Double-workpiece-table same-phase rotation exchange method and device based on follow-up rotation-resisting mechanisms

Abstract

A double-workpiece-table same-phase rotation exchange method and a device based on follow-up rotation-resisting mechanisms belong to technology of semiconductor manufacturing equipment. The device comprises two workpiece tables, a rotation transfer table and two follow-up rotation-resisting mechanisms, the rotation transfer table captures and clamps the two workpiece tables to rotate around a base station center in a rotation exchange process of the two workpiece tables, exchange of an exposure work position and a pretreatment work position is achieved, and the follow-up rotation-resisting mechanisms control autoroatation of the two workpiece tables so that same phase position of the two workpiece tables is guaranteed in a table exchange process. The double-workpiece-table same-phase rotation exchange method and the device solve the problem that the existing linear table exchange scheme has plenty of table exchange beat and large impact torque, the existing rotation table exchange scheme is reverse in phases of sensors and marking plates of two workpiece table and twining in cables, targets of a laser interferometer lose, and the like. The double-workpiece-table same-phase rotation exchange method and the device adopt a small mass balance system, are favorable to shortening balance time, simultaneously simplify a system, lower cost, reduce table exchange beat, shorten table exchange time, and effectively improve productivity of lithography machines.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and device for in-phase rotation exchange of double workpiece tables based on a follow-up anti-rotation mechanism. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. The resolution and engraving accuracy of the lithography machine determine the minimum line width of the integrated circuit chip, while the production rate of the lithography machine greatly affects the production cost of the integrated circuit chip, and the workpiece table, which is a key subsystem of the lithography machine, also To a large extent, it determines the resolution, overlay accuracy and productivity of the lithography machine. [0003] Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resol...

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Problems solved by technology

At the same time, it can solve a series of problems such as phase inversion of the workpiece table, cable winding of the workpiece table, target loss of the laser interferometer, large radius of gyration, and large moment of inertia.

The present invention can also solve the problems of large impact torque and many beats in the existing linear channel change scheme, and can adopt a smaller mass balance system, which is beneficial to shorten the balance time, simplify the system at the same time, reduce costs, and shorten the cycle time of channel change. It takes less time to change the platform, which can effectively improve the productivity of the lithography machine

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