Preparation method for saturable absorption mirror based on large-sized graphene

A graphene and absorption mirror technology, which is applied in the field of preparation of saturable absorption mirrors, can solve the problems of affecting the mode-locking effect of saturable absorption mirrors, poor graphene uniformity, and high cost, and achieves a simple and easy preparation process and a uniform graphene layer. , the effect of stable performance

Inactive Publication Date: 2012-07-04
SHANDONG NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the passive mode-locking technology of semiconductor saturable absorbers has many disadvantages: the fabrication of semiconductor saturable absorbers requires a relatively complex and expensive clean room manufacturing system, and the typical recovery

Method used

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  • Preparation method for saturable absorption mirror based on large-sized graphene
  • Preparation method for saturable absorption mirror based on large-sized graphene
  • Preparation method for saturable absorption mirror based on large-sized graphene

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] A preparation method of a graphene-based saturable absorbing mirror, comprising the following steps:

[0029] (1) Adopt CVD method to prepare single-layer graphene on Cu foil; Single-layer graphene adopts chemical vapor deposition to grow, and concrete steps are: at first the temperature of quartz tube is raised to 800-1100 degrees centigrade, then pass into 10-200sccm Hydrogen annealing for 5-30 minutes, and then one or two gases in methane and acetylene. The gas flow rate is 10-300 sccm, and after 5-60 minutes of growth, the carbon source gas is turned off and the temperature is rapidly cooled under a hydrogen atmosphere.

[0030] (2) Cut the Cu foil into φ20mm and φ25.4mm circles; cut the Cu foil according to the diameter of the laser high-reflection mirror, spin-coat PMMA on the circular Cu foil, and place the Cu foil on a 170°C hot plate after coating Bake for 5 minutes; Spin coating parameters of glue equalizing machine: first glue equalizing for 3s, rotating spe...

Embodiment 2

[0037] The specific steps are the same as in Example 1, the difference being that the process of steps (2)-(5) is repeated once, on the basis of transferring 1 layer of graphene saturable absorbing mirror, transfer 1 layer of graphene again, so that the saturable absorbing mirror above The number of layers of graphene is 2 layers.

Embodiment 3

[0039] The specific steps are the same as in Example 1, the difference is that after the steps of Example 1 are completed, repeat the steps (2)-(5) process twice, and transfer 1 layer of graphene on the basis of transferring 2 layers of graphene saturable absorbing mirrors , so that the number of layers of graphene on the saturable absorption mirror is 3 layers.

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Abstract

The invention relates to a preparation method for a saturable absorption mirror based on a large-sized graphene. The preparation method comprises the following steps of: preparing a single layer of graphene film on a Cu foil; rotationally coating polymethylmethacrylate (PMMA) on the graphene film; after hot drying, placing into a FeCl3 solution and soaking at room temperature; cleaning; moving the graphene film and the PMMA on the graphene film to a laser high-reflectivity mirror; and blowing to the surface of the laser high-reflectivity mirror through weak airflow of an air gun. The preparation method is simple, high in efficiency, high in anti-damage threshold value and large in area. The graphene of the prepared saturable absorption mirror can maintain the integrated chemical structure and the graphene has the centimeter size.

Description

technical field [0001] The invention relates to a preparation method of a saturable absorption mirror, in particular to a preparation method of a large-size graphene-based saturable absorption mirror, and belongs to the technical field of ultrashort pulse solid-state laser saturable absorption mirror preparation. Background technique [0002] The characteristics of ultrashort pulse laser lead to its wide application and huge market. In order to obtain such a widely used ultrashort pulse laser, it is generally realized by mode-locking technology. Passive mode-locking technology is favored because it can generate ultrashort pulses on the order of picoseconds or even femtoseconds and its system structure is simple. Passive mode-locking is to use the characteristics of nonlinear absorption or nonlinear phase transition of materials to generate laser ultrashort pulses. Common commercial nonlinear materials include semiconductor saturable absorbers (SESAM) and so on. However, th...

Claims

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Application Information

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IPC IPC(8): H01S3/098
Inventor 姜守振许士才满宝元刘杰杨诚范秀伟刘玫
Owner SHANDONG NORMAL UNIV
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