GaN (gallium nitride)-based LED (light-emitting diode) with N-type electrodes in dotted distribution and manufacturing method thereof
A light-emitting diode, gallium nitride-based technology, applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of complex process, lower reliability, increase cost, etc., to simplify the process, improve reliability, and reduce current density Effect
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[0023] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0024] The reference signs involved therein are explained as follows:
[0025] 1. Sapphire substrate
[0026] 2. Buffer layer
[0027] 3. N-GaN layer
[0028] 4. Multiple quantum well layers
[0029] 5. P-GaN layer
[0030] 6. ITO transparent conductive layer + Al / Ag reflective layer
[0031] The preparation method of the GaN-based flip-chip light-emitting diode with dotted N-electrode structure proposed by the present invention specifically includes the following steps:
[0032] Such as figure 1 As shown, on a sapphire substrate 1, a buffer layer 2, an N-GaN layer 3, a multi-quantum well layer 4, a P-GaN layer 5, etc. are sequentially grown to form a GaN-based LED epitaxial wafer.
[0033] Such as figure 2 As sh...
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