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New method for preparing porous hydrogel by adopting low temperature photopolymerization

A low-temperature photopolymerization and hydrogel technology is applied in the field of photopolymerization to prepare porous hydrogel materials, and achieves the effect of reducing cost, low equipment requirements and small shrinkage

Inactive Publication Date: 2011-08-31
HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

So far, there are relatively few literatures on the influence of temperature changes on polymerization reactions; there are no reports on (ultra)low temperature polymerization kinetics and polymer properties.

Method used

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  • New method for preparing porous hydrogel by adopting low temperature photopolymerization
  • New method for preparing porous hydrogel by adopting low temperature photopolymerization
  • New method for preparing porous hydrogel by adopting low temperature photopolymerization

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] (1) 2 (2-ethoxyethoxy) ethyl acrylate is the main resin, and the solvent is ethanol, accounting for 10% of the mass proportion of the acrylic resin, and then adding 0.1% of the photoinitiator of the mass proportion of the acrylic resin 1173.

[0015] (2) After mixing evenly, pour it into a light-transmitting airtight mold, put it into a low-temperature tank and irradiate it with a UV light source, and the temperature range is -40°C. Lighting time is 20 minutes. The illuminated polymer is taken out from the mold and put into a freeze dryer for freeze drying.

Embodiment 2

[0017] (1) 1.6-hexanediol diacrylate is the main resin, and the solvent is 1,6 dioxane, which accounts for 100% of the mass proportion of the acrylic resin, and then adds 0.5% of the photoinitiator TPO of the mass proportion of the acrylic resin .

[0018] (2) After mixing evenly, pour it into a light-transmitting airtight mold, put it into a low-temperature tank and irradiate it with a UV light source, and the temperature range is -20°C. Lighting time is 10 minutes. The illuminated polymer is taken out from the mold and put into a freeze dryer for freeze drying.

Embodiment 3

[0020] (1) Trimethylolpropane triacrylate is used as the main resin, and the solvent is ethyl acetate, accounting for 200% of the mass proportion of the acrylic resin, and then adding 2% of the photoinitiator 907 of the mass proportion of the acrylic resin.

[0021] (2) After mixing evenly, pour it into a light-transmitting airtight mold, put it into a low-temperature tank and irradiate it with a UV light source, and the temperature range is -5°C. Lighting time is 15 minutes. The illuminated polymer is taken out from the mold and put into a freeze dryer for freeze drying.

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Abstract

The invention mainly relates to a new method for preparing porous hydrogel by adopting the low temperature photopolymerization. In the method, the temperature of the low temperature environment is 0-150 DEG C; the hydrogel uses one or two of epoxy acrylate, urethane acrylate, polyester acrylate, polyether acrylate and acrylic resin as a main body; and one or water, ethanol, acetone, methanol, acetonitrile, dioxane, chloroform, ethyl acetate, butyl acetate, tetrahydrofuran, propanol, butanol, dichloromethane, toluene, diethyl ether, propyl ether, heptane, cyclopentane, cyclohexane and petroleum ether is used as solvent; the weight proportion of acrylic resin is 10%-500%; and the initiator adopts common photoinitiator BP, 651, 907, ITX, 1173, 184, 2959, 369, TPO, 819, CQ or 784 and is 0.1wt%-5wt% of acrylic resin.

Description

technical field [0001] The invention relates to a new method for preparing a porous hydrogel material by photopolymerization in a low temperature environment. Background technique [0002] Most photocuring reactions are carried out at room temperature, which is also one of the advantages of photocuring. In the process of photopolymerization, a large amount of heat is released because the reaction is an exothermic process. The polymeric system is also a poor conductor of heat. In a thicker polymeric system, it is difficult to release heat quickly, which will inevitably affect the movement of the molecules inside, and ultimately affect the properties of the material. If the cured film is in contact with an insulating material (such as foam or an inert gas), the temperature in the sample will increase, and the adiabatic temperature increase can easily exceed 200°C for common monomers. An increase in temperature affects the kinetics of polymerization and the viscosity of the c...

Claims

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Application Information

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IPC IPC(8): C08F120/28C08F122/14C08F290/06C08F2/48C08J3/075C08J9/28
Inventor 刘建伟聂俊马贵平王克敏
Owner HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
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