Temperable three-silver low radiation coated glass and production technology thereof
A low-emission coating, glass technology, applied in glass/slag layered products, layered products, metal layered products, etc., can solve the problems of appearance color interference, limited color selection, low visible light transmission, etc. Reduce the influence of the uniformity of the film layer, the effect of uniform film formation and high light transmittance
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Embodiment 1
[0035] The film material structure of this embodiment is: glass substrate / SiNxOy / NiCrOx / AZO / Ag / NiCrOx / ZnSnOx / NiCrOx / AZO / Ag / NiCrOx / ZnSnOx / NiCrOx / AZO / Ag / NiCrOx layer / Si 3 N 4 .
[0036] The first dielectric combination layer is silicon oxynitride (SiNxOy), and the thickness of the film layer is: 46nm;
[0037] The first barrier protection layer is nickel chromium oxide (NiCrOx), and the thickness of the film layer is: 0.3nm;
[0038] The first dielectric layer is AZO, and the film thickness is 6nm;
[0039] The thickness of the first silver layer is: 13.9nm;
[0040] The second barrier protection layer is nickel chromium oxide (NiCrOx), and the film thickness is: 0.3nm;
[0041] The first spacer dielectric combination layer is zinc tin oxide (ZnSnOx), and the thickness of the film layer is: 69.7nm;
[0042] The third barrier protection layer is nickel chromium oxide (NiCrOx), and the film thickness is: 0.3nm;
[0043] The second dielectric layer is AZO, and the film thicknes...
Embodiment 2
[0079] The film material structure of this embodiment is: glass substrate / SiNxOy / NiCrOx / AZO / Ag / NiCrOx / SiNxOy / NiCrOx / AZO / Ag / NiCrOx / SiNxOy / NiCrOx / AZO / Ag / NiCrOx / SiNxOy / Si 3 N 4 . The combination layer may be a combination of single layers composed of multiple materials.
[0080] Wherein, the first dielectric combination layer is silicon oxynitride (SiNxOy), and the film thickness is: 48.0nm;
[0081] The first barrier protection layer is nickel chromium oxide (NiCrOx), and the thickness of the film layer is: 0.3nm;
[0082] The first dielectric layer is AZO, and the film thickness is 8nm;
[0083] The film thickness of the first silver layer is: 13.5nm;
[0084] The second barrier protection layer is nickel chromium oxide (NiCrOx), and the film thickness is: 0.3nm;
[0085] The first spacer dielectric combination layer is silicon oxynitride (SiNxOy), and the thickness of the film layer is: 68.2nm;
[0086] The third barrier protection layer is nickel chromium oxide (NiCrOx)...
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