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Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus

A technology of liquid immersion exposure and coating materials, which is applied in photolithography process exposure devices, microlithography exposure equipment, optics, etc., can solve the problem of not knowing water repellent materials, etc., achieve excellent durability and reduce the number of maintenance. Effect

Inactive Publication Date: 2012-07-04
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the present situation is that a water-repellent material that sufficiently satisfies such requirements is not yet known.

Method used

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  • Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus
  • Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus
  • Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus

Examples

Experimental program
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Effect test

Embodiment 1～34、 comparative example 1、2

[0062] [Manufacture of water-repellent composition (perfluoropolymer solution)]

[0063] Make the fluorine-containing monomer (A, B, E, F, I, O) represented by formula A, B, E, F, I, O shown below with the composition (molar ratio) shown in Table 1 and other Monomer components (TFE, BVE, PPVE) were copolymerized to synthesize perfluoropolymer No.1, No.2, No.4, No.8, No.10, No.14~No.17 and No.24 respectively . TFE stands for tetrafluoroethylene, BVE stands for perfluorobutenyl vinyl ether, and PPVE stands for perfluoropropyl vinyl ether.

[0064] The synthesis of perfluoropolymer No.2, No.16, No.17 and No.24 was carried out as follows. Add 0.8g of fluorine-containing monomer A, I or O, 0.8g of other monomer components BVE or PPVE, and 0.08g of 1H-perfluorohexane as a solvent into a pressure-resistant container, and then add 0.34g of bisperoxide (Heptafluorobutyryl) (PFB) was used as a polymerization initiator. Bis(heptafluorobutyryl) peroxide (PFB) was added as a 3% by mass...

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Abstract

Disclosed is a coating material composition for a liquid immersion exposure apparatus, which is used for the purpose of forming a liquid repellent layer on the surface of a component member of a liquid immersion exposure apparatus that performs a light exposure of a substrate by irradiating the substrate with an exposure beam through a liquid. The coating material composition for a liquid immersion exposure apparatus contains a fluorine-containing polymer which contains, in the main chain, a repeating unit that has a fluorine-containing aliphatic ring structure containing two or three ether oxygen atoms, which are not adjacent to each other, in the ring structure.

Description

technical field [0001] The present invention relates to a liquid immersion exposure device coating material composition for forming a liquid repellent layer on the surface of members such as various sensors in a liquid immersion exposure device, a formed liquid repellent laminate, a method for forming the laminate, and Immersion exposure device. In addition, the laminate includes not only a multilayer structure of two or more layers but also a single layer. Background technique [0002] In the manufacture of integrated circuits such as semiconductors, the following photolithography method is used: the pattern image of the mask obtained by irradiating the mask with light from an exposure light source is projected onto the photosensitive resist layer on the substrate, and the pattern image is imaged. Transfer to photoresist layer. Usually, the pattern image of a mask is projected to the desired position of a photosensitive resist layer via the projection lens which moves rel...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027G03F7/20
CPCG03F7/70341G03F7/7095G03F7/70958G03F7/2041G03F9/7096G03F7/20G03F7/70716H01L21/027Y10T428/3154H01L21/0273
Inventor 武部洋子横小路修
Owner ASAHI GLASS CO LTD
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