the same system, thereby simultaneously generating free radical photopolymerization and cationic photopolymerization (Chen Qidao, Chen Ming, Hong Xiaoyin. Mixed Polymerization [J]. Chemical Bulletin. 2000, (6): 1-5; Chen Ming, Chen Qidao, Xiao Shanqiang, Hong Xiaoyin. The principle and application of hybrid photocuring system [J]. Photosensitive Science and Photochemistry. 2001, 19(3) : 208-216.). Free radical photopolymerization has some serious disadvantages: firstly, free radical photopolymerization is sever...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07F7/18C09D4/00G03F7/027
Inventor 邹应全方圆
Owner HUBEI GURUN TECH CO LTD
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